Patent US5164596A successfully refreshed from Google Patents.
US5164596A
Expired / Lapsed
US
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Focused ion beam irradiating apparatus
Assignee: Dai Nippon Printing Co Ltd
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Filing: 1992-03-09
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Granted: 1992-11-17
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Expires: 2012-03-09
Abstract
Abstract An ion beam I is irradiated from an ion gun 10 onto a sample S on an XY stage 100, and an electron shower E is irradiated onto the sample S. Electrification of the sample by ion is neutralized by irradiation of the electron shower E. In the case of adjusting the electron shower E, a drive system 200 is driven by a control signal from a control unit 300 to scan a spot of the electron shower E by a Faraday cup F positioned at a corner of the XY stage 100. Detected current values of the Faraday cup F at respective scanning positions are amplified at an amplifier 210. The current values thus amplified are digitized at an A/D converter 220, and are then delivered to the control unit 300. The control unit 300 displays the intensity distribution of the electron shower E obtained by this scanning on a display unit 400.
Inventors
- 👤 Shigeru Noguchi
- 👤 Yasushi Kawai
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 21:01
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/305; H01J37/3053; H01J37/3056; B; B23; B23K; B23K15/00; B23K15/0013; B23K15/02; H01J37/02; H01J37/026; H01J2237/00; H01J2237/004; H01J2237/0041; H01J2237/0044
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
143 words
A focused ion beam irradiating apparatus comprising: an XY stage for mounting a sample on an XY plane surface; a drive system for moving said XY stage along said XY plane surface; an ion gun for irradiating an ion beam onto said sample on said XY stage; an electron gun for irradiating an electron shower onto said sample in order to neutralize electrification by irradiation of the ion beam; a current measurement element for measuring a current generated due to electron irradiation, said element being provided at a portion on said XY stage; and a control unit adapted for applying a predetermined control signal to said drive system to thereby move said current measurement element in X-axis and Y-axis directions in a region where the electron shower is irradiated, thus to detect measured current values by said current measurement element at respective positions.
Claim 2
Dependent Claim
143 words
A focused ion beam irradiating apparatus comprising: an XY stage for mounting a sample on an XY plane surface; a drive system for moving said XY stage along said XY plane surface; an ion gun for irradiating an ion beam onto said sample on said XY stage; an electron gun for irradiating an electron shower onto said sample in order to neutralize electrification by irradiation of the ion beam; a current measurement element for measuring a current generated due to electron irradiation, said element being provided at a portion on said XY stage; and a control unit adapted for applying a predetermined control signal to said drive system to thereby move said current measurement element in X-axis and Y-axis directions in a region where the electron shower is irradiated, thus to detect measured current values by said current measurement element at respective positions.
Claim 3
Dependent Claim
34 words
A focused ion beam irradiating apparatus as set forth in claim 1, further comprising a display unit for displaying a distribution of measurement current values detected by said control unit on a screen thereof.
Claim 4
Dependent Claim
23 words
A focused ion beam irradiating apparatus as set forth in claim 1, wherein a Faraday cup is used as the current measurement element.
Claim 5
Dependent Claim
34 words
A focused ion beam irradiating apparatus as set forth in claim 3, wherein the XY stage is driven at a pitch corresponding to a diameter of the Faraday cup at a time of measurement.
Claim 6
Dependent Claim
42 words
A focused ion beam irradiating apparatus as set forth in claim 3, having a structure permitting a measurement surface of the Faraday cup to be adjusted to a height flush with an upper surface of a sample mounted on the XY stage.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-11-17 | 1996-05-18 | 1996-11-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-11-17 | 2000-05-18 | 2000-11-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-11-17 | 2004-05-18 | 2004-11-17 | $7700.00 | Window Closed / Lapsed |