US5164326A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Complementary bipolar and CMOS on SOI
Assignee: NXP USA Inc
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Filing: 1992-03-30
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Granted: 1992-11-17
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Expires: 2012-03-30
Abstract
Abstract A method for fabricating BiCMOS on SOI. An SOI wafer (14) with an oxide layer (17) and a nitride layer (16) has areas isolated by a LOCOS or mesa isolation (13). A region (15) is defined for CMOS structures from which the insulating layers (17,16) are removed. A gate oxide (21), a polycrystalline silicon layer (22), and a second insulating layer (23,24) is formed. A region for emitters (26) is defined and nitride deposited to form a spacer (27). An oxide layer (28) is grown over the polycrystalline silicon (22) within the emitter region (26). The wafer (14) is etched to the underlying monocrystalline silicon (18) forming base contacts (31). A polycrystalline silicon spacer (36) is formed from a second polycrystalline layer (43) and an oxide spacer (40) is deposited. A region for bipolar collectors (32) and CMOS areas (34) is defined and a spacer (38) deposited.
Inventors
- 👤 Juergen A. Foerstner
- 👤 Bor-Yuan Hwang
- 👤 John E. Schmiesing
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 12:47
CPC Classifications
H; H10; H10D; H10D10/00; H10D10/01; H10D10/041; H10D84/00; H10D84/01; H10D84/0107; H10D84/0109; H10D84/0112; H10D84/0123; H10D84/0126; H10D84/0165; H10D84/02; H10D84/03; H10D84/038; H10D84/40; H10D84/401; H10D86/00; H10D86/201; Y; Y10; Y10S; Y10S148/00; Y10S148/15
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
297 words
A method for fabricating both complementary bipolar and CMOS on SOI, comprising: providing a wafer which comprises a thin film of monocrystalline silicon above an oxide insulating layer; forming a LOCOS lateral isolation through the thin film; growing a first layer of oxide over the thin film; further depositing a first layer of nitride over the layer of oxide; defining a region where CMOS structures are desired; removing the first layer of oxide and the first layer of nitride from the region where CMOS structures are desired; growing a gate oxide over the region where CMOS structures are desired; depositing a first polycrystalline silicon layer over the entire wafer; depositing a second layer of nitride over the polycrystalline silicon; depositing a second layer of oxide over the second layer of nitride; defining an emitter area opening; depositing a first nitride spacer in the emitter area opening; growing a hard mask oxide layer to form a mask over the first polycrystalline silicon layer; selectively removing the first nitride spacer, the second layer of nitride and the second layer of oxide to expose the polycrystalline silicon layer in the emitter area opening; forming a slot in the first polycrystalline silicon layer, the second layer of nitride, and the second layer of oxide to the thin film so as to form a base area opening; depositing a second polycrystalline silicon layer over the entire wafer; forming a polycrystalline silicon spacer from the second polycrystalline silicon layer so as to fill the base area opening; depositing a spacer of oxide over the polycrystalline silicon spacer; forming a collector opening, a CMOS drain opening and a CMOS source opening; and depositing a second nitride spacer on the side walls of the collector opening, the CMOS drain opening and the CMOS source opening.
Claim 2
Independent Claim
297 words
A method for fabricating both complementary bipolar and CMOS on SOI, comprising: providing a wafer which comprises a thin film of monocrystalline silicon above an oxide insulating layer; forming a LOCOS lateral isolation through the thin film; growing a first layer of oxide over the thin film; further depositing a first layer of nitride over the layer of oxide; defining a region where CMOS structures are desired; removing the first layer of oxide and the first layer of nitride from the region where CMOS structures are desired; growing a gate oxide over the region where CMOS structures are desired; depositing a first polycrystalline silicon layer over the entire wafer; depositing a second layer of nitride over the polycrystalline silicon; depositing a second layer of oxide over the second layer of nitride; defining an emitter area opening; depositing a first nitride spacer in the emitter area opening; growing a hard mask oxide layer to form a mask over the first polycrystalline silicon layer; selectively removing the first nitride spacer, the second layer of nitride and the second layer of oxide to expose the polycrystalline silicon layer in the emitter area opening; forming a slot in the first polycrystalline silicon layer, the second layer of nitride, and the second layer of oxide to the thin film so as to form a base area opening; depositing a second polycrystalline silicon layer over the entire wafer; forming a polycrystalline silicon spacer from the second polycrystalline silicon layer so as to fill the base area opening; depositing a spacer of oxide over the polycrystalline silicon spacer; forming a collector opening, a CMOS drain opening and a CMOS source opening; and depositing a second nitride spacer on the side walls of the collector opening, the CMOS drain opening and the CMOS source opening.
Claim 3
Independent Claim
255 words
A method for fabricating both complementary bipolar and CMOS on SOI, comprising: providing a wafer which comprises a thin film of monocrystalline silicon above an oxide insulating layer; covering the thin film with a first layer of oxide; covering the first layer of oxide with a first layer of nitride; defining a region where CMOS structures are desired; removing the first layer of oxide and the first layer of nitride from the region where CMOS structures are desired; providing a gate oxide over the region where CMOS structures are desired; providing polycrystalline silicon over the entire wafer; covering the polycrystalline silicon with a second layer of nitride; covering the second layer of nitride with a second layer of oxide; defining an emitter area opening and a plurality of CMOS areas; providing a first nitride spacer in the emitter area opening; selectively removing the second layer of nitride and the second layer of oxide to expose the polycrystalline silicon layer in the emitter area opening; providing a hard mask oxide layer to form a mask over the polycrystalline silicon; forming a slot in the polycrystalline silicon layer to the thin film so as to form a base area opening; providing a polycrystalline silicon spacer which fills the base area opening; covering the polycrystalline silicon spacer with a spacer of oxide; forming a collector opening, a CMOS drain opening and a CMOS source opening; and providing a second nitride spacer on the side walls of the collector opening, the CMOS drain opening and the CMOS source opening.
Claim 4
Independent Claim
255 words
A method for fabricating both complementary bipolar and CMOS on SOI, comprising: providing a wafer which comprises a thin film of monocrystalline silicon above an oxide insulating layer; covering the thin film with a first layer of oxide; covering the first layer of oxide with a first layer of nitride; defining a region where CMOS structures are desired; removing the first layer of oxide and the first layer of nitride from the region where CMOS structures are desired; providing a gate oxide over the region where CMOS structures are desired; providing polycrystalline silicon over the entire wafer; covering the polycrystalline silicon with a second layer of nitride; covering the second layer of nitride with a second layer of oxide; defining an emitter area opening and a plurality of CMOS areas; providing a first nitride spacer in the emitter area opening; selectively removing the second layer of nitride and the second layer of oxide to expose the polycrystalline silicon layer in the emitter area opening; providing a hard mask oxide layer to form a mask over the polycrystalline silicon; forming a slot in the polycrystalline silicon layer to the thin film so as to form a base area opening; providing a polycrystalline silicon spacer which fills the base area opening; covering the polycrystalline silicon spacer with a spacer of oxide; forming a collector opening, a CMOS drain opening and a CMOS source opening; and providing a second nitride spacer on the side walls of the collector opening, the CMOS drain opening and the CMOS source opening.
Claim 5
Dependent Claim
37 words
The method for fabricating both complementary bipolar and CMOS on SOI of claim 2, further comprising: forming a LOCOS lateral isolation through the thin film prior to growing the first layer of oxide over the thin film.
Claim 6
Independent Claim
203 words
A method for fabricating both complementary bipolar and CMOS on SOI, comprising: providing a wafer which comprises a thin film of monocrystalline silicon above a first insulating layer; fabricating a second insulating layer over the thin film; defining a region where CMOS structures are desired; removing the second insulating layer from the region where CMOS structures are desired; covering the region where CMOS structures are desired with a gate oxide; forming a first layer of polycrystalline silicon over the entire wafer; fabricating a third insulating layer over the layer of polycrystalline silicon; opening an emitter area opening through the third insulating layer to the first polycrystalline silicon layer; forming a first insulating spacer in the emitter area; removing the third insulating layer to expose the polycrystalline silicon; forming a mask layer over the first polycrystalline silicon layer; removing a slot in the first polycrystalline silicon layer to the thin film; building a polycrystalline silicon spacer to fill the slot; forming an insulating spacer over the polycrystalline silicon spacer; fabricating openings for a collector, a CMOS drain, and a CMOS source; and forming a second insulating spacer on the side walls of the openings for the collector, the CMOS drain and the CMOS source.
Claim 7
Independent Claim
203 words
A method for fabricating both complementary bipolar and CMOS on SOI, comprising: providing a wafer which comprises a thin film of monocrystalline silicon above a first insulating layer; fabricating a second insulating layer over the thin film; defining a region where CMOS structures are desired; removing the second insulating layer from the region where CMOS structures are desired; covering the region where CMOS structures are desired with a gate oxide; forming a first layer of polycrystalline silicon over the entire wafer; fabricating a third insulating layer over the layer of polycrystalline silicon; opening an emitter area opening through the third insulating layer to the first polycrystalline silicon layer; forming a first insulating spacer in the emitter area; removing the third insulating layer to expose the polycrystalline silicon; forming a mask layer over the first polycrystalline silicon layer; removing a slot in the first polycrystalline silicon layer to the thin film; building a polycrystalline silicon spacer to fill the slot; forming an insulating spacer over the polycrystalline silicon spacer; fabricating openings for a collector, a CMOS drain, and a CMOS source; and forming a second insulating spacer on the side walls of the openings for the collector, the CMOS drain and the CMOS source.
Claim 8
Dependent Claim
35 words
The method for fabricating both complementary bipolar and CMOS on SOI of claim 4, further comprising: fabricating a lateral insulating region through the thin film to provide isolation between predetermined areas of the thin film.
Claim 9
Dependent Claim
23 words
The method for fabricating both complementary bipolar and CMOS on SOI of claim 5, wherein: the lateral insulating region comprises a LOCOS isolation.
Claim 10
Dependent Claim
23 words
The method for fabricating both complementary bipolar and CMOS on SOI of claim 5, wherein: the lateral insulating region comprises a mesa isolation.
Claim 11
Dependent Claim
23 words
The method for fabricating both complementary bipolar and CMOS on SOI of claim 4, wherein: the first insulating layer comprises an oxide layer.
Claim 12
Dependent Claim
33 words
The method for fabricating both complementary bipolar and CMOS on SOI of claim 4, wherein: the second insulating layer and the third insulating layer comprise a predetermined combination of oxide and nitride layers.
Claim 13
Dependent Claim
38 words
The method for fabricating both complementary bipolar and CMOS on SOI of claim 4, wherein: the polycrystalline silicon spacer is formed from a second layer of polycrystalline silicon which is formed above the first layer of polycrystalline silicon.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-11-17 | 1996-05-18 | 1996-11-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-11-17 | 2000-05-18 | 2000-11-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-11-17 | 2004-05-18 | 2004-11-17 | $7700.00 | Window Closed / Lapsed |