US5223377A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Interrupted developing process for a photoresist image
Assignee: Imec
•
Filing: 1990-08-29
•
Granted: 1993-06-29
•
Expires: 2010-08-29
Abstract
Abstract A process of developing a photoresist by contacting the photoresist with a developer is improved by subjecting the photoresist to heat prior to completion of the development process.
Inventors
- 👤 Nandasiri Samarakone
- 👤 Patrick Jaenen
- 👤 Luc Van den hove
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 18:56
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
55 words
In a process of developing an imaged photoactive compound-containing positive photoresist of novolak phenolic resin by contacting the photoresist with a liquid alkaline developer to obtain a relief image, the improvement which comprises interrupting the development prior to completion of the development process and subjecting the photoresist to heat and then completing the development process.
Claim 2
Dependent Claim
55 words
In a process of developing an imaged photoactive compound-containing positive photoresist of novolak phenolic resin by contacting the photoresist with a liquid alkaline developer to obtain a relief image, the improvement which comprises interrupting the development prior to completion of the development process and subjecting the photoresist to heat and then completing the development process.
Claim 3
Dependent Claim
16 words
The process of claim 1 in which the heat applied is about 30° to 90° C.
Claim 4
Dependent Claim
17 words
The process of claim 2 in which the heat is applied for about 10 to 60 seconds.
Claim 5
Dependent Claim
32 words
The process of claim 3 in which the contacting of the photoresist with the developer is interrupted for said heat treatment when about 1/3 to 2/3 of the development time has elapsed.
Claim 6
Dependent Claim
25 words
The process of claim 4 in which the heat applied is about 35° to 60° C. and is applied for about 20 to 40 seconds.
Claim 7
Dependent Claim
30 words
The process of claim 5 in which the contact of the photoresist with the developer is interrupted for said heat treatment at about 50% of the development of the photoresist.
Claim 8
Dependent Claim
25 words
The process of claim 1 in which the contact of the photoresist with the developer is interrupted for said heat treatment a plurality of times.
Claim 9
Dependent Claim
15 words
The process of claim 1 in which the photoresist is heated by an infrared lamp.
Claim 10
Dependent Claim
14 words
The process of claim 1 in which the photoresist is heated by heated gas.
Claim 11
Dependent Claim
14 words
The process of claim 1 in which the photoresist is heated by heated water.
Claim 12
Dependent Claim
15 words
The process of claim 10 in which the photoresist is rinsed with water before heating.
Claim 13
Dependent Claim
26 words
The process of claim 10 in which the photoresist is rinsed with room temperature water before and after heating and during the interruption of the development.
Claim 14
Dependent Claim
15 words
The process of claim 1 in which the photoresist is rinsed with water before heating.
Claim 15
Dependent Claim
40 words
The process of claim 1 comprising the additional steps before commencement of development of arranging a photomast representing the pattern to be imaged on a photoresist coated substrate and exposing the photoresist coated substrate to radiation energy through said mask.
Claim 16
Dependent Claim
42 words
The process of claim 14 comprising the additional steps before commencement of development of coating a substrate with a photoresist composition and baking the photoresist composition coated substrate to remove any residual solvent therein before arranging the mask on the coated substrate.
Claim 17
Dependent Claim
26 words
The process of claim 1 in which the photoresist is contacted with the developer before and after the heating for about the same length of time.
Claim 18
Dependent Claim
20 words
The process of claim 16 in which each contacting with developer is carried out for about 10 to 40 seconds.
Claim 19
Dependent Claim
20 words
The process of claim 17 in which each contacting with developer is carried out for about 20 to 30 seconds.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-06-28 | 1996-12-28 | 1997-06-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-06-28 | 2000-12-28 | 2001-06-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-06-28 | 2004-12-28 | 2005-06-29 | $7700.00 | Window Closed / Lapsed |