US5203977A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Magnetron sputtered boron films and TI/B multilayer structures
Assignee: University of California
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Filing: 1991-03-11
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Granted: 1993-04-20
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Expires: 2011-03-11
Abstract
Abstract A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for ultra-thin band pass filters as well as the low Z element in low Z/high Z mirrors which enhance reflectivity from grazing to normal incidence.
Inventors
- 👤 Daniel M. Makowiecki
- 👤 Alan F. Jankowski
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 11:59
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/06; C23C14/0635; B; B82; B82Y; B82Y10/00; C23C14/0641; C23C14/0647; C23C14/14; C23C14/18; C23C14/185; C23C14/22; C23C14/34; C23C14/3407; C23C14/3414; G; G21; G21K; G21K1/00; G21K1/06; G21K1/062; G21K2201/00; G21K2201/06; G21K2201/061; G21K2201/067; Y; Y10; Y10T; Y10T428/00; Y10T428/26; Y10T428/263; Y10T428/264; Y10T428/265; Y10T428/31504; Y10T428/31678
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
44 words
A method for forming thin amorphous boron films which have no morphological growth features; comprising: subjecting a boron target having a density near theoretical density to an rf magnetron sputtering process; and depositing a thin amorphous film of sputtered boron on a substrate material.
Claim 2
Independent Claim
44 words
A method for forming thin amorphous boron films which have no morphological growth features; comprising: subjecting a boron target having a density near theoretical density to an rf magnetron sputtering process; and depositing a thin amorphous film of sputtered boron on a substrate material.
Claim 3
Dependent Claim
15 words
A method as in claim 1, wherein said boron target is high density crystalline boron.
Claim 4
Dependent Claim
24 words
A method as in claim 2, wherein said boron target is high density crystalline rhombohedral boron having a bulk density greater than 2.22 g/cc.
Claim 5
Dependent Claim
24 words
A method as in claim 3, wherein said boron target is high density crystalline rhombohedral boron having a bulk density of about 2.34 g/cc.
Claim 6
Independent Claim
64 words
A method for forming thin amorphous boron multilayer structures, comprising: subjecting a boron target having a density near theoretical density to an rf magnetron sputtering process; depositing a thin amorphous film of sputtered boron on a substrate material; subjecting a second target material to a magnetron sputtering process; and depositing a thin layer of sputtered second target material on said thin amorphous boron film.
Claim 7
Independent Claim
64 words
A method for forming thin amorphous boron multilayer structures, comprising: subjecting a boron target having a density near theoretical density to an rf magnetron sputtering process; depositing a thin amorphous film of sputtered boron on a substrate material; subjecting a second target material to a magnetron sputtering process; and depositing a thin layer of sputtered second target material on said thin amorphous boron film.
Claim 8
Dependent Claim
18 words
The method as in claim 5, wherein said second target material is high-absorbing high atomic number metal material.
Claim 9
Dependent Claim
26 words
The method as in claim 6, wherein said second target material is selected from the group consisting of titanium, transition metals, refractory metals, and noble metals.
Claim 10
Dependent Claim
13 words
The method as in claim 7, wherein said second target material is titanium.
References Cited (Backward Citations)
US4177474A
Cited
USPTO Annuity & Maintenance Windows
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| 3.5 Years (Year 4) | 1996-04-19 | 1996-10-19 | 1997-04-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-04-19 | 2000-10-19 | 2001-04-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-04-19 | 2004-10-19 | 2005-04-20 | $7700.00 | Window Closed / Lapsed |