Abstract In a process for coating substrates by means of cathode sputtering, a magnetron cathode is used which has an annularly closed target 9. The sputter surface 9a of this target has an inner edge 9c and an outer edge 9d. The corresponding system of permanent magnets 7 has a first pole 7c which is disposed inside the inner edge and a second pole 7d disposed outside the outer edge. The characteristics of the poles geometrically resemble those of the target edges. This results in the generation of a circumferentially closed magnetic tunnel over the sputter surface. The flux lines thereof which are important to the enclosure of the plasma, are only slightly curved. In order to achieve a good material efficiency at high sputter rates and yet a high plasma density at the substrates, the spatial course of the magnetic flux lines is selectively distorted in such a way that the area of maximum target erosion, in absence of additional magnetic fields, is shifted to the vicinity of the outer edge 9d of the target 9. An averaged time value of an excitation current is applied to an additionally disposed magnetic coil 26. It serves to shift the zone of maximum target erosion approximately to the center between the two target edges. A periodic change of the average value of the excitation current shifts the zone of maximum target erosion from the center toward both sides.
Method for coating substrates by cathode sputtering an annularly closed target having a sputtering surface with an inner edge and an outer edge, comprising providing a permanent magnet system having an annularly closed outer pole outside said outer edge and an annularly closed inner pole inside said inner edge, said poles being arranged to provide a closed annular tunnel of magnetic flux lines over said sputtering surface, which flux lines are parallel to said sputtering surface over an area which is closer to said outer edge than said inner edge, and superimposing an additional magnetic field with the magnetic field of the permanent magnets by means of an annularly closed magnetic coil outside said outer pole, said additional field being varied periodically with time by an excitation current with an averaged time value greater than zero in order to periodically shift the plane of parallel flux lines toward the inner edge of said target.
Claim 2
Dependent Claim
154 words
Method for coating substrates by cathode sputtering an annularly closed target having a sputtering surface with an inner edge and an outer edge, comprising providing a permanent magnet system having an annularly closed outer pole outside said outer edge and an annularly closed inner pole inside said inner edge, said poles being arranged to provide a closed annular tunnel of magnetic flux lines over said sputtering surface, which flux lines are parallel to said sputtering surface over an area which is closer to said outer edge than said inner edge, and superimposing an additional magnetic field with the magnetic field of the permanent magnets by means of an annularly closed magnetic coil outside said outer pole, said additional field being varied periodically with time by an excitation current with an averaged time value greater than zero in order to periodically shift the plane of parallel flux lines toward the inner edge of said target.