US5236602A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Dense fluid photochemical process for liquid substrate treatment
Assignee: Raytheon Co
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Filing: 1991-01-28
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Granted: 1993-08-17
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Expires: 2011-01-28
Abstract
Abstract A process for removing undesired material from a chosen substrate by exposing the substrate simultaneously to ultraviolet radiation and a selected dense fluid, wherein the radiation produces a photochemical reaction that removes the undesired material from the substrate and the dense fluid enhances the removal of the undesired material. In an alternative embodiment, a reactive agent may additionally be used. The process may be used to remove contaminants from a substrate, etch a substrate surface, or destroy toxic organic material in industrial wastes.
Inventors
- 👤 David P. Jackson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 21:53
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0404; B; B08; B08B; B08B3/00; B08B3/04; B08B3/10; B08B3/12; B08B7/00; B08B7/0021; B08B7/0035; B08B7/0057; C; C23; C23G; C23G5/00; H05; H05K; H05K3/00; H05K3/22; H05K3/26; Y; Y10; Y10S; Y10S210/00; Y10S210/902; Y10S210/908
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
119 words
A process for removing undesired material from a chosen liquid substrate comprising the steps of: a) placing said liquid substrate containing said undesired material in a cleaning vessel; b) contacting said liquid substrate containing said undesired material with a chosen dense phase gas above the critical pressure and critical temperature of said gas, said gas being capable of producing a cleaning effect to assist in the removal of said undesired material from said substrate; and c) exposing said substrate and said dense phase gas to radiation of a predetermined wavelength to produce a photochemical reaction that removes said undesired material from said liquid substrate wherein said dense phase gas enhances the removal of said undesired material from said substrate.
Claim 2
Dependent Claim
119 words
A process for removing undesired material from a chosen liquid substrate comprising the steps of: a) placing said liquid substrate containing said undesired material in a cleaning vessel; b) contacting said liquid substrate containing said undesired material with a chosen dense phase gas above the critical pressure and critical temperature of said gas, said gas being capable of producing a cleaning effect to assist in the removal of said undesired material from said substrate; and c) exposing said substrate and said dense phase gas to radiation of a predetermined wavelength to produce a photochemical reaction that removes said undesired material from said liquid substrate wherein said dense phase gas enhances the removal of said undesired material from said substrate.
Claim 3
Dependent Claim
22 words
A process as set forth in claim 1 wherein said radiation comprises ultraviolet radiation within the range of 184 to 300 nanometers.
Claim 4
Dependent Claim
28 words
A process as set forth in claim 1 wherein said dense phase gas is selected from the group consisting of carbon dioxide, nitrous oxide, krypton, xenon, and oxygen.
Claim 5
Dependent Claim
37 words
A process as set forth in claim 1 wherein step "b" further comprises contacting said substrate with a chosen reactive agent capable of reacting with said undesired material to thereby enhance the removal of said undesired material.
Claim 6
Dependent Claim
32 words
A process as set forth in claim 4 wherein said chosen reactive agent is selected from the group consisting of an oxygen containing compound, a halogen containing compound, and a hydrogen-containing compound.
Claim 7
Dependent Claim
25 words
A process as set forth in claim 5 wherein said chosen reactive agent is selected from the group consisting of oxygen, ozone, and hydrogen peroxide.
Claim 8
Dependent Claim
19 words
A process as set forth in claim 6 wherein said chosen reactive agent comprises ozone in a supercritical state.
Claim 9
Dependent Claim
29 words
A process as set forth in claim 1 wherein said undesired material is selected from the group consisting of an organic material, an inorganic material, and an ionic material.
Claim 10
Dependent Claim
36 words
A process as set forth in claim 1 further comprising after step "c" removing said dense phase gas containing said undesired material from said cleaning vessel and adding clean dense phase gas to said cleaning vessel.
Claim 11
Dependent Claim
18 words
A process as set forth in claim 1 wherein said undesired material comprises contaminants dissolved in said liquid.
Claim 12
Dependent Claim
29 words
A process as set forth in claim 10 wherein said contaminants comprise toxic materials and said contaminants are removed from said substrate by being chemically altered to non-toxic materials.
Claim 13
Dependent Claim
18 words
A process as set forth in claim 1 wherein said undesired material comprises contaminants suspended in said liquid.
Claim 14
Dependent Claim
29 words
A process as set forth in claim 12 wherein said contaminants comprise toxic materials and said contaminants are removed from said substrate by being chemically altered to non-toxic materials.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-08-16 | 1997-02-15 | 1997-08-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-08-16 | 2001-02-15 | 2001-08-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-08-16 | 2005-02-15 | 2005-08-17 | $7700.00 | Window Closed / Lapsed |