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US5222090A Expired / Lapsed US ⏱️ 0.0 years remaining

700-850 nanometer semiconductor diode laser

Assignee: University of Missouri System
•
Filing: 1992-03-05
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Granted: 1993-06-22
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Expires: 2012-03-05
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Abstract

Abstract Disclosed herein is a semiconductor laser device comprised of a semiconductor substrate having deposited thereon at least one quantum well active region comprised of an alloy of the group consisting of GaInAsP and AlGaInAs sandwiched between upper and lower confinement layers of AlGaInAsP alloy. The laser device is further comprised of AlGaInP cladding layers.

Inventors

  • 👤 Harvey B. Serreze

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 12:59
CPC Classifications
B; B82; B82Y; B82Y20/00; H; H01; H01S; H01S5/00; H01S5/30; H01S5/34; H01S5/343; H01S5/32; H01S5/3211; H01S5/34306; H01S5/34313; H01S5/3434

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 127 words
A semiconductor laser device, comprising: (a) a substrate; (b) at least one quantum well active region comprised of an alloy of the group consisting of GaInAsP and AlGaInAs sandwiched between first and second confinement layers deposited upon a first and second surface of said quantum well active region, respectively, both said confinement layers comprised of an AlGaInAsP alloy; (c) an n-type cladding layer deposited upon said first confinement layer, said n-type cladding layer comprised of an AlGaInP alloy; (d) a p-type cladding layer deposited upon said second confinement layer, said p-type cladding layer comprised of an AlGaInP alloy; and (e) a p-type cap layer and metalization and n-type buffer layer and metalization deposited upon the p-type and n-type cladding layers respectively for applying an electric voltage thereto.
Claim 2
Dependent Claim 127 words
A semiconductor laser device, comprising: (a) a substrate; (b) at least one quantum well active region comprised of an alloy of the group consisting of GaInAsP and AlGaInAs sandwiched between first and second confinement layers deposited upon a first and second surface of said quantum well active region, respectively, both said confinement layers comprised of an AlGaInAsP alloy; (c) an n-type cladding layer deposited upon said first confinement layer, said n-type cladding layer comprised of an AlGaInP alloy; (d) a p-type cladding layer deposited upon said second confinement layer, said p-type cladding layer comprised of an AlGaInP alloy; and (e) a p-type cap layer and metalization and n-type buffer layer and metalization deposited upon the p-type and n-type cladding layers respectively for applying an electric voltage thereto.
Claim 3
Dependent Claim 39 words
A semiconductor laser device, as recited in claim 1, wherein said first and second confinement layers, said n-type cladding layer, and said p-type cladding layer each have a lattice constant substantially equal to the lattice constant of said substrate.
Claim 4
Dependent Claim 49 words
A semiconductor laser device, as recited in claim 2, wherein each of said n-type and p-type cladding layers are comprised of a compound selected from the group consisting of (Al 0 .8 Ga 0 .2) 0 .5 In 0 .5 P and Al 0 .5 In 0 .5 P.
Claim 5
Dependent Claim 25 words
A semiconductor laser device, as recited in claim 2, wherein said quantum well active region is comprised of Ga 0 .5 In 0 .5 AsP.
Claim 6
Dependent Claim 41 words
A semiconductor laser device, as recited in claim 4, wherein said first and second confinement layers are comprised of a compound selected from the group consisting of (Al 0 .2 Ga 0 .8) 0 .5 In 0 .5 P and GaInP.
Claim 7
Dependent Claim 19 words
A semiconductor laser device, as recited in claim 2, wherein said quantum well active region is comprised of AlGaInAs.
Claim 8
Dependent Claim 31 words
A semiconductor laser device, as recited in claim 6, wherein said first and second confinement layers are comprised of (Al 0 .2 Ga 0 .8) 0 .5 In 0 .5 P.
Claim 9
Dependent Claim 37 words
A semiconductor laser device, as recited in claim 2, wherein said first and second confinement layers are comprised of (Al x Ga 1-x ) 0 .5 In 0 .5 P wherein x varies from 0 to 1.0.

References Cited (Backward Citations)

US4860297A Cited
US4841531A Cited
US5016252A Cited
US5153889A Cited
JPH0442985A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-06-21 1996-12-21 1997-06-22 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-06-21 2000-12-21 2001-06-22 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-06-21 2004-12-21 2005-06-22 $7700.00 Window Closed / Lapsed

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