Method for the production of a semiconductor laser device
Abstract
Abstract There is provided a method for the production of a semiconductor laser device which emits laser light from a facet. The method includes the steps of: growing a multi-layered structure containing an active layer for laser oscillation on a semiconductor substrate to form a wafer; etching the multi-layered structure to form a striped groove perpendicular to the direction of an optical waveguide, resulting in a pair of resonator facets; bringing the facets into contact with a sulfur-containing solution; subjecting the facets to heat treatment; growing a semiconductor layer on the surface of the facets, which has a band gap greater than that of the active layer; and cleaving the wafer along the striped groove to obtain a semiconductor laser device.
Inventors
- 👤 Mitsuhiro Matsumoto
- 👤 Kazuaki Sasaki
- 👤 Masaki Kondo
Bibliographic Details
Claims Analysis
Total Claims: 7References Cited (Backward Citations)
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