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US5231839A Expired / Lapsed US ⏱️ 0.0 years remaining

Methods and apparatus for cryogenic vacuum pumping with reduced contamination

Assignee: GVT Inc
•
Filing: 1991-11-27
•
Granted: 1993-08-03
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Expires: 2011-11-27
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Abstract

Abstract Apparatus for vacuum pumping an enclosed chamber includes a cryopump in gas communication with the chamber for removing gases by cryocondensation and cryotrapping and an auxiliary pumping device for removing gases that are difficult to remove by cryocondensation or cryotrapping. The cryopump does not contain a sorbent material for cryosorption. As a result, the potential for contamination by a sorbent material is eliminated. The auxiliary pumping device can comprise an ion pump or a turbomolecular vacuum pump. When an ion pump is used, the ion pump is inactivated during periods of high gas loading in the chamber. The vacuum pumping apparatus is particularly useful for vacuum pumping of a plasma vapor deposition chamber.

Inventors

  • 👤 Johan E. de Rijke
  • 👤 Frank W. Engle

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 05:17
CPC Classifications
F; F04; F04B; F04B37/00; F04B37/06; F04B37/08; Y; Y10; Y10S; Y10S417/00; Y10S417/901

Claims Analysis

Total Claims: 17
Claim 1
Independent Claim 90 words
Apparatus for vacuum pumping an enclosed chamber, comprising: a cryogenic pumping device having first and second stage cryoarrays, said pumping device adapted to be in fluid communication with said chamber for removing gases from the chamber by cryocondensation and cryotrapping, said cryogenic pumping device being free of sorbent material for cryosorption; mechanical refrigeration means for cooling said first and said second stage cryoarrays; and an auxiliary pumping device in fluid communication with said cryogenic pumping device for removing from said cryogenic pumping device gases that are normally removed by cryosorption.
Claim 2
Dependent Claim 90 words
Apparatus for vacuum pumping an enclosed chamber, comprising: a cryogenic pumping device having first and second stage cryoarrays, said pumping device adapted to be in fluid communication with said chamber for removing gases from the chamber by cryocondensation and cryotrapping, said cryogenic pumping device being free of sorbent material for cryosorption; mechanical refrigeration means for cooling said first and said second stage cryoarrays; and an auxiliary pumping device in fluid communication with said cryogenic pumping device for removing from said cryogenic pumping device gases that are normally removed by cryosorption.
Claim 3
Dependent Claim 15 words
Apparatus as defined in claim 1 wherein said auxiliary pumping device comprises an ion pump.
Claim 4
Dependent Claim 30 words
Apparatus as defined in claim 2 wherein said auxiliary pumping device further comprises means for inactivating said ion pump during periods of high gas loading in said cryogenic pumping device.
Claim 5
Dependent Claim 39 words
Apparatus as defined in claim 3 wherein said means for inactivating comprises a valve connected between said ion pump and said cryogenic pumping device, said valve being closed during periods of high gas loading in said cryogenic pumping device.
Claim 6
Dependent Claim 30 words
Apparatus as defined in claim 3 wherein said means for inactivating comprises means for electrically deenergizing said ion pump during periods of high gas loading in said cryogenic pumping device.
Claim 7
Dependent Claim 22 words
Apparatus as defined in claim 1 wherein said auxiliary pumping device comprises a turbomolecular vacuum pump connected to said cryogenic pumping device.
Claim 8
Dependent Claim 84 words
Apparatus for vacuum pumping a plasma vapor deposition chamber, comprising: a cryogenic pumping device having a first and a second stage, said pumping device adapted to be in fluid communication with said chamber for removing argon and other gases from the chamber, said cryogenic pumping device being free of sorbent material for cryosorption; mechanical refrigeration means for cooling said first and second stages; and an auxiliary pumping device in fluid communication with said pumping device for removing helium and neon from said pumping device.
Claim 9
Dependent Claim 84 words
Apparatus for vacuum pumping a plasma vapor deposition chamber, comprising: a cryogenic pumping device having a first and a second stage, said pumping device adapted to be in fluid communication with said chamber for removing argon and other gases from the chamber, said cryogenic pumping device being free of sorbent material for cryosorption; mechanical refrigeration means for cooling said first and second stages; and an auxiliary pumping device in fluid communication with said pumping device for removing helium and neon from said pumping device.
Claim 10
Dependent Claim 31 words
Apparatus as defined in claim 7 wherein said auxiliary pumping device comprises an ion pump and means for inactivating said ion pump during plasma vapor deposition in said cryogenic pumping device.
Claim 11
Dependent Claim 25 words
Apparatus as defined in claim 8 wherein means for inactivating comprises means for electrically deenergizing said ion pump during plasma vapor deposition in said chamber.
Claim 12
Dependent Claim 22 words
Apparatus as defined in claim 7 wherein said auxiliary pumping device comprises a turbomolecular vacuum pump connected to said cryogenic pumping device.
Claim 13
Independent Claim 71 words
A method for vacuum pumping a plasma vapor deposition chamber, comprising the steps of: cooling to cryogenically pumping temperatures the first and second stages of a cryogenic pump; cryogenically pumping gases from said chamber with said cryogenic pump, said pump being free of sorbent material for cryosorption; mechanically cooling said first and second stage to cryogenic pumping temperatures; and pumping helium and neon from said pump with an auxiliary pumping device.
Claim 14
Independent Claim 71 words
A method for vacuum pumping a plasma vapor deposition chamber, comprising the steps of: cooling to cryogenically pumping temperatures the first and second stages of a cryogenic pump; cryogenically pumping gases from said chamber with said cryogenic pump, said pump being free of sorbent material for cryosorption; mechanically cooling said first and second stage to cryogenic pumping temperatures; and pumping helium and neon from said pump with an auxiliary pumping device.
Claim 15
Dependent Claim 38 words
A method as defined in claim 11 wherein the step of pumping helium and neon from said chamber includes suspending plasma vapor deposition and pumping helium and neon with an ion pump when plasma vapor deposition is suspended.
Claim 16
Dependent Claim 21 words
A method as defined in claim 12 further including the step of electrically deenergizing said ion pump during plasma vapor deposition.
Claim 17
Dependent Claim 25 words
A method as defined in claim 11 wherein the step of pumping helium and neon from said pump is performed with a turbomolecular vacuum pump.

References Cited (Backward Citations)

US3137551A Cited
US3262279A Cited
US3485054A Cited
US3536418A Cited
US3721101A Cited
US4023398A Cited
US4488506A Cited
US4438632A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-08-02 1997-02-01 1997-08-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-08-02 2001-02-01 2001-08-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-08-02 2005-02-01 2005-08-03 $7700.00 Window Closed / Lapsed

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