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US5220044A
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Ligand stabilized +1 metal beta-diketonate coordination complexes and their use in chemical vapor deposition of metal thin films
Assignee: GlobalFoundries Inc
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Filing: 1992-03-16
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Granted: 1993-06-15
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Expires: 2012-03-16
Abstract
Abstract Chemical vapor deposition precursors for depositing copper, silver, rhodium and iridium metals on substrates comprise ligand stabilized +1 metal beta-diketonate coordination complexes of said metals. Uses of such precursors in CVD processes are also provided.
Inventors
- 👤 Thomas H. Baum
- 👤 Carl E. Larson
- 👤 Scott K. Reynolds
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:53
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/06; C23C16/18; H; H05; H05K; H05K3/00; H05K3/40; H05K3/4038; H05K3/4076
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
120 words
A precursor compound for the chemical vapor deposition of a metal selected from the group consisting of copper and silver, comprising a metal (I) beta-diketonate chelation complex stabilized by a coordinating ligand, having the formula: ##STR1## wherein M is Cu (I) or Ag (I), and wherein R 2 is --H, methyl, ethyl, or halogen, and wherein R 1 and R 3 are selected, independently, from the group consisting of C n H.sub.(2n+1), aryl, and substituted aryl where n is an integer from 1 to 4, and wherein L is at least one stabilizing, coordinating ligand selected, independently, from the group consisting of substituted and unsubstituted alkynes, dienes, and olefins, and where a and b are integers from 1 to 4.
Claim 2
Dependent Claim
120 words
A precursor compound for the chemical vapor deposition of a metal selected from the group consisting of copper and silver, comprising a metal (I) beta-diketonate chelation complex stabilized by a coordinating ligand, having the formula: ##STR1## wherein M is Cu (I) or Ag (I), and wherein R 2 is --H, methyl, ethyl, or halogen, and wherein R 1 and R 3 are selected, independently, from the group consisting of C n H.sub.(2n+1), aryl, and substituted aryl where n is an integer from 1 to 4, and wherein L is at least one stabilizing, coordinating ligand selected, independently, from the group consisting of substituted and unsubstituted alkynes, dienes, and olefins, and where a and b are integers from 1 to 4.
Claim 3
Dependent Claim
43 words
The precursor compound of claim 1 wherein R 2 is H and R 1 and R 3 are selected from the group consisting of --CH 3 , --C 2 H 5 , --C 3 H 7 , and --C 4 H 9 .
Claim 4
Dependent Claim
11 words
The precursor compound of claim 2 wherein the beta-diketonate is acetylacetonate.
Claim 5
Dependent Claim
17 words
A precursor compound for chemical vapor deposition of copper comprising 1,5-cyclooctadiene copper(I) acetylacetonate or dimethyl 1,5-cyclooctadiene copper(I)acetylacetonate.
Claim 6
Dependent Claim
17 words
A precursor compound for chemical vapor deposition of copper comprising 1,5-cyclooctadiene copper(I) acetylacetonate or dimethyl 1,5-cyclooctadiene copper(I)acetylacetonate.
Claim 7
Dependent Claim
30 words
The precursor compound of claim 4 wherein the dimethyl 1,5-cyclooctadiene copper(I) acetylacetonate is selected from the group consisting of 1,5-dimethyl 1,5-cyclooctadiene copper(I) acetylacetonate, 1,6-dimethyl 1,5-cyclooctadiene copper(I) acetylacetonate, and mixtures thereof.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-06-14 | 1996-12-14 | 1997-06-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-06-14 | 2000-12-14 | 2001-06-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-06-14 | 2004-12-14 | 2005-06-15 | $7700.00 | Window Closed / Lapsed |