Exposure control system for full field photolithography using pulsed sources

Claim 2

An exposure control system comprising: a pulsed light source; variable attenuation means, placed between said pulsed light source and the system to be exposed, for variably attenuating the light emitted by said pulsed light source; exposure dose monitor means, placed between said variable attenuation means and the system to be exposed, for monitoring the exposure dose of the attenuated light pulses; and control means, associated with said exposure dose monitor means, said variable attenuation means, and said pulsed light source, for controlling the attenuation of the light emitted by said pulsed light source by said variable attenuation means whereby exposure can be accurately controlled with a minimum of light pulses from said pulsed light source.

Claim 3

An exposure control system as in claim 1 wherein: said pulsed light source is an X-ray source.

Claim 4

An exposure control system as in claim 1 wherein: said pulsed light source is a plasma blackbody XUV source.

Claim 5

An exposure control system as in claim 1 wherein: said pulsed light source is a laser.

Claim 6

An exposure control system as in claim 4 wherein: said laser is an excimer laser.

Claim 7

An exposure control system as in claim 4 wherein: said laser is a free-electron laser.

Claim 8

An exposure control system as in claim 4 wherein: said laser is a frequency multiplied laser.

Claim 9

An exposure control system as in claim 1 wherein: said variable attenuation means comprises a movable continuous attenuation gradient ranging from a high attenuation to a low attenuation.

Claim 10

An exposure control system as in claim 1 wherein said variable attenuation means comprises: a wheel, a plurality of discrete attenuations spaced annularly a predetermined distance apart on said wheel, means for rotating said wheel; and means for detecting the angular position of said wheel.

Claim 11

An exposure control system as in claim 9 wherein: each of said plurality of attenuators have a different attenuation.

Claim 12

An exposure control system as in claim 10 wherein: each of said plurality of attenuators differ in attenuation by equal logarithmic steps.

Claim 13

An exposure control system as in claim 9 wherein: said plurality of attenuators are separated into groups by non-attenuating sections.

Claim 14

An exposure control system as in claim 12 wherein: each of said groups are the same.

Claim 15

An exposure control system as in claim 1 wherein said exposure dose monitor means comprises: a beam splitter; and a beam detector.

Claim 16

An exposure control system as in claim 1 further comprising: a fixed attenuator positioned in the path of light emitted by said pulsed light source.

Claim 17

An exposure control system as in claim 1 wherein: said control means further comprises means for determining a cumulative exposure dose delivered by said pulsed light source after being attenuated.

Claim 18

An exposure control system as in claim 16 wherein: said control means further comprises means for repeatedly calculating the pulsed light source energy distribution function based on recent performance of said pulsed light source.

Claim 19

An exposure contol system as in claim 1 wherein said control means further comprises: cumulative dose means, associated with said exposure dose monitor means, for maintaining a cumulative exposure dose of attenuated light pulses emitted by said pulsed light source; exposure dose calculation means, associated with said cumulative dose means, for calculating the attenuation needed for a next exposure dose in order to fall within a predetermined exposure tolerance; selection means for selecting an attenuation from said variable attenuation means that most closely approaches the degree of attenuation calculated by said exposure dose calculation means; attenuation movement means, associated with said variable attenuation means and said selection means, for moving the attenuation selected from said variable attenuation means into the path of light emitted by said pulsed light source; and pulse stimulation means for controllably stimulating a pulse of light from said pulsed light source.

Claim 20

An exposure control system for use in photolithography comprising: a pulsed laser light source capable of emitting multiple exposure doses of light which could fluctuate in exposure dose with each pulse; a wheel having a plurality of openings equally spaced along the circumferential portion, the openings capable of being positioned in the path of light emitted from said pulsed laser light source; a plurality of attenuators each capable of attenuating differing quantities of the multiple exposure doses, a different one of said plurality of attenuators being placed in each of said plurality of openings; a motor for rotating said wheel; sensor means for detecting the angular position of said wheel; a beam splitter positioned in the path of the multiple exposure doses after being attenuated; a detector positioned in the path of the portion of the multiple exposure doses diverted by said beam splitter; cumulative dose means, associated with said detector, for measuring the cumulative exposure dose generated by the attenuated multiple exposure doses; storage means for storing a pulse energy distribution of a number of prior exposure doses emitted by said pulsed laser light source; exposure dose calculating means, associated with said cumulative dose means and said storage means, for calculating the attenuation needed for a next exposure dose in order to fall within a predetermined exposure tolerance; selection means for selecting an attenuator from said plurality of attenuators that most closely approaches the degree of attenuation calculated by said exposure dose calculating means; motor control means, associated with said selection means and said motor, for positioning the attenuator into the path of light emitted by said pulsed laser light source; and laser shot stimulating means for stimulating a pulse of light from said pulsed laser light source.

Claim 21

An exposure control system for use in photolithography comprising: a pulsed laser light source capable of emitting multiple exposure doses of light which could fluctuate in exposure dose with each pulse; a wheel having a plurality of openings equally spaced along the circumferential portion, the openings capable of being positioned in the path of light emitted from said pulsed laser light source; a plurality of attenuators each capable of attenuating differing quantities of the multiple exposure doses, a different one of said plurality of attenuators being placed in each of said plurality of openings; a motor for rotating said wheel; sensor means for detecting the angular position of said wheel; a beam splitter positioned in the path of the multiple exposure doses after being attenuated; a detector positioned in the path of the portion of the multiple exposure doses diverted by said beam splitter; cumulative dose means, associated with said detector, for measuring the cumulative exposure dose generated by the attenuated multiple exposure doses; storage means for storing a pulse energy distribution of a number of prior exposure doses emitted by said pulsed laser light source; exposure dose calculating means, associated with said cumulative dose means and said storage means, for calculating the attenuation needed for a next exposure dose in order to fall within a predetermined exposure tolerance; selection means for selecting an attenuator from said plurality of attenuators that most closely approaches the degree of attenuation calculated by said exposure dose calculating means; motor control means, associated with said selection means and said motor, for positioning the attenuator into the path of light emitted by said pulsed laser light source; and laser shot stimulating means for stimulating a pulse of light from said pulsed laser light source.