US5157700A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Exposure apparatus for controlling intensity of exposure radiation
Assignee: Canon Inc
•
Filing: 1989-08-31
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Granted: 1992-10-20
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Expires: 2009-08-31
Abstract
Abstract An exposure apparatus usable with synchrotron radiation source wherein the synchrotron radiation is generated by electron injection into a ring. The exposure apparatus is to transfer a semiconductor element pattern of a mask onto a semiconductor wafer by the synchrotron radiation. The apparatus includes a shutter for controlling the exposure of the wafer. The shutter controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined in response to the electron injection, and thereafter, the illuminance distribution is corrected in a predetermined manner. By this, the illuminance distribution data for controlling the shutter always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer are exposed with high precision.
Inventors
- 👤 Hiroshi Kurosawa
- 👤 Mitsuaki Amemiya
- 👤 Shigeru Terashima
- 👤 Koji Uda
- 👤 Isamu Shimoda
- 👤 Shunichi Uzawa
- 👤 Kunitaka Ozawa
- 👤 Makiko Mori
- 👤 Ryuichi Ebinuma
- 👤 Shinichi Hara
- 👤 Nobutoshi Mizusawa
- 👤 Eigo Kawakami
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 23:51
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03F7/70058; G03F7/70091; G03F7/702
Claims Analysis
Total Claims: 66
Claim 1
Independent Claim
86 words
An exposure apparatus usable with synchrotron radiation generating means for injecting electrons into a ring to produce synchrotron radiation, said apparatus comprising: exposure means for exposing a wafer, through a mask, to the synchrotron radiation introduced from the synchrotron radiation generating means through a window; intensity detecting means for detecting an intensity distribution of the synchrotron radiation; and control means for controlling said exposure means on the basis of the intensity distribution provided by said detecting means immediately after injection of the electrons into the ring.
Claim 2
Dependent Claim
86 words
An exposure apparatus usable with synchrotron radiation generating means for injecting electrons into a ring to produce synchrotron radiation, said apparatus comprising: exposure means for exposing a wafer, through a mask, to the synchrotron radiation introduced from the synchrotron radiation generating means through a window; intensity detecting means for detecting an intensity distribution of the synchrotron radiation; and control means for controlling said exposure means on the basis of the intensity distribution provided by said detecting means immediately after injection of the electrons into the ring.
Claim 3
Dependent Claim
37 words
An apparatus according to claim 1, wherein said control means comprises means for controlling said exposure means on the basis of the intensity distribution of the synchrotron radiation immediately after one of mounting and exchanging the window.
Claim 4
Dependent Claim
28 words
An apparatus according to claim 1, wherein said intensity detecting means comprises a wafer carrying stage for carrying the wafer and further comprising an X-ray detector mounted thereon.
Claim 5
Dependent Claim
40 words
An apparatus according to claim 1, wherein said exposure means comprises a shutter for controlling the amount of radiation introduced, and wherein said control means controls the shutter in accordance with the intensity distribution detected by said intensity detecting means.
Claim 6
Dependent Claim
59 words
An X-ray exposure apparatus using synchrotron radiation, said apparatus comprising: detecting means for detecting an intensity of X-rays after injection of electrons to generate the synchrotron radiation; and means for calculating an X-ray intensity during an exposure operation on the basis of a result of detection by said detecting means and on an attenuation curve of the injected electrons.
Claim 7
Dependent Claim
59 words
An X-ray exposure apparatus using synchrotron radiation, said apparatus comprising: detecting means for detecting an intensity of X-rays after injection of electrons to generate the synchrotron radiation; and means for calculating an X-ray intensity during an exposure operation on the basis of a result of detection by said detecting means and on an attenuation curve of the injected electrons.
Claim 8
Dependent Claim
103 words
An exposure apparatus, comprising: a shutter for controlling exposure; a sensor for detecting an intensity of exposure radiation at a portion of an exposure area; a controller for controlling said shutter; and a signal processor for calculating a cumulative amount of exposure on the basis of the intensity of the exposure radiation detected by said sensor at the exposure area portion upon a preliminary actuation of said shutter by said controller, and for supplying an output to said controller, wherein said controller effects control of said shutter in accordance with the output supplied from said signal processor, to control an actual exposure operation.
Claim 9
Dependent Claim
103 words
An exposure apparatus, comprising: a shutter for controlling exposure; a sensor for detecting an intensity of exposure radiation at a portion of an exposure area; a controller for controlling said shutter; and a signal processor for calculating a cumulative amount of exposure on the basis of the intensity of the exposure radiation detected by said sensor at the exposure area portion upon a preliminary actuation of said shutter by said controller, and for supplying an output to said controller, wherein said controller effects control of said shutter in accordance with the output supplied from said signal processor, to control an actual exposure operation.
Claim 10
Dependent Claim
34 words
An apparatus according to claim 6, further comprising means for moving said sensor in the exposure area, and wherein said signal processor calculates an amount of exposure from a plurality of exposure area portions.
Claim 11
Dependent Claim
33 words
An apparatus according to claim 6, wherein said controller comprises means for correcting control of said shutter on the basis of the cumulative amount of exposure fed back thereto from said signal processor.
Claim 12
Dependent Claim
112 words
An exposure apparatus, comprising: a shutter for controlling exposure; a sensor for detecting an intensity of exposure radiation at a position of an exposure area; a shutter driver for opening and closing said shutter; and calculating means for receiving outputs of said sensor when said shutter is opened and when said shutter is closed, in synchronism with opening and closing of said shutter by said shutter driver, and for processing the outputs to calculate an intensity of the exposure radiation, wherein said calculating means calculates the intensity of the exposure radiation by storing and processing information from said semiconductor sensor immediately before and after actuation of said shutter by said shutter driver.
Claim 13
Dependent Claim
112 words
An exposure apparatus, comprising: a shutter for controlling exposure; a sensor for detecting an intensity of exposure radiation at a position of an exposure area; a shutter driver for opening and closing said shutter; and calculating means for receiving outputs of said sensor when said shutter is opened and when said shutter is closed, in synchronism with opening and closing of said shutter by said shutter driver, and for processing the outputs to calculate an intensity of the exposure radiation, wherein said calculating means calculates the intensity of the exposure radiation by storing and processing information from said semiconductor sensor immediately before and after actuation of said shutter by said shutter driver.
Claim 14
Dependent Claim
57 words
An X-ray exposure apparatus for transferring by synchrotron radiation a pattern of a mask onto a member coated with a sensitive resist, said apparatus comprising: first detecting means for detecting an intensity of X-ray rays, corresponding to an exposure area; and second detecting means, disposed outside of the exposure area, for detecting attenuation of the synchrotron radiation.
Claim 15
Dependent Claim
57 words
An X-ray exposure apparatus for transferring by synchrotron radiation a pattern of a mask onto a member coated with a sensitive resist, said apparatus comprising: first detecting means for detecting an intensity of X-ray rays, corresponding to an exposure area; and second detecting means, disposed outside of the exposure area, for detecting attenuation of the synchrotron radiation.
Claim 16
Dependent Claim
109 words
An exposure apparatus comprising: a shutter for controlling an exposure period; a semiconductor sensor for detecting an intensity of exposure radiation; a wafer stage; a wafer stage driver for driving said wafer stage; a shutter driver for opening and closing said shutter; and calculating means for receiving an output of said semiconductor sensor in synchronism with opening and closing of said shutter and for processing the output to calculate an intensity of the exposure radiation, wherein said wafer stage, upon a detection of exposure radiation intensity by said sensor, retracts the wafer from exposure radiation, so that the wafer is not exposed to the exposure radiation during a detection.
Claim 17
Dependent Claim
109 words
An exposure apparatus comprising: a shutter for controlling an exposure period; a semiconductor sensor for detecting an intensity of exposure radiation; a wafer stage; a wafer stage driver for driving said wafer stage; a shutter driver for opening and closing said shutter; and calculating means for receiving an output of said semiconductor sensor in synchronism with opening and closing of said shutter and for processing the output to calculate an intensity of the exposure radiation, wherein said wafer stage, upon a detection of exposure radiation intensity by said sensor, retracts the wafer from exposure radiation, so that the wafer is not exposed to the exposure radiation during a detection.
Claim 18
Dependent Claim
102 words
An exposure apparatus comprising: a shutter for controlling an exposure period; a semiconductor sensor for detecting an intensity of exposure radiation; a wafer stage; a wafer stage driver for driving said wafer stage; a shutter driver for opening and closing said shutter; calculating means for receiving an output of said semiconductor sensor in synchronism with opening and closing of said shutter by said shutter driver, and for processing the output to calculate an intensity of the exposure radiation; and an auxiliary shutter for preventing the wafer from being exposed to the radiation during detection of the exposure radiation intensity by said sensor.
Claim 19
Dependent Claim
102 words
An exposure apparatus comprising: a shutter for controlling an exposure period; a semiconductor sensor for detecting an intensity of exposure radiation; a wafer stage; a wafer stage driver for driving said wafer stage; a shutter driver for opening and closing said shutter; calculating means for receiving an output of said semiconductor sensor in synchronism with opening and closing of said shutter by said shutter driver, and for processing the output to calculate an intensity of the exposure radiation; and an auxiliary shutter for preventing the wafer from being exposed to the radiation during detection of the exposure radiation intensity by said sensor.
Claim 20
Dependent Claim
156 words
An exposure apparatus usable with an exposure radiation source, said apparatus comprising: a stage for supporting a member to be exposed; optical control means for controlling radiation projected from the exposure radiation source to the member; optical detecting means for detecting one of an intensity of the radiation of the radiation source and the intensity of the radiation on a surface of the member to be exposed; driving profile determining means, coupled with said optical control means and said optical detecting means, for determining a driving profile of said optical control means based on the intensity on the surface as a function of position of the surface and based on the intensity of the radiation source, to provide a uniform amount of exposure on the surface; and driving profile compensating means for one of expanding and contracting a time axis of the driving profile in accordance with a change in the intensity of the radiation source.
Claim 21
Dependent Claim
156 words
An exposure apparatus usable with an exposure radiation source, said apparatus comprising: a stage for supporting a member to be exposed; optical control means for controlling radiation projected from the exposure radiation source to the member; optical detecting means for detecting one of an intensity of the radiation of the radiation source and the intensity of the radiation on a surface of the member to be exposed; driving profile determining means, coupled with said optical control means and said optical detecting means, for determining a driving profile of said optical control means based on the intensity on the surface as a function of position of the surface and based on the intensity of the radiation source, to provide a uniform amount of exposure on the surface; and driving profile compensating means for one of expanding and contracting a time axis of the driving profile in accordance with a change in the intensity of the radiation source.
Claim 22
Dependent Claim
23 words
An apparatus according to claim 13, wherein the radiation source is an X-ray source, and said optical control means comprises a movable aperture.
Claim 23
Dependent Claim
27 words
An apparatus according to claim 13, wherein the radiation source is a synchrotron radiation source, and said optical control means comprises an actuator for swinging a mirror.
Claim 24
Dependent Claim
108 words
An exposure apparatus usable with a radiation source, said apparatus comprising: a stage for supporting a member to be exposed; exposure control means, disposed in a radiation path between the radiation source and said stage, including a movable member for selectively limiting the radiation from said radiation source to the member; determining means for determining a driving speed for providing a constant amount of exposure of the member to radiation, despite any attenuation, with time, of an intensity of the radiation to the member; and driving means for driving said movable member of said exposure control means in accordance with the driving speed determined by said determining means.
Claim 25
Dependent Claim
108 words
An exposure apparatus usable with a radiation source, said apparatus comprising: a stage for supporting a member to be exposed; exposure control means, disposed in a radiation path between the radiation source and said stage, including a movable member for selectively limiting the radiation from said radiation source to the member; determining means for determining a driving speed for providing a constant amount of exposure of the member to radiation, despite any attenuation, with time, of an intensity of the radiation to the member; and driving means for driving said movable member of said exposure control means in accordance with the driving speed determined by said determining means.
Claim 26
Dependent Claim
16 words
An apparatus according to claim 16, wherein said exposure control means comprises a movable aperture stop.
Claim 27
Dependent Claim
15 words
An apparatus according to claim 16, wherein said exposure control means comprises a movable mirror.
Claim 28
Dependent Claim
102 words
An exposure apparatus usable with a radiation source, said apparatus comprising: a stage for supporting a member to be exposed; exposure control means, disposed in a radiation path between the radiation source and said stage, including a movable member for selectively limiting the radiation from said radiation source to the member; determining means for determining a driving speed for providing a constant amount of exposure of the member to radiation, despite any attenuation, with time, of an intensity of the radiation to the member; and driving means for driving said stage in accordance with the driving speed determined by said determining means.
Claim 29
Dependent Claim
102 words
An exposure apparatus usable with a radiation source, said apparatus comprising: a stage for supporting a member to be exposed; exposure control means, disposed in a radiation path between the radiation source and said stage, including a movable member for selectively limiting the radiation from said radiation source to the member; determining means for determining a driving speed for providing a constant amount of exposure of the member to radiation, despite any attenuation, with time, of an intensity of the radiation to the member; and driving means for driving said stage in accordance with the driving speed determined by said determining means.
Claim 30
Dependent Claim
56 words
An exposure method for manufacturing semiconductor devices, comprising: injecting electrons into a ring to generate a synchrotron radiation beam; detecting an intensity distribution of the synchrotron radiation beam immediately after injection of the electrons in said injecting step; controlling exposure of a substrate to the synchrotron radiation beam on the basis of the detected intensity distribution.
Claim 31
Dependent Claim
56 words
An exposure method for manufacturing semiconductor devices, comprising: injecting electrons into a ring to generate a synchrotron radiation beam; detecting an intensity distribution of the synchrotron radiation beam immediately after injection of the electrons in said injecting step; controlling exposure of a substrate to the synchrotron radiation beam on the basis of the detected intensity distribution.
Claim 32
Independent Claim
39 words
A method according to 20, further comprising providing a window, which is substantially transparent to the synchrotron radiation beam, between the ring and the substrate, and effecting said detecting step with respect to the beam passed through the window.
Claim 33
Independent Claim
39 words
A method according to 20, further comprising providing a window, which is substantially transparent to the synchrotron radiation beam, between the ring and the substrate, and effecting said detecting step with respect to the beam passed through the window.
Claim 34
Dependent Claim
21 words
A method according to claim 21, further comprising effecting detecting step immediately after the window is one of mounted and replaced.
Claim 35
Dependent Claim
23 words
A method according to claim 21, further comprising effecting said detecting step using a detector mounted on a stage for carrying the substrate.
Claim 36
Dependent Claim
29 words
A method according to claim 23, wherein the detector includes a x-ray detector, and further comprising detecting the x-rays contained in the synchrotron radiation beam with the x-ray detector.
Claim 37
Dependent Claim
16 words
A method according to claim 21, further comprising using a shutter in said exposure controlling step.
Claim 38
Dependent Claim
84 words
An exposure method for manufacturing semiconductor devices, comprising: injecting electrons into a ring to generate a synchrotron radiation beam; detecting an intensity distribution of x-rays in the synchrotron radiation beam after injection of the electrons in said injection step; determining an intensity of the x-rays during a predetermined period on the basis of the detection in said detecting step and an attenuation curve of the injected electrons; and controlling exposure of a substrate to the synchrotron radiation beam on the basis of the determination.
Claim 39
Dependent Claim
84 words
An exposure method for manufacturing semiconductor devices, comprising: injecting electrons into a ring to generate a synchrotron radiation beam; detecting an intensity distribution of x-rays in the synchrotron radiation beam after injection of the electrons in said injection step; determining an intensity of the x-rays during a predetermined period on the basis of the detection in said detecting step and an attenuation curve of the injected electrons; and controlling exposure of a substrate to the synchrotron radiation beam on the basis of the determination.
Claim 40
Dependent Claim
38 words
A method according to claim 26, further comprising providing a window, which is substantially transparent to the synchrotron radiation beam, between the ring and the substrate, and effecting said detecting step to the beam passed through the window.
Claim 41
Dependent Claim
23 words
A method according to claim 27, further comprising effecting said detecting step using a detector mounted on a stage for carrying the substrate.
Claim 42
Dependent Claim
15 words
A method according to claim 28, further comprising using a shutter in said controlling step.
Claim 43
Dependent Claim
97 words
An exposure method for manufacturing semiconductor devices, comprising: opening a shutter for preliminary exposure of an exposure region; detecting exposure radiation through the shutter by a sensor located at a position in the exposure region when the shutter is preliminarily opened in said opening step; calculating an exposure amount of the position on the basis of the detection, and providing an information signal relating to the exposure amount; exposing a substrate to the exposure radiation, while the shutter is controlled on the basis of the information signal, to expose the substrate to the radiation for semiconductor manufacturing.
Claim 44
Dependent Claim
97 words
An exposure method for manufacturing semiconductor devices, comprising: opening a shutter for preliminary exposure of an exposure region; detecting exposure radiation through the shutter by a sensor located at a position in the exposure region when the shutter is preliminarily opened in said opening step; calculating an exposure amount of the position on the basis of the detection, and providing an information signal relating to the exposure amount; exposing a substrate to the exposure radiation, while the shutter is controlled on the basis of the information signal, to expose the substrate to the radiation for semiconductor manufacturing.
Claim 45
Dependent Claim
34 words
A method according to claim 30, further comprising repeating the preliminary exposure for different positions of the sensor, and providing the information signal on the basis of exposure amounts calculated for the different positions.
Claim 46
Dependent Claim
29 words
A method according to claim 30, further comprising providing a window which is substantially transparent to the radiation and effecting said detecting step to radiation passed through the window.
Claim 47
Dependent Claim
14 words
A method according to claim 30, wherein the radiation includes x-rays in synchrotron radiation.
Claim 48
Dependent Claim
78 words
An exposure method for manufacturing semiconductor devices, comprising: providing a sensor for detecting exposure radiation; operating a shutter for controlling exposure with the exposure radiation; detecting, immediately before and after the operation of the shutter an output of the sensor when the shutter is closed and an output of the sensor when the shutter is opened; determining a value related to an intensity of the exposure radiation on the basis of the outputs detected in said detecting step.
Claim 49
Dependent Claim
78 words
An exposure method for manufacturing semiconductor devices, comprising: providing a sensor for detecting exposure radiation; operating a shutter for controlling exposure with the exposure radiation; detecting, immediately before and after the operation of the shutter an output of the sensor when the shutter is closed and an output of the sensor when the shutter is opened; determining a value related to an intensity of the exposure radiation on the basis of the outputs detected in said detecting step.
Claim 50
Dependent Claim
29 words
A method according to claim 34, further comprising providing a window which is substantially transparent to the radiation and effecting said detecting step to radiation passed through the window.
Claim 51
Dependent Claim
14 words
A method according to claim 35, wherein the radiation includes x-rays in synchrotron radiation.
Claim 52
Dependent Claim
96 words
An exposure method for manufacturing semiconductor devices, comprising: providing an exposure control mechanism for controlling exposure of a substrate to exposure radiation, and operating the exposure control mechanism on the basis of a driving profile; performing one of expanding and contracting a time base of the driving profile in accordance with a change in an intensity property of the exposure radiation determined on the basis of detecting the exposure radiation to determine a corrected driving profile; and operating the exposure control mechanism in accordance with the corrected profile to expose the substrate to the exposure radiation.
Claim 53
Dependent Claim
96 words
An exposure method for manufacturing semiconductor devices, comprising: providing an exposure control mechanism for controlling exposure of a substrate to exposure radiation, and operating the exposure control mechanism on the basis of a driving profile; performing one of expanding and contracting a time base of the driving profile in accordance with a change in an intensity property of the exposure radiation determined on the basis of detecting the exposure radiation to determine a corrected driving profile; and operating the exposure control mechanism in accordance with the corrected profile to expose the substrate to the exposure radiation.
Claim 54
Dependent Claim
29 words
A method according to claim 37, further comprising providing a window which is substantially transparent to the radiation and effecting said detecting step to radiation passed through the window.
Claim 55
Dependent Claim
14 words
A method according to claim 38, wherein the radiation includes x-rays in synchrotron radiation.
Claim 56
Dependent Claim
70 words
An exposure method for manufacturing semiconductor devices, comprising: providing an exposure control mechanism for controlling exposure of a substrate to exposure radiation, and driving a movable member at a predetermined speed by the exposure control mechanism; determining the driving speed of the movable member in accordance with attenuation of intensity of the exposure radiation with time; and moving the movable member at the predetermined driving speed, while exposing the substrate.
Claim 57
Dependent Claim
70 words
An exposure method for manufacturing semiconductor devices, comprising: providing an exposure control mechanism for controlling exposure of a substrate to exposure radiation, and driving a movable member at a predetermined speed by the exposure control mechanism; determining the driving speed of the movable member in accordance with attenuation of intensity of the exposure radiation with time; and moving the movable member at the predetermined driving speed, while exposing the substrate.
Claim 58
Dependent Claim
25 words
A method according to claim 40, further comprising providing a window which is substantially transparent to the radiation, and detecting radiation passed through the window.
Claim 59
Dependent Claim
14 words
A method according to claim 41, wherein the radiation includes x-rays in synchrotron radiation.
Claim 60
Dependent Claim
70 words
An exposure method for manufacturing semiconductor devices, comprising: providing an exposure control mechanism for controlling exposure of a substrate to exposure radiation, and driving a stage carrying the substrate at a predetermined speed by the exposure control mechanism; determining the driving speed of the stage in accordance with attenuation of intensity of the exposure radiation with time; and moving the stage at the predetermined driving speed, while exposing the substrate.
Claim 61
Dependent Claim
70 words
An exposure method for manufacturing semiconductor devices, comprising: providing an exposure control mechanism for controlling exposure of a substrate to exposure radiation, and driving a stage carrying the substrate at a predetermined speed by the exposure control mechanism; determining the driving speed of the stage in accordance with attenuation of intensity of the exposure radiation with time; and moving the stage at the predetermined driving speed, while exposing the substrate.
Claim 62
Dependent Claim
25 words
A method according to claim 43, further comprising providing a window which is substantially transparent to the radiation and detecting radiation passed through the window.
Claim 63
Dependent Claim
14 words
A method according to claim 44, wherein the radiation includes x-rays in synchrotron radiation.
Claim 64
Dependent Claim
77 words
An exposure method for manufacturing semiconductor devices, comprising: obtaining information, related to intensity of x-rays contained in a synchrotron radiation beam supplied to an exposure region, by a first detector disposed in the exposure region; retracting the first detector outside the exposure region; detecting attenuation of the synchrotron radiation beam with a second sensor disposed outside the exposure region; and controlling exposure of the exposure region on the basis of outputs of the first and second sensors.
Claim 65
Dependent Claim
77 words
An exposure method for manufacturing semiconductor devices, comprising: obtaining information, related to intensity of x-rays contained in a synchrotron radiation beam supplied to an exposure region, by a first detector disposed in the exposure region; retracting the first detector outside the exposure region; detecting attenuation of the synchrotron radiation beam with a second sensor disposed outside the exposure region; and controlling exposure of the exposure region on the basis of outputs of the first and second sensors.
Claim 66
Dependent Claim
29 words
A method according to claim 46, further comprising providing a window which is substantially transparent to the radiation and effecting said detecting step to radiation passed through the window.
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| 7.5 Years (Year 8) | 1999-10-20 | 2000-04-20 | 2000-10-20 | $3760.00 | Window Closed / Lapsed |
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