Reticle for a reduced projection exposure apparatus

Claim 1

A reticle for use in a reduction exposure apparatus to project a pattern formed on said reticle onto a photoresist film formed on a semiconductor wafer which is set on an X-Y stage to form a reduction pattern image in said photoresist film, said pattern formed on said reticle being larger in size than said reduction pattern image in said photoresist film by n times, n being a number, said reticle comprising: a pattern forming area having a rectangular shape formed on a transparent substrate, said pattern forming area having first and second edge lines extending parallel to each other in a first direction; a light shielding area formed on said transparent substrate and surrounding said pattern forming area; a first measuring pattern of a transparent pattern positioned in a vicinity of said first edge line and having a first center; a first light shielding pattern formed on said transparent substrate, and surrounding and delineating said first measuring pattern of said transparent pattern; a second measuring pattern of a second light shielding pattern formed in a vicinity of said second edge line and having a second center, said second center being positioned on a straight line extending in a second direction perpendicular to said first direction with said first center of said first measuring pattern and being remote from said first center by a first distance in said second direction; said first measuring pattern of said transparent pattern, said first light shielding pattern and said second measuring pattern of said second light shielding pattern having sizes and configurations, respectively, to form reduction pattern images of said first measuring pattern and said first light shielding pattern on said photoresist film formed on said semiconductor wafer by one shot of light, and to form a reduction pattern image of said second measuring pattern on said photoresist film by another shot of light, and moving said X-Y stage, at a time between said one shot of light and said another shot of light, by a second distance of said 1/n times said first distance, said movement of said X/Y stage being far enough in said second direction in order to overlap said reduction pattern images of said first and second measuring patterns relative to each other, said reduction pattern image of said second measuring pattern completely covering said reduction pattern image of said first measuring pattern, and said reduction pattern image of said first light shielding pattern completely covering at least the outline of said reduction pattern image of said second measuring pattern; whereby said reticle is used for measuring an in-field error including a reticle rotation and a magnification error in said reduction exposure apparatus.