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US5191784A Expired / Lapsed US ⏱️ 0.0 years remaining

Opto-electronic gas sensor

Assignee: Siemens Corporate Research Inc
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Filing: 1989-12-28
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Granted: 1993-03-09
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Expires: 2009-12-28
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Abstract

Abstract Apparatus for detecting the presence of a gas in an ambient atmosphere comprises a multiple quantum well structure; a thin mesh of a transition metal formed on the multiple quantum well structure; and an arrangement for monitoring transmission of electromagnetic radiation through the mesh and the multiple quantum well structure.

Inventors

  • 👤 Kevin W. Jelley
  • 👤 G. J. Maclay

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-06 11:35
CPC Classifications
G; G01; G01N; G01N21/00; G01N21/17; G01N21/25; G01N21/31; B; B82; B82Y; B82Y20/00; G01N33/00; G01N33/0004; G01N33/0009; G01N33/0027; G01N33/0036; G01N33/005; H; H10; H10F; H10F77/00; H10F77/10; H10F77/14; H10F77/146; G01N2021/3185; G01N2021/3192; G01N21/35; G01N21/3504; Y; Y10; Y10T; Y10T436/00; Y10T436/22

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 258 words
A semiconductor device adapted for operation as a gas sensor, comprising: a body of semiconductor material including a substrate region and a multiple quantum well (MQW) structure over said substrate region, said MQW structure having first and second different materials arranged alternately in a plurality of parallel planar layers in a vertical direction, said planar layers exhibiting an absorption edge for electromagnetic radiation at a first wavelength thereof and having a respective predetermined relatively thin thickness dimension of a value wherein an electric field acting perpendicularly to said planar layers causes a shifting of said absorption edge from said first wavelength of said electromagnetic radiation to a second wavelength of said electromagnetic radiation; a layer of a transition metal formed over a topmost layer of said MQW structure, said layer of a transition metal having a relatively thin thickness dimension being substantially transparent to the electromagnetic radiation and substantially permeable to a gas to be detected; and a light detector, located below said substrate region, for detecting the sifting in wavelength of said electromagnetic radiation transmitted in the vertical direction through said layer of transition metal, said MQW structure, and said substrate region, wherein said layer of transition metal allows gas atoms to permeate into the topmost layer of said MQW structure so as to form a dipole layer resulting in an electric field acting perpendicularly to said planar layers of said MQW structure, thereby causing a shifting in wavelength of said electromagnetic radiation which is detected by said light detector to indicate the presence of the gas.
Claim 2
Dependent Claim 258 words
A semiconductor device adapted for operation as a gas sensor, comprising: a body of semiconductor material including a substrate region and a multiple quantum well (MQW) structure over said substrate region, said MQW structure having first and second different materials arranged alternately in a plurality of parallel planar layers in a vertical direction, said planar layers exhibiting an absorption edge for electromagnetic radiation at a first wavelength thereof and having a respective predetermined relatively thin thickness dimension of a value wherein an electric field acting perpendicularly to said planar layers causes a shifting of said absorption edge from said first wavelength of said electromagnetic radiation to a second wavelength of said electromagnetic radiation; a layer of a transition metal formed over a topmost layer of said MQW structure, said layer of a transition metal having a relatively thin thickness dimension being substantially transparent to the electromagnetic radiation and substantially permeable to a gas to be detected; and a light detector, located below said substrate region, for detecting the sifting in wavelength of said electromagnetic radiation transmitted in the vertical direction through said layer of transition metal, said MQW structure, and said substrate region, wherein said layer of transition metal allows gas atoms to permeate into the topmost layer of said MQW structure so as to form a dipole layer resulting in an electric field acting perpendicularly to said planar layers of said MQW structure, thereby causing a shifting in wavelength of said electromagnetic radiation which is detected by said light detector to indicate the presence of the gas.
Claim 3
Dependent Claim 29 words
A semiconductor device as recited in claim 1, wherein said first material is aluminum gallium arsenide (Al x GaAs 1-x ) and said second material is gallium arsenide (GaAs).
Claim 4
Dependent Claim 18 words
A semiconductor device as recited in claim 2, wherein said layer of a transition metal is of palladium.
Claim 5
Dependent Claim 45 words
A semiconductor device as recited in claim 1, wherein said substrate region is made of an optically opaque material and has at least a portion thereof removed for providing a clear passage for said electromagnetic radiation, and said light detector is located in said passage.
Claim 6
Dependent Claim 45 words
A semiconductor device as recited in claim 3, wherein said substrate region is made of an optically opaque material and has at least a portion thereof removed for providing a clear passage for said electromagnetic radiation, and said light detector is located in said passage.
Claim 7
Dependent Claim 22 words
A semiconductor device as recited in claim 3, wherein said topmost layer of said MQW structure is made of aluminum gallium arsenide.

References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-03-08 1996-09-07 1997-03-09 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-03-08 2000-09-07 2001-03-09 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-03-08 2004-09-07 2005-03-09 $7700.00 Window Closed / Lapsed

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