Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
215 words
The method of generating a high purity atomic N + ion beam using a multicusp ion source having a chamber formed by a cylindrical chamber wall surrounded by a plurality of magnets, a filament centrally disposed in said chamber, a plasma electrode having an extraction orifice at one end of the chamber, a magnetic filter having two parallel magnets spaced from said plasma electrode and dividing the chamber into arc discharge and extraction regions, the method comprising: (a) causing an electron flow to take place in said arc discharge region from said filament to said chamber wall, (b) introducing nitrogen gas into said chamber, (c) maintaining the chamber wall at a positive voltage relative to said filament and at a magnitude for an optimum percentage of N + ions in the extracted ion beam, (d) disposing a hot liner within said chamber and near said chamber wall to limit recombination of atomic N + ions into molecular N 2 + ions, (e) spacing said magnets of said magnetic filter from each other for optimum percentage of N + ions in the extracted ion beams, and (f) maintaining a relatively low operating pressure downstream of said extraction orifice and of a magnitude for an optimum percentage of atomic N + ions in the extracted ion beam.
Claim 2
Independent Claim
215 words
The method of generating a high purity atomic N + ion beam using a multicusp ion source having a chamber formed by a cylindrical chamber wall surrounded by a plurality of magnets, a filament centrally disposed in said chamber, a plasma electrode having an extraction orifice at one end of the chamber, a magnetic filter having two parallel magnets spaced from said plasma electrode and dividing the chamber into arc discharge and extraction regions, the method comprising: (a) causing an electron flow to take place in said arc discharge region from said filament to said chamber wall, (b) introducing nitrogen gas into said chamber, (c) maintaining the chamber wall at a positive voltage relative to said filament and at a magnitude for an optimum percentage of N + ions in the extracted ion beam, (d) disposing a hot liner within said chamber and near said chamber wall to limit recombination of atomic N + ions into molecular N 2 + ions, (e) spacing said magnets of said magnetic filter from each other for optimum percentage of N + ions in the extracted ion beams, and (f) maintaining a relatively low operating pressure downstream of said extraction orifice and of a magnitude for an optimum percentage of atomic N + ions in the extracted ion beam.
Claim 3
Dependent Claim
55 words
The method of generating high purity atomic N + ion beams as set forth in claim 1, and further including: maintaining said plasma electrode at the same voltage as that of said chamber wall to prevent secondary emission of electrons from said plasma electrode from having sufficient energy to ionize molecular N 2 + ions.
Claim 4
Dependent Claim
40 words
The method of generating high purity N + ion beams as set forth in claim 1, and further including: maintaining said liner in good electrical contact with said chamber wall and in poor heat transfer relation to said chamber wall.
Claim 5
Independent Claim
37 words
The method of generating high purity atomic N + ion beams as set forth in claim wherein the operating pressure downstream of said extraction orifice is maintained at the pressure within the range of 3-8×10 -4 torr.
Claim 6
Dependent Claim
55 words
The method of generating high purity atomic N + ion beams as set forth in claim 4, and further including: maintaining said plasma electrode at the same voltage as that of said chamber wall to prevent secondary emission of electrons from said plasma electrode from having sufficient energy to ionize molecular N 2 + ions.
Claim 7
Dependent Claim
41 words
The method of generating high purity atomic N + ion beams as set forth in claim 5, and further including: maintaining said liner in good electrical contact with said chamber wall and in poor heat transfer relation to said chamber wall.