Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
125 words
A process for the production of a composition modulated alloy having a predetermined concentration gradient comprising depositing upon a substrate a plurality of adjacent sets of metal layers, each set comprising at least two adjacent layers, said two adjacent layers being formed of a first metal and a second metal respectively, such that the individual layer thicknesses of said first metal and said second metal are varied in a predetermined manner and are different in each successive set, wherein the ratio of the layer thickness of said first metal to the layer thickness of said second metal remains constant in all sets and the combined thickness of the adjacent layers of said first metal and said second metal varies from one set to the next.
Claim 2
Dependent Claim
125 words
A process for the production of a composition modulated alloy having a predetermined concentration gradient comprising depositing upon a substrate a plurality of adjacent sets of metal layers, each set comprising at least two adjacent layers, said two adjacent layers being formed of a first metal and a second metal respectively, such that the individual layer thicknesses of said first metal and said second metal are varied in a predetermined manner and are different in each successive set, wherein the ratio of the layer thickness of said first metal to the layer thickness of said second metal remains constant in all sets and the combined thickness of the adjacent layers of said first metal and said second metal varies from one set to the next.
Claim 3
Dependent Claim
28 words
The process of claim 1 wherein said metals are deposited upon said substrate by a method selected from the group consisting of vapor deposition, sputtering and pulsed electrodeposition.
Claim 4
Dependent Claim
12 words
The process of claim 2 wherein said deposition method is pulsed electrodeposition.
Claim 5
Dependent Claim
13 words
The process of claim 3 wherein said deposition method is pulsed galvanostatic electrodeposition.
Claim 6
Dependent Claim
13 words
The process of claim 3 wherein said deposition method is pulsed potentiostatic electrodeposition.
Claim 7
Dependent Claim
13 words
The process of claim 5 wherein said pulsed potentiostatic electrodeposition is coulometrically controlled.
Claim 8
Dependent Claim
17 words
The process of claim 4 wherein a cathode potential is varied as a function of deposition thickness.
Claim 9
Dependent Claim
160 words
A process for the production of a multilayer alloy having a predetermined concentration gradient, comprising: providing an electrolyte containing a first metal and a second metal; providing a substrate upon which said first metal and said second metal may be electrodeposited; at least partially immersing said substrate in said electrolyte; passing an electric current through said substrate, said electric current being alternately pulsed for predetermined durations between a value corresponding to a reduction potential of said first metal and a value corresponding to a reduction potential of said second metal, thereby producing a composition modulated alloy having adjacent pairs of layers of said first metal and said second metal on an immersed surface of said substrate wherein the ratio of the layer thickness of said first metal to the layer thickness of said second metal in each pair remains constant, and the wavelength of the alloy varies from one pair to the next with the overall thickness of the alloy.
Claim 10
Dependent Claim
160 words
A process for the production of a multilayer alloy having a predetermined concentration gradient, comprising: providing an electrolyte containing a first metal and a second metal; providing a substrate upon which said first metal and said second metal may be electrodeposited; at least partially immersing said substrate in said electrolyte; passing an electric current through said substrate, said electric current being alternately pulsed for predetermined durations between a value corresponding to a reduction potential of said first metal and a value corresponding to a reduction potential of said second metal, thereby producing a composition modulated alloy having adjacent pairs of layers of said first metal and said second metal on an immersed surface of said substrate wherein the ratio of the layer thickness of said first metal to the layer thickness of said second metal in each pair remains constant, and the wavelength of the alloy varies from one pair to the next with the overall thickness of the alloy.