Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
70 words
In an optoelectronic device which comprises a substrate cyrstal having a crystal plane which is substantially a (n11) plane of cubic crystal, where n≧5, a semicondcutor laser formed on the substrate crystal, and the semicondcutor laser having a ridge-shaped or channel-shaped stripe to control a transverse mode and having an active layer and a cladding layer of (Al x Ga 1-x ) 0 .5 In 0 .5 P, where 0≦x≦1.
Claim 2
Dependent Claim
70 words
In an optoelectronic device which comprises a substrate cyrstal having a crystal plane which is substantially a (n11) plane of cubic crystal, where n≧5, a semicondcutor laser formed on the substrate crystal, and the semicondcutor laser having a ridge-shaped or channel-shaped stripe to control a transverse mode and having an active layer and a cladding layer of (Al x Ga 1-x ) 0 .5 In 0 .5 P, where 0≦x≦1.
Claim 3
Dependent Claim
32 words
An optoelectronic device according to claim 1, wherein a difference in tilt angle on the side walls of said stripe is controlled to a range of 2° to 10° at the largest.
Claim 4
Dependent Claim
118 words
In a compound semiconductor device which comprises a GaAs substrate having a crystal plane which is substantially a (n11) plane (wherein n is a real number of 2 or more) of cubic crystal and an AlGaInP semiconductor laser formed on the substrate by epitaxial growth of a semiconductor thin film comprising elements of Groups III and V of the periodic table, wherein the semiconductor laser is formed with Si or Ge as an n-type dopant when the crystal plane of the GaAs substrate is an A plane tilted toward the [011] direction or with Si or Ge as a p-type dopant when the crystal plane of the GaAs substrate is a B plane tilted toward the [011] direction.
Claim 5
Dependent Claim
118 words
In a compound semiconductor device which comprises a GaAs substrate having a crystal plane which is substantially a (n11) plane (wherein n is a real number of 2 or more) of cubic crystal and an AlGaInP semiconductor laser formed on the substrate by epitaxial growth of a semiconductor thin film comprising elements of Groups III and V of the periodic table, wherein the semiconductor laser is formed with Si or Ge as an n-type dopant when the crystal plane of the GaAs substrate is an A plane tilted toward the [011] direction or with Si or Ge as a p-type dopant when the crystal plane of the GaAs substrate is a B plane tilted toward the [011] direction.
Claim 6
Dependent Claim
14 words
A compound semiconductor device according to claim 3, wherein the n-type dopant is Si.
Claim 7
Dependent Claim
23 words
A compound semiconductor device according to claim 4, wherein the AlGaInP semiconductor layer has ridge-shaped or channel-shaped stripes which control a transverse mode.
Claim 8
Dependent Claim
40 words
An optoelectronic device according to claim 1, wherein said semiconductor laser is an index-guided semiconductor laser, and said crystal plane is inclined in a range of 5° to 15.8° from the (100) plane toward the [011] direction or [011] direction.
Claim 9
Dependent Claim
58 words
In a compound semiconductor device which comprises a GaAs crystal substrate crystal and an AlGaInP semiconductor laser formed on the substrate crystal, wherein a crystal plane of the substrate is tilted by 5°-15.8° from a (100) plane toward the [011] or [011] direction and an active layer of the semicondcutor laser has a single or multiquantum well structure.
Claim 10
Dependent Claim
58 words
In a compound semiconductor device which comprises a GaAs crystal substrate crystal and an AlGaInP semiconductor laser formed on the substrate crystal, wherein a crystal plane of the substrate is tilted by 5°-15.8° from a (100) plane toward the [011] or [011] direction and an active layer of the semicondcutor laser has a single or multiquantum well structure.
Claim 11
Dependent Claim
111 words
In a compound semiconductor device which comprises a crystal substrate having a crystal plane which is substantially a (n11) plane (wherein n is a real number of 2 or more) of cubic crystal and a compound semiconductor thin film formed on the substrate by epitaxial growth, wherein the compound semiconductor thin film is formed with a dopant which enters cation sites as an n-type dopant when the crystal plane of the crystal substrate is an A plane tilted toward the [011] direction or with a dopant which enters anion sites as a p-type dopant when the crystal plane of the crystal substrate is a B plane tilted toward the [011] direction.
Claim 12
Dependent Claim
111 words
In a compound semiconductor device which comprises a crystal substrate having a crystal plane which is substantially a (n11) plane (wherein n is a real number of 2 or more) of cubic crystal and a compound semiconductor thin film formed on the substrate by epitaxial growth, wherein the compound semiconductor thin film is formed with a dopant which enters cation sites as an n-type dopant when the crystal plane of the crystal substrate is an A plane tilted toward the [011] direction or with a dopant which enters anion sites as a p-type dopant when the crystal plane of the crystal substrate is a B plane tilted toward the [011] direction.
Claim 13
Dependent Claim
98 words
A compound semiconductor device according to claim 8, wherein the semiconductor device is a Groups III-V compound semiconductor device comprising elements of Groups III and V of the periodic table and the device is formed with an atom of Group IV which enters cation sites as an n-type dopant when the crystal plane of the crystal substrate is an A plane tilted toward the [011] direction or with an atom of Group IV which enters anion sites as a p-type dopant when the crystal plane of the crystal substrate is a B plane tilted toward the [011] direction.
Claim 14
Dependent Claim
29 words
A compound semiconductor device according to claim 9, wherein the atom of Group IV of the periodic table used as n-type dopant or p-type dopant is Si or Ge.
Claim 15
Dependent Claim
98 words
A compound semiconductor device according to claim 8, wherein the semiconductor device is a Groups II-VI compound semiconductor device comprising elements of Groups II and VI of the periodic table and the device is formed with an atom of group III which enters cation sites as an n-type dopant when the crystal plane of the crystal substrate is an A plane tilted toward the [011] direction or with, an atom of group V which enters anion sites as a p-type dopant when the crystal plane of the crystal substrate is a B plane tilted toward the [011] direction.
Claim 16
Dependent Claim
40 words
A compound semiconductor device according to claim 11, wherein the atom of group III of the periodic table used as n-type dopant is Al or Ga and the atom of Group V used as p-type dopant is P or As.
Claim 17
Dependent Claim
30 words
A compound semiconductor device according to claim 8, wherein the crystal substrate having an (n11) crystal plane of cubic crystal is tilted by at least 3° from the (100) plane.
Claim 18
Dependent Claim
30 words
A compound semiconductor device according to claim 9, wherein the crystal substrate having an (n11) crystal plane of cubic crystal is tilted by at least 3° from the (100) plane.
Claim 19
Dependent Claim
30 words
A compound semiconductor device according to claim 10, wherein the crystal substrate having an (n11) crystal plane of cubic crystal is tilted by at least 3° from the (100) plane.
Claim 20
Dependent Claim
30 words
A compound semiconductor device according to claim 11, wherein the crystal substrate having an (n11) crystal plane of cubic crystal is tilted by at least 3° from the (100) plane.
Claim 21
Dependent Claim
30 words
A compound semiconductor device according to claim 12, wherein the crystal substrate having an (n11) crystal plane of cubic crystal is tilted by at least 3° from the (100) plane.