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US5261966A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of cleaning semiconductor wafers using mixer containing a bundle of gas permeable hollow yarns

Assignee: Toshiba Corp
•
Filing: 1992-01-24
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Granted: 1993-11-16
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Expires: 2012-01-24
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Abstract

Abstract For cleaning semiconductor wafers in a cleaning vessel by supplying a cleaning fluid through a supply line thereto, a mixer is provided. Deionized water is supplied to the mixer through a deionized water supply line, and a cleaning gas is supplied thereto from a gas reservoir to produce the cleaning fluid. After treating the semiconductor wafers with the cleaning fluid, the deionized water is supplied to the cleaning vessel to rinse them.

Inventors

  • 👤 Noriyoshi Mashimo
  • 👤 Katsuya Okumura

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 03:49
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/20; B; B08; B08B; B08B9/00; B08B9/02; B08B9/027; B08B3/00; B08B3/04; B08B3/08; H10P72/00; H10P72/04; H10P72/0402; H10P72/0406; H10P72/0411; H10P72/0416; B08B2203/00; B08B2203/005; Y; Y10; Y10S; Y10S134/00; Y10S134/902

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 68 words
A method for cleaning semiconductor wafers comprising the steps of: placing a plurality of semiconductor wafers in a cleaning vessel; supplying deionized water through a deionized water supply line to a mixer including a bundle of gas permeable hollow yarns, while supplying a cleaning gas thereto from a gas reservoir, thereby providing a cleaning fluid; and supplying said cleaning fluid to said cleaning vessel through a supply line.
Claim 2
Independent Claim 68 words
A method for cleaning semiconductor wafers comprising the steps of: placing a plurality of semiconductor wafers in a cleaning vessel; supplying deionized water through a deionized water supply line to a mixer including a bundle of gas permeable hollow yarns, while supplying a cleaning gas thereto from a gas reservoir, thereby providing a cleaning fluid; and supplying said cleaning fluid to said cleaning vessel through a supply line.
Claim 3
Dependent Claim 23 words
The method for cleaning semiconductor wafers according to claim 1, wherein said cleaning gas is dissolved in said deionized water by said mixer.
Claim 4
Dependent Claim 26 words
The method for cleaning semiconductor wafers according to claim 1, wherein said cleaning vessel, said mixer and said gas reservoir are disposed in the same housing.
Claim 5
Dependent Claim 46 words
The method for cleaning semiconductor wafers according to claim 1, wherein said cleaning gas is selected from a hydrogen fluoride gas, a hydrogen chloride gas, an ammonia gas, a chlorine gas, a fluorine gas, a sulfurous acid gas, an ozone gas and a nitrous acid gas.
Claim 6
Dependent Claim 31 words
The method for cleaning semiconductor wafers according to claim 1, wherein different kinds of cleaning fluids are subsequently supplied to said cleaning vessel by exchanging cleaning gases supplied to said mixer.
Claim 7
Dependent Claim 39 words
The method for cleaning semiconductor wafers according to claim 1, wherein said deionized water is only supplied to said cleaning vessel through said supply line to rinse said plurality of semiconductor wafers after treating them with said cleaning fluid.
Claim 8
Dependent Claim 26 words
The method for cleaning semiconductor wafers according to claim 1, wherein said cleaning fluid is supplied to a plurality of cleaning vessels at the same time.
Claim 9
Dependent Claim 39 words
The method for cleaning semiconductor wafers according to claim 1, wherein said deionized water is supplied to said cleaning vessel through a separate supply line to rinse said plurality of semiconductor wafers after treating them with said cleaning fluid.

References Cited (Backward Citations)

US4552783A Cited
US4673443A Cited
US4778532A Cited
JPH02164035A Cited
JPH03232227A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-11-15 1997-05-17 1997-11-16 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-11-15 2001-05-17 2001-11-16 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-11-15 2005-05-17 2005-11-16 $7700.00 Window Closed / Lapsed

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