Plasma source and method of manufacturing

Claim 2

A plasma source for generating a plasma in a chamber in conjunction with a radio frequency generator operable to generate a radio frequency wave, the plasma source comprising: a coil spiral for conducting the radio frequency wave from the radio frequency generator and inducing a plasma in the chamber, the coil spiral comprising at least two segments; at least one insulator, each insulator for coupling adjacent segments of the coil spiral; and at least one capacitor, each capacitor coupled in series between adjacent segments of the coil spiral.

Claim 3

The plasma source of claim 1 wherein the coil spiral comprises at least two segments, each segment having a generally equivalent voltage drop across its ends.

Claim 4

The plasma source of claim 1 wherein the capacitance of each capacitor is selected such that the voltage drop across each capacitor is generally equal in magnitude and opposite in polarity to the voltage drop across the adjacent segment.

Claim 5

The plasma source of claim 1 wherein the coil spiral and insulators further comprise an internal passageway for receiving a flow of coolant therethrough.

Claim 6

The plasma source of claim 1 wherein the coil spiral, at least one insulator and at least one capacitor are encapsulated in epoxy.

Claim 7

The plasma source of claim 1 further comprising a ground shield adjacent to the coil spiral.

Claim 8

The plasma source of claim 1 wherein the coil spiral has a conical profile.

Claim 9

A plasma source for generating a plasma in a chamber in conjunction with a radio frequency generator operable to generate a radio frequency wave, the plasma source comprising: a coil spiral for conducting the radio frequency wave from the radio frequency generator and inducing a plasma in the chamber, the coil spiral comprising at least two segments, each segment having a generally equivalent voltage drop across its ends; at least one insulator, each insulator for coupling adjacent segments of the coil spiral; and at least one capacitor, each capacitor coupled in series between adjacent segments of the coil spiral, the capacitance of each capacitor selected such that the voltage drop across each capacitor is generally equal in magnitude and opposite in polarity to the voltage drop across the adjacent segment.

Claim 10

A plasma source for generating a plasma in a chamber in conjunction with a radio frequency generator operable to generate a radio frequency wave, the plasma source comprising: a coil spiral for conducting the radio frequency wave from the radio frequency generator and inducing a plasma in the chamber, the coil spiral comprising at least two segments, each segment having a generally equivalent voltage drop across its ends; at least one insulator, each insulator for coupling adjacent segments of the coil spiral; and at least one capacitor, each capacitor coupled in series between adjacent segments of the coil spiral, the capacitance of each capacitor selected such that the voltage drop across each capacitor is generally equal in magnitude and opposite in polarity to the voltage drop across the adjacent segment.

Claim 11

The plasma source of claim 8 wherein the coil spiral, at least one insulator and at least one capacitor are encapsulated in epoxy.

Claim 12

The plasma source of claim 8 further comprising a ground shield adjacent the coil spiral.

Claim 13

The plasma source of claim 9 wherein the coil spiral and insulators further comprise an internal passageway for receiving a flow of coolant therethrough.

Claim 14

The plasma source of claim 8 further comprising a ground shield adjacent the coil spiral.

Claim 17

The method of claim 13 wherein the step of segmenting further comprises the step of segmenting the coil spiral into a predetermined number of pieces, each piece having a generally equivalent voltage drop across its ends.

Claim 18

The method of claim 13 wherein the step of coupling further comprises the step of coupling each piece of the coil spiral to each adjacent piece with a capacitor such that the voltage drop across the capacitor is generally equal in magnitude and opposite in polarity to the voltage drop across the adjacent piece of coil spiral.

Claim 19

The method of claim 14 further comprising the step of encasing the coil spiral and capacitors are encapsulated in epoxy.

Claim 20

The method of claim 16 further comprising the step of encapsulating the coil spiral and capacitors in epoxy.

Claim 21

The method of claim 13 further comprising the step of encapsulating the coil spiral and capacitors in epoxy.