US5160398A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Etching method and apparatus
Assignee: Sony Corp
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Filing: 1990-11-16
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Granted: 1992-11-03
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Expires: 2010-11-16
Abstract
Abstract A reactive ion etching method is described in which a silicon compound film formed on an underlying layer or a substrate is etched through a mask layer by a two-stage procedure. In the two-stage procedure, part of the silicon compound film is first etched with a gas containing a hydrogen-free carbon fluoride gas at a high etching rated and then with a gas containing a hydrogen-containing carbon fluoride gas while reducing the damage on the underlying layer or substrate. The apparatus for carrying out the method is also disclosed.
Inventors
- 👤 Toshiharu Yanagida
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 22:26
CPC Classifications
H; H10; H10P; H10P50/00; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32623; H01J37/3266; H10P50/20; H10P50/28; H10P50/282; H10P50/283
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
115 words
A reactive ion etching apparatus comprising: an anode electrode; a cathode electrode being spaced in parallel to the anode electrode to form a discharge region therebetween and supporting a material to be etched thereon; magnet means being provided behind the anode electrode said magnet means having a magnetic field component intersecting with an electric field and said magnet means being movable along a direction intersecting with the electric field; and magnetic field applicator means being provided around the cathode electrode and having a magnetic field component intersecting with the electric field, said magnetic field applicator means consisting of a plurality of magnets capable of generating a uniform magnetic field toward the material to be etched.
Claim 2
Dependent Claim
115 words
A reactive ion etching apparatus comprising: an anode electrode; a cathode electrode being spaced in parallel to the anode electrode to form a discharge region therebetween and supporting a material to be etched thereon; magnet means being provided behind the anode electrode said magnet means having a magnetic field component intersecting with an electric field and said magnet means being movable along a direction intersecting with the electric field; and magnetic field applicator means being provided around the cathode electrode and having a magnetic field component intersecting with the electric field, said magnetic field applicator means consisting of a plurality of magnets capable of generating a uniform magnetic field toward the material to be etched.
Claim 3
Dependent Claim
23 words
The apparatus according to claim 1, wherein said magnet means has a magnetic field component intersecting at right angles with the electric field.
Claim 4
Dependent Claim
16 words
The apparatus according to claim 1, further comprising a cathode cover made of a fluorine-containing resin.
Claim 5
Dependent Claim
16 words
The apparatus according to claim 1, further comprising a third electrode having a fluorine-containing resin thereon.
Claim 6
Dependent Claim
17 words
The apparatus according to claim 4, wherein the third electrode is controlled separately from the cathode electrode.
Claim 7
Dependent Claim
21 words
The apparatus according to claim 4, wherein said third electrode has a ring structure with an opening at the center thereof.
Claim 8
Dependent Claim
26 words
An apparatus according to claim 1, wherein the plurality of magnets of the magnetic field application means are provided at equal intervals around the cathode electrode.
Claim 9
Dependent Claim
101 words
A reactive ion etching apparatus comprising: an anode electrode; a cathode electrode being spaced in parallel to the anode electrode to form a discharge region therebetween and supporting a material to be etched thereon; magnet means being provided behind the anode electrode and having a magnetic field component intersecting with an electric field, said magnet means being movable along a direction intersecting with the electric field; and magnetic field applicator means consisting of a plurality of magnets being provided at equal intervals around the cathode electrode, said magnetic field applicator means having a magnetic field component intersecting with the electric field.
Claim 10
Dependent Claim
101 words
A reactive ion etching apparatus comprising: an anode electrode; a cathode electrode being spaced in parallel to the anode electrode to form a discharge region therebetween and supporting a material to be etched thereon; magnet means being provided behind the anode electrode and having a magnetic field component intersecting with an electric field, said magnet means being movable along a direction intersecting with the electric field; and magnetic field applicator means consisting of a plurality of magnets being provided at equal intervals around the cathode electrode, said magnetic field applicator means having a magnetic field component intersecting with the electric field.
Claim 11
Dependent Claim
16 words
An apparatus according to claim 8, further comprising a cathode cover made of a fluorine-containing resin.
Claim 12
Dependent Claim
30 words
An apparatus according to claim 9, further comprising having a third electrode ring structure with an opening at the center thereof and having a fluorine-containing resin on said ring structure.
Claim 13
Dependent Claim
17 words
An apparatus according to claim 10, wherein the third electrode is controlled separately from the cathode electrode.
Claim 14
Dependent Claim
27 words
An apparatus according to claim 1, further comprising a cathode cover made of a fluorine-containing resin, said cover having an opening for receiving a material being etched.
Claim 15
Dependent Claim
27 words
An apparatus according to claim 8, further comprising a cathode cover made of a fluorine-containing resin, said cover having an opening for receiving the material being etched.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-11-03 | 1996-05-04 | 1996-11-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-11-03 | 2000-05-04 | 2000-11-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-11-03 | 2004-05-04 | 2004-11-03 | $7700.00 | Window Closed / Lapsed |