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US5162886A Expired / Lapsed US ⏱️ 0.0 years remaining

Hall device

Assignee: Sumitomo Electric Industries Ltd
•
Filing: 1991-05-09
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Granted: 1992-11-10
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Expires: 2011-05-09
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Abstract

Abstract A Hall device having an active part made from semiconductor diamond. The Hall device works even at high temperature or in corrosive atmosphere. Boron doped diamond is suitable for controlling the acceptor concentration.

Inventors

  • 👤 Yoshiki Nishibayashi
  • 👤 Hideaki Nakahata
  • 👤 Hiromu Shiomi
  • 👤 Naoji Fujimori

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 12:42
CPC Classifications
H; H10; H10N; H10N52/00; H10N52/101; Y; Y10; Y10T; Y10T428/00; Y10T428/26; Y10T428/263; Y10T428/264; Y10T428/265; Y10T428/30

Claims Analysis

Total Claims: 12
Claim 1
Independent Claim 52 words
A Hall device comprising: a monocrystalline substrate; a diamond active layer with a thickness of 0.2 μm to 50 μm grown on said monocrystalline substrate, said active layer being doped with at least one of boron, beryllium, phosphorus, arsenic, sulfur, or selenium; and two pairs of electrodes formed on said active layer.
Claim 2
Dependent Claim 52 words
A Hall device comprising: a monocrystalline substrate; a diamond active layer with a thickness of 0.2 μm to 50 μm grown on said monocrystalline substrate, said active layer being doped with at least one of boron, beryllium, phosphorus, arsenic, sulfur, or selenium; and two pairs of electrodes formed on said active layer.
Claim 3
Dependent Claim 42 words
A Hall device as claimed in claim 1, wherein said active layer is grown by a chemical vapor deposition method using a material gas including hydrogen gas and hydrocarbon and one of oxygen gas, water, carbon monoxide, carbon dioxide or hydrogen peroxide.
Claim 4
Dependent Claim 60 words
A Hall device comprising: a monocrystalline substrate; a diamond active layer with a thickness of 0.2 μm to 50 μm grown on said monocrystalline substrate, said active layer being doped with at least one of boron, beryllium, phosphorus, arsenic, sulfur, or selenium; two pairs of electrodes formed on said active layer; and a protective layer deposited on said active layer.
Claim 5
Dependent Claim 60 words
A Hall device comprising: a monocrystalline substrate; a diamond active layer with a thickness of 0.2 μm to 50 μm grown on said monocrystalline substrate, said active layer being doped with at least one of boron, beryllium, phosphorus, arsenic, sulfur, or selenium; two pairs of electrodes formed on said active layer; and a protective layer deposited on said active layer.
Claim 6
Dependent Claim 17 words
A Hall device as claimed in claim 3, wherein said protective layer is formed on non-doped diamond.
Claim 7
Dependent Claim 28 words
A Hall device as claimed in claim 1, wherein said protective layer is formed of one of silicon nitride, boron nitride, titanium nitride, aluminum nitride or aluminum oxide.
Claim 8
Dependent Claim 45 words
A Hall device as claimed in claim 1, 4 or 5 wherein said active layer is grown by a chemical vapor deposition method using a material gas including hydrogen gas and hydrocarbon and one of oxygen gas, water, carbon monoxide, carbon dioxide or hydrogen peroxide.
Claim 9
Dependent Claim 19 words
A Hall device as claimed in claim 1, 2, 3, 4 or 5, wherein said monocrystalline substrate is diamond.
Claim 10
Dependent Claim 14 words
A Hall device as claimed in claim 6, wherein said monocrystalline substrate is diamond.
Claim 11
Dependent Claim 28 words
A Hall device as claimed in 1, 2, 3, 4 or 5, wherein the monocrystalline substrate is one of aluminum nitride, aluminum oxide, silicon nitride or silicon dioxide.
Claim 12
Dependent Claim 23 words
A Hall device as claimed in 6, wherein the monocrystalline substrate is one of aluminum nitride, aluminum oxide, silicon nitride or silicon dioxide.

References Cited (Backward Citations)

JPS57121288A Cited
JPS60127293A Cited
US4783368A Cited
EP0254560A1 Cited
US4863529A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-11-10 1996-05-11 1996-11-10 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-11-10 2000-05-11 2000-11-10 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-11-10 2004-05-11 2004-11-10 $7700.00 Window Closed / Lapsed

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