US5233210A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Non-volatile memory and method for fabricating same
Assignee: NEC Electronics Corp
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Filing: 1991-08-14
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Granted: 1993-08-03
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Expires: 2011-08-14
Abstract
Abstract A non-volatile memory includes a sheet-shaped source line consisting of a conductive layer. The source line includes an opening at an area including a bit contact area above a drain diffusion layer. The bit contact is formed through self-alignment to the opening of the source line and a control gate electrode. In such a structure, a pitch of the bit contact in the direction parallel to the control gate electrode can be set to be a value twice of the minimum size in design.
Inventors
- 👤 Noriaki Kodama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 16:22
CPC Classifications
H; H10; H10B; H10B69/00
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
159 words
A non-volatile memory, comprising: a plurality of cell array regions arranged in parallel with each other, each of said cell array regions crossing a plurality of control gate electrodes and including a plurality of floating gate electrodes each positioned at each crossing point between said control gate electrodes and said cell array regions, a plurality of pairs of source diffusion layers and drain diffusion layers, each of said pairs positioned to bracket a control gate electrode, and source contacts each formed on a corresponding source diffusion layer by self-alignment via said control gate electrodes; a source line connected with each source diffusion layer through a source contact and having drain openings at each area of said drain diffusion layers; a plurality of bit contacts formed within said drain openings; and a plurality of bit lines arranged in parallel with said cell array regions, each bit line being connected with at least one drain diffusion layer through corresponding bit contacts.
Claim 2
Dependent Claim
159 words
A non-volatile memory, comprising: a plurality of cell array regions arranged in parallel with each other, each of said cell array regions crossing a plurality of control gate electrodes and including a plurality of floating gate electrodes each positioned at each crossing point between said control gate electrodes and said cell array regions, a plurality of pairs of source diffusion layers and drain diffusion layers, each of said pairs positioned to bracket a control gate electrode, and source contacts each formed on a corresponding source diffusion layer by self-alignment via said control gate electrodes; a source line connected with each source diffusion layer through a source contact and having drain openings at each area of said drain diffusion layers; a plurality of bit contacts formed within said drain openings; and a plurality of bit lines arranged in parallel with said cell array regions, each bit line being connected with at least one drain diffusion layer through corresponding bit contacts.
Claim 3
Dependent Claim
21 words
A non-volatile memory, according to claim 1, wherein said source line is provided with a plurality of ultraviolet ray transmission windows.
References Cited (Backward Citations)
US5053841A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-08-02 | 1997-02-01 | 1997-08-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-08-02 | 2001-02-01 | 2001-08-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-08-02 | 2005-02-01 | 2005-08-03 | $7700.00 | Window Closed / Lapsed |