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Patent US5262277A successfully refreshed from Google Patents.
US5262277A
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Photosensitive resin composition and photosensitive element using the same
Assignee: Resonac Corp
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Filing: 1992-01-22
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Granted: 1993-11-16
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Expires: 2012-01-22
Abstract
Abstract A photosensitive resin composition comprising (A) a polymer obtained by reacting an isocyanate compound having an ethylenic unsaturated group with a polymer which is a reaction product of a tetracarboxylic acid dianhydride and a diamine, and (B) a photoinitiator, can provide a thick film excellent in heat resistant, adhesiveness, flexibility, electrical and mechanical properties, and is particularly suitable for producing a photosensitive element.
Inventors
- 👤 Kuniaki Sato
- 👤 Yasunori Kojima
- 👤 Shigeo Tachiki
- 👤 Tohru Kikuchi
- 👤 Toshiaki Ishimaru
- 👤 Nobuyuki Hayashi
- 👤 Mitsumasa Kojima
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 14:56
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; G03F7/0387; C; C08; C08G; C08G69/00; C08G69/42; C08G73/00; C08G73/06; C08G73/10; C08G73/1039; C08G73/1057; C08G73/106; C08G77/00; C08G77/48; C08G77/54; G03F7/075; G03F7/0757
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
147 words
A photosensitive resin composition comprising (A) a reaction mixture containing carboxyl groups obtained from (a) a polymer containing repeating units of the formula: ##STR63## wherein R 57 is a divalent organic group; and R 56 is a silicon atom-containing tetravalent organic group of the formula: ##STR64## wherein R 58 and R 59 are independently a monovalent hydrocarbon group; R 60 is a hydrogen atom or a monovalent organic group; and n is an integer of 1 to 20, and (b) an isocyanato compound having at least one ethylenic unsaturated group, (B) a photoinitiator; and (C) one or more polymerizable unsaturated compounds; said composition being able to be developed by using a developing solution containing (i) a polar solvent and a basic compound, (ii) a polar solvent, an organic solvent and a basic compound, (iii) a basic aqueous solution or (iv) a basic aqueous solution and an alcohol.
Claim 2
Dependent Claim
147 words
A photosensitive resin composition comprising (A) a reaction mixture containing carboxyl groups obtained from (a) a polymer containing repeating units of the formula: ##STR63## wherein R 57 is a divalent organic group; and R 56 is a silicon atom-containing tetravalent organic group of the formula: ##STR64## wherein R 58 and R 59 are independently a monovalent hydrocarbon group; R 60 is a hydrogen atom or a monovalent organic group; and n is an integer of 1 to 20, and (b) an isocyanato compound having at least one ethylenic unsaturated group, (B) a photoinitiator; and (C) one or more polymerizable unsaturated compounds; said composition being able to be developed by using a developing solution containing (i) a polar solvent and a basic compound, (ii) a polar solvent, an organic solvent and a basic compound, (iii) a basic aqueous solution or (iv) a basic aqueous solution and an alcohol.
Claim 3
Dependent Claim
42 words
A photosensitive resin composition according to claim 1, wherein the polymer (a) further contains repeating units of the formula: ##STR65## wherein R 21 is a tetravalent aromatic tetracarboxylic acid residue of the formula: ##STR66## and R 22 is a divalent aromatic group.
Claim 4
Dependent Claim
82 words
A photosensitive resin composition according to claim 1, wherein the polymer (a) further contains repeating units of the formula: ##STR67## wherein R 21 is a tetravalent aromatic tetracarboxylic acid residue of the formula: ##STR68## and R 22 is a divalent aromatic group, and repeating units comprising a residue of a tetracarboxylic acid dianhydride containing neither silicon atom nor fluorine atoms and a residue of a diamine of the formula H.sub.2 N--R.sub.15 --NH.sub.2 ( 9) wherein R 15 is a divalent organic group.
Claim 5
Dependent Claim
74 words
A photosensitive resin composition according to claim 3, wherein the component (C) is 1,6-hexane glycol diacrylate, acrylic ester of tris(2-hydroxyethyl)-isocyanuric acid, a compound of the formula: ##STR69## wherein n is an integer of 1 to 30, a compound of the formula: ##STR70## wherein n and m are independently integers and chosen so as to adjust n+m to 2-30, or a compound of the formula: ##STR71## wherein n is an integer of 1 to 30.
Claim 6
Dependent Claim
17 words
A photosensitive element comprising a base material and a photosensitive resin composition of claim 14, laminated thereon.
Claim 7
Dependent Claim
17 words
A photosensitive element comprising a base material and a photosensitive resin composition of claim 3, laminated thereon.
Claim 8
Dependent Claim
106 words
A photosensitive resin composition according to claim 1, wherein the isocyanato compound (b) is a compound of the formula: ##STR72## wherein R 61 , R 62 and R 63 are independently a hydrogen atom or a methyl group; R 64 and R 65 are independently a divalent hydrocarbon group; R 66 is a tetravalent organic group; and Y 2 , Y 3 and Y 4 are independently selected from the group consisting of hydrogen atom and monovalent organic groups having an ethylenic unsaturated group, at least one of Y 2 , Y 3 and Y 4 being a monovalent organic group having an ethylenic unsaturated group.
Claim 9
Dependent Claim
34 words
A photosensitive resin composition according to claim 7, wherein in the formula (33) R 61 and R 62 are hydrogen atoms; R 63 is a methyl group; and R 64 is an ethylene group.
Claim 10
Dependent Claim
53 words
A photosensitive resin composition according to claim 1, wherein the polymer (a) further contains repeating units comprising a residue of a tetracarboxylic acid dianhydride containing neither silicon atom nor fluorine atom and a residue of a diamine of the formula: H.sub.2 N--R.sub.15 --NH.sub.2 ( 9) wherein R 15 is a divalent organic group.
Claim 11
Dependent Claim
106 words
A photosensitive resin composition according to claim 9, wherein the isocyanato compound (b) is a compound of the formula: ##STR73## wherein R 61 , R 62 and R 63 are independently a hydrogen atom or a methyl group; R 64 and R 65 are independently a divalent hydrocarbon group; R 66 is a tetravalent organic group; and Y 2 , Y 3 and Y 4 are independently selected from the group consisting of hydrogen atom and monovalent organic groups having an ethylenic unsaturated group, at least one of Y 2 , Y 3 and Y 4 being a monovalent organic group having an ethylenic unsaturated group.
Claim 12
Dependent Claim
17 words
A photosensitive element comprising a base material and a photosensitive resin composition of claim 10, laminated thereon.
Claim 13
Dependent Claim
74 words
A photosensitive resin composition according to claim 9, wherein the component (C) is 1,6-hexane glycol diacrylate, acrylic ester of tris(2-hydroxyethyl)-isocyanuric acid, a compound of the formula: ##STR74## wherein n is an integer of 1 to 30, a compound of the formula: ##STR75## wherein n and m are independently integers and chosen so as to adjust n+m to 2-30, or a compound of the formula: ##STR76## wherein n is an integer of 1 to 30.
Claim 14
Dependent Claim
17 words
A photosensitive element comprising a base material and a photosensitive resin composition of claim 12, laminated thereon.
Claim 15
Dependent Claim
106 words
A photosensitive resin composition according to claim 1, wherein the isocyanato compound (b) is a compound of the formula: ##STR77## wherein R 61 , R 62 and R 63 are independently a hydrogen atom or a methyl group; R 64 and R 65 are independently a divalent hydrocarbon group; R 66 is a tetravalent organic group; and Y 2 , Y 3 and Y 4 are independently selected from the group consisting of hydrogen atom or monovalent organic groups having an ethylenic unsaturated group, at least one of Y 2 , Y 3 and Y 4 being a monovalent organic group having an ethylenic unsaturated group.
Claim 16
Dependent Claim
17 words
A photosensitive element comprising a base material and a photosensitive resin composition of claim 4, laminated thereon.
Claim 17
Dependent Claim
17 words
A photosensitive element comprising a base material and a photosensitive resin composition of claim 1, laminated thereon.
References Cited (Backward Citations)
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