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Aluminum metallization doped with iron and copper to prevent electromigration

Assignee: Nokia Bell Labs
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Filing: 1993-01-05
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Granted: 1993-09-07
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Expires: 2013-01-05
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Abstract

Abstract Stress induced grain boundary movement in aluminum lines used as connections in integrated circuits is substantially avoided by doping the aluminum with iron. Through this expedient not only is grain boundary movement avoided but electromigration problems are also decreased.

Inventors

  • 👤 Vivian W. Ryan
  • 👤 Ronald J. Schutz

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 17:17
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/40; H10W20/41; H10W20/44; H10W20/4403; H10W20/4405; H10W20/4407; H10W20/45; H10W20/48

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 82 words
A semiconductor device comprising a substrate comprising a silicon semiconductor material including active regions with electrical interconnects between said active regions wherein at least a portion of said interconnects are made with a material comprising iron doped aluminum whereby the tensile strength of said iron doped aluminum material is increased at least 15 percent relative to that obtained for aluminum doped with 0.5 atomic percent copper and wherein contact to said active regions is between said material and a second electrical conductor.
Claim 2
Dependent Claim 82 words
A semiconductor device comprising a substrate comprising a silicon semiconductor material including active regions with electrical interconnects between said active regions wherein at least a portion of said interconnects are made with a material comprising iron doped aluminum whereby the tensile strength of said iron doped aluminum material is increased at least 15 percent relative to that obtained for aluminum doped with 0.5 atomic percent copper and wherein contact to said active regions is between said material and a second electrical conductor.
Claim 3
Dependent Claim 20 words
The device of claim 1 wherein said iron doped aluminum comprises aluminum doped with up to 0.5 atomic percent copper.
Claim 4
Dependent Claim 10 words
The device of claim 1 wherein said aluminum includes silicon.

References Cited (Backward Citations)

US3725309A Cited
US3900598A Cited
US4268584A Cited
US5019891A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-09-06 1997-03-08 1997-09-07 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-09-06 2001-03-08 2001-09-07 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-09-06 2005-03-08 2005-09-07 $7700.00 Window Closed / Lapsed

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