Monitor plate for automatic particle detection system

Claim 2

A verification plate to verify the accuracy of a mask inspection system in detecting contaminated particles comprising: a substrate having a plurality of glass patterns and a plurality of chrome patterns formed thereon; and a predetermined number of verification particles each having a predetermined shape and size, each of the verification particle being deposited on top of said glass and chrome patterns at a predetermined location whereby the accuracy of said mask inspection system can be definitely verified by performing an inspection operation on the verification plate.

Claim 3

A verification plate of claim 1 wherein: said glass and chrome patterns are square patterns on the substrate.

Claim 4

A verification plate of claim 2 wherein: said plurality of verification particles are deposited on top of said glass and chrome pattern in such manner that each of said square glass or chrome patterns has one verification particle deposited thereon.

Claim 5

A verification plate to verify the accuracy of a mask inspection system in detecting contaminated particles comprises: a substrate having a plurality of square glass patterns and a plurality of square chrome patterns formed thereon each of said square glass patterns and each said square chrome patterns is of equal dimensions, said square glass and chrome patterns are further arranged in a plurality of rows and columns wherein each row and each column are arranged to have one of said glass pattern adjacent to one of said square chrome pattern whereby a checkerboard pattern having an alternating glass and chrome pattern is formed on the substrate; a predetermined number of verification particles each having a predetermined shape and each particle is deposited at the center of one of said square glass and chrome patterns, said plurality of verification particles are further arranged such that each column of said glass and chrome patterns having particles of one predetermined size, and further that said particle size for one of said columns is sequentially increased from one column to an adjacent column across the surface of the verification plate whereby the accuracy and a size detection threshold of the mask inspection system can be effectively and accurately verified.

Claim 6

A verification plate to verify the accuracy of a mask inspection system in detecting contaminated particles comprises: a substrate having a plurality of square glass patterns and a plurality of square chrome patterns formed thereon each of said square glass patterns and each said square chrome patterns is of equal dimensions, said square glass and chrome patterns are further arranged in a plurality of rows and columns wherein each row and each column are arranged to have one of said glass pattern adjacent to one of said square chrome pattern whereby a checkerboard pattern having an alternating glass and chrome pattern is formed on the substrate; a predetermined number of verification particles each having a predetermined shape and each particle is deposited at the center of one of said square glass and chrome patterns, said plurality of verification particles are further arranged such that each column of said glass and chrome patterns having particles of one predetermined size, and further that said particle size for one of said columns is sequentially increased from one column to an adjacent column across the surface of the verification plate whereby the accuracy and a size detection threshold of the mask inspection system can be effectively and accurately verified.

Claim 7

A verification plate as set forth in claim 4 wherein: said verification particles are further being arranged such that said verification particles in each of said row of squares having a same predetermined height while the height of said verification particles for one row of said squares is sequentially decreased from one of said rows to an adjacent row across the surface of the verification plate whereby the accuracy and height detection threshold of the mask inspection system can be effectively and accurately verified.

Claim 14

A method to make verification plate of claim 8 wherein step (b) further comprises a step of: (bl) depositing said verification particles by using a focus ion beam (FIB) induced deposition whereby said predetermined number of verification particles can be precisely deposited at said predetermined locations having said predetermined shapes and sizes.

Claim 15

An integrated circuit (IC) manufactured by use of a photomask wherein a method is used to verify the accuracy of a mask inspection system in detecting contaminated particles on said photomask comprising the steps of: (a) making a verification plate wherein said verification plate comprises: a substrate having a plurality of glass patterns and a plurality of chrome patterns formed thereon; and a predetermined number of verification particles each having a predetermined shape and size, each of the verification particles being securely deposited on top of said glass and chrome patterns at a predetermined location; (b) performing a mask inspection on said verification plate to obtain a measurement of the number, size, location and shape of all of said verification particles on said verification plate; and (c) comparing said measurement obtained from step (b) to said predetermined number, size, shape and location of said verification particles deposited on the verification plate as defined in step (a) whereby the accuracy of said mask inspection system can be definitively verified.

Claim 16

An integrated circuit (IC) manufactured by use of a photomask wherein a method is used to verify the accuracy of a mask inspection system in detecting contaminated particles on said photomask comprising the steps of: (a) making a verification plate wherein said verification plate comprises: a substrate having a plurality of glass patterns and a plurality of chrome patterns formed thereon; and a predetermined number of verification particles each having a predetermined shape and size, each of the verification particles being securely deposited on top of said glass and chrome patterns at a predetermined location; (b) performing a mask inspection on said verification plate to obtain a measurement of the number, size, location and shape of all of said verification particles on said verification plate; and (c) comparing said measurement obtained from step (b) to said predetermined number, size, shape and location of said verification particles deposited on the verification plate as defined in step (a) whereby the accuracy of said mask inspection system can be definitively verified.

Claim 17

An electronic apparatus including at least one integrated circuit (IC) manufactured by use of a photomask wherein a method is used to verify the accuracy of a mask inspection system in detecting contaminated particles on said photomask comprising the steps of: (a) making a verification plate wherein said verification plate comprises: a substrate having a plurality of glass patterns and plurality of chrome patterns formed thereon; and a predetermined number of verification particles each having a predetermined shape and size, each of the verification particles being securely deposited on top of said glass and chrome patterns at a predetermined location; (b) performing a mask inspection on said verification plate to obtain a measurement of the number, size, location and shape of all of said verification particles on said verification plate; and (c) comparing said measurement obtained from step (b) to said predetermined number, size, shape and location of said verification particles deposited on the verification plate as defined in step (a) whereby the accuracy of said mask inspection system can be definitively verified.

Claim 18

An electronic apparatus including at least one integrated circuit (IC) manufactured by use of a photomask wherein a method is used to verify the accuracy of a mask inspection system in detecting contaminated particles on said photomask comprising the steps of: (a) making a verification plate wherein said verification plate comprises: a substrate having a plurality of glass patterns and plurality of chrome patterns formed thereon; and a predetermined number of verification particles each having a predetermined shape and size, each of the verification particles being securely deposited on top of said glass and chrome patterns at a predetermined location; (b) performing a mask inspection on said verification plate to obtain a measurement of the number, size, location and shape of all of said verification particles on said verification plate; and (c) comparing said measurement obtained from step (b) to said predetermined number, size, shape and location of said verification particles deposited on the verification plate as defined in step (a) whereby the accuracy of said mask inspection system can be definitively verified.

Claim 19

A data handling apparatus including at least one integrated circuit (IC) manufactured by use of a photomask wherein a method is used to verify the accuracy of a mask inspection system in detecting contaminated particles on said photomask comprising the steps of: (a) making a verification plate wherein said verification plate comprises: a substrate having a plurality of glass patterns and a plurality of chrome patterns formed thereon; and a predetermined number of verification particles each having a predetermined shape and size, each of the verification particles being securely deposited on top of said glass and chrome patterns at a predetermined location; (b) performing a mask inspection on said verification plate to obtain a measurement of the number, size, location and shape of all of said verification particles on said verification plate; and (c) comparing said measurement obtained from step (b) to said predetermined number, size, shape and location of said verification particles deposited on the verification plate as defined in step (a) whereby the accuracy of said mask inspection system can be definitively verified.

Claim 20

A data handling apparatus including at least one integrated circuit (IC) manufactured by use of a photomask wherein a method is used to verify the accuracy of a mask inspection system in detecting contaminated particles on said photomask comprising the steps of: (a) making a verification plate wherein said verification plate comprises: a substrate having a plurality of glass patterns and a plurality of chrome patterns formed thereon; and a predetermined number of verification particles each having a predetermined shape and size, each of the verification particles being securely deposited on top of said glass and chrome patterns at a predetermined location; (b) performing a mask inspection on said verification plate to obtain a measurement of the number, size, location and shape of all of said verification particles on said verification plate; and (c) comparing said measurement obtained from step (b) to said predetermined number, size, shape and location of said verification particles deposited on the verification plate as defined in step (a) whereby the accuracy of said mask inspection system can be definitively verified.