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Patent US5196102A successfully refreshed from Google Patents.
US5196102A
Expired / Lapsed
US
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Method and apparatus for applying a compound of a metal and a gas onto a surface
Assignee: Microelectronics and Computer Technology Corp
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Filing: 1991-08-08
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Granted: 1993-03-23
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Expires: 2011-08-08
Abstract
Abstract A method of applying a compound of a metal and a reactive gas onto a surface by depositing a metal from a liquid metal cluster ion source onto said surface in the presence of a gas on the surface to combine with the deposited metal while isolating the gas from the source of the metal cluster ions.
Inventors
- 👤 Nalin Kumar
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 10:14
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/221; C23C14/0021; C23C14/04; C23C14/048
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
87 words
A method of applying a compound of a metal and a reactive gas to repair lines on an electrical display having a transparent conductor, comprising, selectively depositing said metal on the transparent conductor by a focused liquid metal cluster source ion deposition in the presence of a reactive gas, isolating the ion source from the reactive gas by inserting an inert gas spaced from the ion source and between the ion source and the reactive gas at a pressure greater than the pressure of the reactive gas.
Claim 2
Independent Claim
87 words
A method of applying a compound of a metal and a reactive gas to repair lines on an electrical display having a transparent conductor, comprising, selectively depositing said metal on the transparent conductor by a focused liquid metal cluster source ion deposition in the presence of a reactive gas, isolating the ion source from the reactive gas by inserting an inert gas spaced from the ion source and between the ion source and the reactive gas at a pressure greater than the pressure of the reactive gas.
Claim 3
Dependent Claim
17 words
The method of claim 1 wherein the compound is an oxide and the reactive gas includes oxygen.
Claim 4
Dependent Claim
21 words
The method of claim 2 wherein the reactive gas is selected from a group consisting of oxygen, ozone, and nitrous oxide.
Claim 5
Dependent Claim
19 words
The method of claim 2 wherein the compound is selected from a group consisting of oxides, nitrides, and sulfides.
Claim 6
Dependent Claim
19 words
The method of claim 1 including, providing in-situ oxidation of the deposited metal by an atomic oxygen plasma device.
Claim 7
Dependent Claim
19 words
The method of claim 1 wherein the metal is selected from a group consisting of indium, tin, and zinc.
Claim 8
Dependent Claim
11 words
The method of claim 1 wherein the reactive gas is oxygen.
Claim 9
Independent Claim
165 words
An apparatus for applying a compound of a metal and a reactive gas on a substrate, comprising, first, second, and third compartments, said third compartment positioned between the first and second compartments, a first small opening between the first and third compartments, and a second small opening between the second and third compartments, a liquid metal cluster ion source positioned in the first compartment for generating and directing an ion beam of said metal through the first and second openings and into the second compartment, said second compartment having a substrate mounted on an X-Y stage and positioned for receiving the ion beam and the metal deposited therefrom, said second compartment also having means for supplying a reactive gas therein for combining with the deposited metal, said third compartment having means for supplying an inert gas therein at a greater pressure than the means for supplying reactive gas for isolating the reactive gas in the second compartment from the ion source in the first compartment.
Claim 10
Independent Claim
165 words
An apparatus for applying a compound of a metal and a reactive gas on a substrate, comprising, first, second, and third compartments, said third compartment positioned between the first and second compartments, a first small opening between the first and third compartments, and a second small opening between the second and third compartments, a liquid metal cluster ion source positioned in the first compartment for generating and directing an ion beam of said metal through the first and second openings and into the second compartment, said second compartment having a substrate mounted on an X-Y stage and positioned for receiving the ion beam and the metal deposited therefrom, said second compartment also having means for supplying a reactive gas therein for combining with the deposited metal, said third compartment having means for supplying an inert gas therein at a greater pressure than the means for supplying reactive gas for isolating the reactive gas in the second compartment from the ion source in the first compartment.
Claim 11
Dependent Claim
16 words
The apparatus of claim 8 including, an atomic oxygen plasma device positioned in the second compartment.
Claim 12
Dependent Claim
22 words
The apparatus of claim 8 including, a vacuum pump connected to the first compartment for subjecting the ion source to a vacuum.
Claim 13
Dependent Claim
15 words
The apparatus of claim 8 including, an oxygen plasma device positioned in the second compartment.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-03-22 | 1996-09-21 | 1997-03-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-03-22 | 2000-09-21 | 2001-03-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-03-22 | 2004-09-21 | 2005-03-23 | $7700.00 | Window Closed / Lapsed |