← Back to Patent Explorer
US5233210A Expired / Lapsed US ⏱️ 0.0 years remaining

Non-volatile memory and method for fabricating same

Assignee: NEC Electronics Corp
•
Filing: 1991-08-14
•
Granted: 1993-08-03
•
Expires: 2011-08-14
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A non-volatile memory includes a sheet-shaped source line consisting of a conductive layer. The source line includes an opening at an area including a bit contact area above a drain diffusion layer. The bit contact is formed through self-alignment to the opening of the source line and a control gate electrode. In such a structure, a pitch of the bit contact in the direction parallel to the control gate electrode can be set to be a value twice of the minimum size in design.

Inventors

  • 👤 Noriaki Kodama

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-03 16:22
CPC Classifications
H; H10; H10B; H10B69/00

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 159 words
A non-volatile memory, comprising: a plurality of cell array regions arranged in parallel with each other, each of said cell array regions crossing a plurality of control gate electrodes and including a plurality of floating gate electrodes each positioned at each crossing point between said control gate electrodes and said cell array regions, a plurality of pairs of source diffusion layers and drain diffusion layers, each of said pairs positioned to bracket a control gate electrode, and source contacts each formed on a corresponding source diffusion layer by self-alignment via said control gate electrodes; a source line connected with each source diffusion layer through a source contact and having drain openings at each area of said drain diffusion layers; a plurality of bit contacts formed within said drain openings; and a plurality of bit lines arranged in parallel with said cell array regions, each bit line being connected with at least one drain diffusion layer through corresponding bit contacts.
Claim 2
Dependent Claim 159 words
A non-volatile memory, comprising: a plurality of cell array regions arranged in parallel with each other, each of said cell array regions crossing a plurality of control gate electrodes and including a plurality of floating gate electrodes each positioned at each crossing point between said control gate electrodes and said cell array regions, a plurality of pairs of source diffusion layers and drain diffusion layers, each of said pairs positioned to bracket a control gate electrode, and source contacts each formed on a corresponding source diffusion layer by self-alignment via said control gate electrodes; a source line connected with each source diffusion layer through a source contact and having drain openings at each area of said drain diffusion layers; a plurality of bit contacts formed within said drain openings; and a plurality of bit lines arranged in parallel with said cell array regions, each bit line being connected with at least one drain diffusion layer through corresponding bit contacts.
Claim 3
Dependent Claim 21 words
A non-volatile memory, according to claim 1, wherein said source line is provided with a plurality of ultraviolet ray transmission windows.

References Cited (Backward Citations)

US5053841A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-08-02 1997-02-01 1997-08-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-08-02 2001-02-01 2001-08-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-08-02 2005-02-01 2005-08-03 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag