US5250116A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Resist film coating apparatus
Assignee: Sharp Corp
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Filing: 1992-05-19
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Granted: 1993-10-05
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Expires: 2012-05-19
Abstract
Abstract A resist film coating apparatus comprises a resist receiving plate secured to a rotatable support plate carrying a wafer so as to be disposed along the outer periphery of the wafer, an interference type film thickness meter for measuring the thickness of a resist film spun out to the resist receiving plate, and modifying means for changing the revolution number of the support plate on the basis of a result of measurement by the film thickness meter such that a desired resist film thickness can be obtained.
Inventors
- 👤 Keisuke Tanimoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 17:06
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0448; B; B05; B05C; B05C11/00; B05C11/02; B05C11/08; B05C11/10; B05C11/1002; B05C11/1005
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
161 words
A resist film coating apparatus having a rotatable support plate carrying a wafer, a resist receiving plate arranged along the outer periphery of said support plate, a resist feeder for supplying resist onto the wafer carried on said support plate and a spin drive for rotating said support plate at a predetermined revolution number, wherein said resist receiving plate is secured to said support plate so as to be disposed along the outer periphery of said wafer, and further said apparatus comprising measuring means for measuring the film thickness of resist spun out from said wafer to said resist receiving plate, and modifying means for calculating a necessary revolution number of said support plate to provide a predetermined film thickness on the basis of a result of the resist film thickness measurement by said measuring means and changing the predetermined revolution number of said spin drive such that the revolution number of said support plate coincides with a result of calculation.
Claim 2
Dependent Claim
161 words
A resist film coating apparatus having a rotatable support plate carrying a wafer, a resist receiving plate arranged along the outer periphery of said support plate, a resist feeder for supplying resist onto the wafer carried on said support plate and a spin drive for rotating said support plate at a predetermined revolution number, wherein said resist receiving plate is secured to said support plate so as to be disposed along the outer periphery of said wafer, and further said apparatus comprising measuring means for measuring the film thickness of resist spun out from said wafer to said resist receiving plate, and modifying means for calculating a necessary revolution number of said support plate to provide a predetermined film thickness on the basis of a result of the resist film thickness measurement by said measuring means and changing the predetermined revolution number of said spin drive such that the revolution number of said support plate coincides with a result of calculation.
Claim 3
Dependent Claim
41 words
A resist film coating apparatus according to claim 1 wherein a plate having at its top a reflective surface is used as said resist receiving plate and an interference type film thickness meter is used as said film thickness measuring means.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-10-04 | 1997-04-05 | 1997-10-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-10-04 | 2001-04-05 | 2001-10-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-10-04 | 2005-04-05 | 2005-10-05 | $7700.00 | Window Closed / Lapsed |