US5153898A
Expired / Lapsed
US
⏱️ 0.0 years remaining
X-ray reduction projection exposure system of reflection type
Assignee: Canon Inc
•
Filing: 1992-02-28
•
Granted: 1992-10-06
•
Expires: 2012-02-28
Abstract
Abstract An X-ray exposure apparatus includes a stage for holding a mask having a pattern for circuit manufacturing, a stage for holding a wafer to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including a reflecting mirror arrangement, containing at least three, but not more than five, reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.
Inventors
- 👤 Masayuki Suzuki
- 👤 Noritaka Mochizuki
- 👤 Setsuo Minami
- 👤 Shigetaro Ogura
- 👤 Yasuaki Fukuda
- 👤 Yutaka Watanabe
- 👤 Yasuo Kawai
- 👤 Takao Kariya
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 19:44
CPC Classifications
G; G02; G02B; G02B17/00; G02B17/02; G02B17/06; G02B17/0626; G02B17/0636; B; B82; B82Y; B82Y10/00; G03; G03F; G03F7/00; G03F7/20; G03F7/2037; G03F7/2039; G03F7/70; G03F7/70008; G03F7/70033; G03F7/70216; G03F7/70233; G03F7/7025; G03F7/70691; G03F7/708; G03F7/70858; G03F7/70866; G03F7/70875; G03F7/70883; G03F7/70891
Claims Analysis
Total Claims: 92
Claim 1
Independent Claim
113 words
An X-ray exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system disposed between said mask stage and said wafer stage comprising a reflecting mirror arrangement comprising at least three, but not more than five, reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to a reduced image of the mask pattern with the X-rays; wherein at least one of the reflecting mirrors is provided with an aspherical reflecting surface.
Claim 2
Dependent Claim
113 words
An X-ray exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system disposed between said mask stage and said wafer stage comprising a reflecting mirror arrangement comprising at least three, but not more than five, reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to a reduced image of the mask pattern with the X-rays; wherein at least one of the reflecting mirrors is provided with an aspherical reflecting surface.
Claim 3
Dependent Claim
20 words
An apparatus according to claim 1, further including forced cooling means for cooling at least one of the reflecting mirrors.
Claim 4
Dependent Claim
20 words
An apparatus according to claim 1, wherein a space between at least two reflecting mirrors is filled with helium gas.
Claim 5
Dependent Claim
104 words
An X-ray exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system disposed between said mask stage and said wafer stage including a reflecting mirror arrangement containing at least one flat mirror and a plurality of non-flat mirrors, each of which mirrors are coated with multi-layer films, for receiving X-rays from the mask and directing them to the wafer to expose the wafer to a reduced image of the mask pattern with the X-rays.
Claim 6
Dependent Claim
104 words
An X-ray exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system disposed between said mask stage and said wafer stage including a reflecting mirror arrangement containing at least one flat mirror and a plurality of non-flat mirrors, each of which mirrors are coated with multi-layer films, for receiving X-rays from the mask and directing them to the wafer to expose the wafer to a reduced image of the mask pattern with the X-rays.
Claim 7
Dependent Claim
22 words
An apparatus according to claim 4, wherein at least one of the non-flat reflecting mirrors is provided with an aspherical reflecting surface.
Claim 8
Dependent Claim
19 words
An apparatus according to claim 4, further including cooling means for cooling at least one of the reflecting mirrors.
Claim 9
Dependent Claim
20 words
An apparatus according to claim 4, wherein a space between at least two reflecting mirrors is filled with helium gas.
Claim 10
Dependent Claim
101 words
An X-ray exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system disposed between said mask stage and said wafer stage including a reflecting mirror arrangement containing plural multi-layer film coated reflecting mirrors, at least one of which is provided with forced cooling means, for receiving X-rays from the mask and directing them to the wafer to expose the wafer to a reduced image of the mask pattern with the X-rays.
Claim 11
Dependent Claim
101 words
An X-ray exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system disposed between said mask stage and said wafer stage including a reflecting mirror arrangement containing plural multi-layer film coated reflecting mirrors, at least one of which is provided with forced cooling means, for receiving X-rays from the mask and directing them to the wafer to expose the wafer to a reduced image of the mask pattern with the X-rays.
Claim 12
Dependent Claim
21 words
An apparatus according to claim 8, wherein at least one of the reflecting mirrors is provided with an aspherical reflecting surface.
Claim 13
Dependent Claim
22 words
An apparatus according to claim 8, wherein at least two reflecting mirrors nearest the mask stage are provided with forced cooling means.
Claim 14
Dependent Claim
21 words
An apparatus according to claim 8, wherein helium gas flows in a space between at least two of the reflecting mirrors.
Claim 15
Dependent Claim
108 words
An X-ray exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; a reflection reduction imaging system disposed between said mask stage and said wafer stage including a reflecting mirror arrangement containing a plurality of reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to a reduced image of the mask pattern with the X-rays; and wherein helium gas flows through a space between at least two of said reflecting mirrors.
Claim 16
Dependent Claim
108 words
An X-ray exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; a reflection reduction imaging system disposed between said mask stage and said wafer stage including a reflecting mirror arrangement containing a plurality of reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to a reduced image of the mask pattern with the X-rays; and wherein helium gas flows through a space between at least two of said reflecting mirrors.
Claim 17
Dependent Claim
21 words
An apparatus according to claim 12, wherein at least one of the reflecting mirrors is provided with an aspherical reflecting surface.
Claim 18
Dependent Claim
19 words
An apparatus according to claim 12, further including cooling means for cooling at least one of the reflecting mirrors.
Claim 19
Dependent Claim
99 words
An X-ray exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; means for forcingly cooling the mask; and a reflection reduction imaging system disposed between said mask stage and said wafer stage including a reflecting mirror arrangement containing a plurality of reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to a reduced image of the mask pattern with the X-rays.
Claim 20
Dependent Claim
99 words
An X-ray exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; means for forcingly cooling the mask; and a reflection reduction imaging system disposed between said mask stage and said wafer stage including a reflecting mirror arrangement containing a plurality of reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to a reduced image of the mask pattern with the X-rays.
Claim 21
Dependent Claim
19 words
An apparatus according to claim 15, wherein at least one of said reflecting mirrors has an aspherical reflecting surface.
Claim 22
Dependent Claim
20 words
An apparatus according to claim 15, wherein at least one of said reflecting mirrors is provided with forced cooling means.
Claim 23
Dependent Claim
21 words
An apparatus according to claim 15, wherein helium gas flows through a space between at least two of the reflecting mirrors.
Claim 24
Dependent Claim
124 words
An X-ray reduction exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask; a reflection reduction imaging system disposed between said mask stage and said wafer stage including a reflecting mirror arrangement containing a plurality of reflecting mirrors which are coated with multi-layer films, at least one of the plurality of reflecting mirrors having an aspherical reflecting surface, said reflection reduction imaging system for exposing the wafer to a reduced image of the mask pattern in a rectangular area; and means for stepwisely moving said wafer stage to sequentially expose areas on the wafer having a configuration corresponding to the rectangular area.
Claim 25
Dependent Claim
124 words
An X-ray reduction exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask; a reflection reduction imaging system disposed between said mask stage and said wafer stage including a reflecting mirror arrangement containing a plurality of reflecting mirrors which are coated with multi-layer films, at least one of the plurality of reflecting mirrors having an aspherical reflecting surface, said reflection reduction imaging system for exposing the wafer to a reduced image of the mask pattern in a rectangular area; and means for stepwisely moving said wafer stage to sequentially expose areas on the wafer having a configuration corresponding to the rectangular area.
Claim 26
Dependent Claim
12 words
An apparatus according to claim 19, wherein said rectangular area is oblong.
Claim 27
Dependent Claim
21 words
An apparatus according to claim 19, wherein the wafer is exposed to the reduced image of the mask pattern with X-rays.
Claim 28
Dependent Claim
117 words
An X-ray reduction exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; plural reflecting mirrors for reflecting X-rays, disposed between said mask stage and said wafer stage, to expose the wafer to a reduced image of the mask pattern; and means for detecting a mark on said wafer stage in an enlarged scale using visible light coming from the wafer by way of said reflecting mirrors in a direction opposite to a direction of travel of the X-rays for exposing the wafer, whereby the mark can be detected substantially free from aberration.
Claim 29
Dependent Claim
117 words
An X-ray reduction exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; plural reflecting mirrors for reflecting X-rays, disposed between said mask stage and said wafer stage, to expose the wafer to a reduced image of the mask pattern; and means for detecting a mark on said wafer stage in an enlarged scale using visible light coming from the wafer by way of said reflecting mirrors in a direction opposite to a direction of travel of the X-rays for exposing the wafer, whereby the mark can be detected substantially free from aberration.
Claim 30
Dependent Claim
21 words
An apparatus according to claim 22, wherein at least one of said plural mirrors is provided with a multi-layer film coating.
Claim 31
Dependent Claim
19 words
An apparatus according to claim 22, wherein at least one of said plural mirrors has an aspherical reflecting surface.
Claim 32
Dependent Claim
14 words
An apparatus according to claim 22, wherein the visible light is a laser beam.
Claim 33
Dependent Claim
139 words
A reduction exposure apparatus, comprising: a mask stage for vertically holding a mask having a pattern for circuit manufacturing; a synchrotron orbital radiation source for producing energy rays for application of the rays to the mask; a wafer stage for horizontally holding a wafer to be exposed to the pattern of the mask with the rays; and reduction imaging means disposed between the mask and the wafer for exposing the wafer to a reduced image of the mask pattern, said imaging means comprising a plurality of reflecting mirrors, at least one of the reflecting mirrors having an aspherical reflecting surface and at least one of the reflecting mirrors being coated with a multi-layer film; and means for sequentially moving said wafer stage for sequentially exposing plural exposure areas of the wafer to the reduced image of the mask pattern.
Claim 34
Dependent Claim
139 words
A reduction exposure apparatus, comprising: a mask stage for vertically holding a mask having a pattern for circuit manufacturing; a synchrotron orbital radiation source for producing energy rays for application of the rays to the mask; a wafer stage for horizontally holding a wafer to be exposed to the pattern of the mask with the rays; and reduction imaging means disposed between the mask and the wafer for exposing the wafer to a reduced image of the mask pattern, said imaging means comprising a plurality of reflecting mirrors, at least one of the reflecting mirrors having an aspherical reflecting surface and at least one of the reflecting mirrors being coated with a multi-layer film; and means for sequentially moving said wafer stage for sequentially exposing plural exposure areas of the wafer to the reduced image of the mask pattern.
Claim 35
Dependent Claim
62 words
An X-ray reflecting imaging system, comprising: a first concave mirror having a multi-layer film reflecting surface; and a second concave mirror having a multi-layer reflecting film for receiving X-rays from said first concave mirror, said second concave mirror having an opening eccentric with respect to an axis of the imaging system for allowing the X-rays to pass through said second concave mirror.
Claim 36
Dependent Claim
62 words
An X-ray reflecting imaging system, comprising: a first concave mirror having a multi-layer film reflecting surface; and a second concave mirror having a multi-layer reflecting film for receiving X-rays from said first concave mirror, said second concave mirror having an opening eccentric with respect to an axis of the imaging system for allowing the X-rays to pass through said second concave mirror.
Claim 37
Dependent Claim
17 words
A system according to claim 27, wherein said first concave mirror is provided with forced cooling means.
Claim 38
Dependent Claim
21 words
A system according to claim 27, wherein a space between said first and second concave mirrors is filled with helium gas.
Claim 39
Dependent Claim
112 words
An X-ray reflecting imaging system, comprising: a first mirror having a concave reflecting surface for reflecting X-rays from an object; a second mirror having a convex reflecting surface for receiving the X-rays from said first mirror and reflecting them; a third mirror having a concave reflecting surface for receiving the X-rays from said second convex mirror and reflecting them to form an image of the object; and wherein the reflecting surface of at least one of said first and third concave mirrors is aspherical, whereby an image formed by the X-rays involves minimized aberrations; and wherein the reflecting surface of at least one of said mirrors is provided with a multi-layer coating.
Claim 40
Dependent Claim
112 words
An X-ray reflecting imaging system, comprising: a first mirror having a concave reflecting surface for reflecting X-rays from an object; a second mirror having a convex reflecting surface for receiving the X-rays from said first mirror and reflecting them; a third mirror having a concave reflecting surface for receiving the X-rays from said second convex mirror and reflecting them to form an image of the object; and wherein the reflecting surface of at least one of said first and third concave mirrors is aspherical, whereby an image formed by the X-rays involves minimized aberrations; and wherein the reflecting surface of at least one of said mirrors is provided with a multi-layer coating.
Claim 41
Dependent Claim
16 words
A system according to claim 30, wherein each of said mirrors are provided with multi-layer coatings.
Claim 42
Dependent Claim
19 words
A system according to claim 30, wherein the minimized aberrations are maintained within an area in a rectangular form.
Claim 43
Dependent Claim
15 words
A system according to claim 30 wherein said imaging system is a reduction imaging system.
Claim 44
Dependent Claim
17 words
A system according to claim 30, wherein said imaging system is used as an enlarging imaging system.
Claim 45
Independent Claim
89 words
A system for producing an image of an object using X-rays, said system comprising: imaging means provided between the object and a plane on which the image thereof is produced for receiving and reflecting X-rays, said imaging means comprising a plurality of X-ray reflecting elements provided with multi-layer coatings; and X-ray application means for applying the X-rays to the object inclinedly with respect to a surface of the object to cause the X-rays incident on the plane to be substantially parallel to a system axis of said imaging means.
Claim 46
Independent Claim
89 words
A system for producing an image of an object using X-rays, said system comprising: imaging means provided between the object and a plane on which the image thereof is produced for receiving and reflecting X-rays, said imaging means comprising a plurality of X-ray reflecting elements provided with multi-layer coatings; and X-ray application means for applying the X-rays to the object inclinedly with respect to a surface of the object to cause the X-rays incident on the plane to be substantially parallel to a system axis of said imaging means.
Claim 47
Dependent Claim
21 words
A system according to claim 35, wherein the object and the plane are located on opposite sides of the system axis.
Claim 48
Dependent Claim
26 words
A system according to claim 35, wherein a position of a front focus of said imaging means is coincident with a position of an entrance pupil.
Claim 49
Dependent Claim
179 words
An X-ray projection exposure apparatus for exposing a member sensitive to X-rays to a reduced image of a mask pattern with the X-rays, said apparatus comprising: an inlet port for receiving X-rays travelling substantially in a horizontal direction; a mask holder for holding a mask substantially vertically for the mask to receive the X-rays through said inlet port; a first mirror for receiving the X-rays coming from the mask and reflecting them in a substantially vertical direction; a second mirror disposed above said first mirror having a bottom curved reflecting surface for receiving the X-rays from the first mirror and reflecting them; a third mirror disposed below said first mirror having a top curved reflecting surface for receiving the X-rays coming from said second mirror and reflecting them; a fourth mirror disposed between said first and second mirrors having a bottom curved reflecting surface for receiving the X-rays from said third mirror and reflecting them substantially vertically; and a holder for holding the sensitive member substantially horizontally for the sensitive member to receive the X-rays from the fourth mirror.
Claim 50
Dependent Claim
179 words
An X-ray projection exposure apparatus for exposing a member sensitive to X-rays to a reduced image of a mask pattern with the X-rays, said apparatus comprising: an inlet port for receiving X-rays travelling substantially in a horizontal direction; a mask holder for holding a mask substantially vertically for the mask to receive the X-rays through said inlet port; a first mirror for receiving the X-rays coming from the mask and reflecting them in a substantially vertical direction; a second mirror disposed above said first mirror having a bottom curved reflecting surface for receiving the X-rays from the first mirror and reflecting them; a third mirror disposed below said first mirror having a top curved reflecting surface for receiving the X-rays coming from said second mirror and reflecting them; a fourth mirror disposed between said first and second mirrors having a bottom curved reflecting surface for receiving the X-rays from said third mirror and reflecting them substantially vertically; and a holder for holding the sensitive member substantially horizontally for the sensitive member to receive the X-rays from the fourth mirror.
Claim 51
Dependent Claim
16 words
An apparatus according to claim 38, wherein said second, third and fourth mirrors are optically coaxial.
Claim 52
Dependent Claim
22 words
An apparatus according to claim 39, wherein said first mirror is eccentric from a coaxis of said second, third and fourth mirrors.
Claim 53
Dependent Claim
29 words
An apparatus according to claim 38, wherein said third mirror has an eccentric opening for allowing the X-rays reflected by said fourth mirror to pass through said third mirror.
Claim 54
Dependent Claim
31 words
An apparatus according to claim 38, wherein said fourth mirror has an eccentric opening to allow the X-rays toward and away from said second mirror to pass through said fourth mirror.
Claim 55
Dependent Claim
28 words
An apparatus according to claim 38, wherein said holder, stage allows the X-rays to pass therethrough, so that the mask, which is of a transmitting type, is usable.
Claim 56
Dependent Claim
20 words
An apparatus according to claim 38, wherein said mask holder is disposed between said inlet port and said first mirror.
Claim 57
Dependent Claim
34 words
An apparatus according to claim 38, wherein said inlet port and said first mirror face a same side of the mask holder, so that the mask, which is of a reflection type, is usable.
Claim 58
Dependent Claim
100 words
An X-ray exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system disposed between said mask stage and said wafer stage comprising reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to a reduced image of the mask pattern with the X-rays; wherein at least one of the reflecting mirrors is provided with an aspherical reflecting surface.
Claim 59
Dependent Claim
100 words
An X-ray exposure apparatus, comprising: a mask stage for holding a mask having a pattern for circuit manufacturing; a wafer stage for holding a wafer to be exposed to the pattern of the mask with X-rays; and a reflection reduction imaging system disposed between said mask stage and said wafer stage comprising reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to a reduced image of the mask pattern with the X-rays; wherein at least one of the reflecting mirrors is provided with an aspherical reflecting surface.
Claim 60
Dependent Claim
23 words
A system according to claim 35, wherein the image is produced by only one side of at least one of said reflecting elements.
Claim 61
Dependent Claim
64 words
An X-ray exposure apparatus comprising: an original supporting stage for supporting an original; a substrate supporting stage for supporting a substrate; and a mirror assembly for projecting an image of a pattern of the original onto the substrate using X-rays, said mirror assembly comprising at least three mirrors each having curved reflecting surfaces and at least one of which has an aspherical reflection surface.
Claim 62
Dependent Claim
64 words
An X-ray exposure apparatus comprising: an original supporting stage for supporting an original; a substrate supporting stage for supporting a substrate; and a mirror assembly for projecting an image of a pattern of the original onto the substrate using X-rays, said mirror assembly comprising at least three mirrors each having curved reflecting surfaces and at least one of which has an aspherical reflection surface.
Claim 63
Dependent Claim
22 words
An apparatus according to claim 48, further comprising an illumination system for illuminating the original to project the image onto the substrate.
Claim 64
Dependent Claim
21 words
An apparatus according to claim 49, wherein said illumination system comprises a radiation source for emitting X-rays to illuminate the original.
Claim 65
Dependent Claim
22 words
An apparatus according to claim 50, wherein said mirror assembly comprises means for forming the image with X-rays reflected by the original.
Claim 66
Dependent Claim
20 words
An apparatus according to claim 50, wherein said mirror assembly comprises means for forming a reduced image of the pattern.
Claim 67
Dependent Claim
78 words
An apparatus according to claim 52, wherein said mirror assembly comprises a first concave mirror having a radius of curvature r1 with respect to its optical axis, a convex mirror having a radius of curvature r2 with respect to its optical axis and a second concave mirror having a radius of curvature R3 with respect to its optical axis, said mirrors being disposed in the named order from said illumination system, so that the conditions 0.9<r2/r1+r2/r3<1.1 are satisfied.
Claim 68
Dependent Claim
20 words
An apparatus according to claim 50, wherein said mirror assembly comprises a plurality of mirrors having multi-layer coating reflection surfaces.
Claim 69
Independent Claim
61 words
A method of manufacturing a semiconductor device, said method comprising: providing a mirror assembly including at least three mirrors each having curved reflecting surfaces and at least one of which has an aspherical mirror surface; and projecting an image of a pattern of an original onto a substrate through the mirror assembly to transfer the pattern onto the substrate using X-rays.
Claim 70
Independent Claim
61 words
A method of manufacturing a semiconductor device, said method comprising: providing a mirror assembly including at least three mirrors each having curved reflecting surfaces and at least one of which has an aspherical mirror surface; and projecting an image of a pattern of an original onto a substrate through the mirror assembly to transfer the pattern onto the substrate using X-rays.
Claim 71
Dependent Claim
34 words
A method according to claim 55, further comprising illuminating the original with X-rays from an illumination system, receiving the X-rays through the original by the mirror assembly and forming the image by the X-rays.
Claim 72
Dependent Claim
32 words
A method according to claim 56, further comprising providing the mirror assembly with a plurality of mirrors, at least one of the plurality of mirrors being provided with the aspherical reflection surface.
Claim 73
Dependent Claim
21 words
A method according to claim 57, further comprising providing the plurality of mirrors of the assembly with multi-layer coating reflection surfaces.
Claim 74
Dependent Claim
80 words
A method according to claim 57, further comprising providing the mirror assembly with a first concave mirror having a radius of curvature r1 with respect to its optical axis, a convex mirror having a radius of curvature r2 with respect to its optical axis and a second concave mirror having a radius of curvature r3 with respect to its optical axis, the mirrors being disposed in the named order from the illumination system, so that the conditions 0.9<r2/r1+r2/r3<1.1 are satisfied.
Claim 75
Dependent Claim
19 words
A method according to claim 56, further comprising forming a reduced image of the pattern by the mirror assembly.
Claim 76
Dependent Claim
16 words
A method according to claim 56, further comprising supplying the X-rays from a synchrotron radiation source.
Claim 77
Dependent Claim
84 words
A pattern transfer apparatus comprising: an original holder for holding an original having a pattern; a substrate holder for holding a substrate having plural areas; a projection system for projecting the pattern of the original onto an area of the substrate in a reduced scale, said projection system comprising a plurality of reflecting mirrors, wherein at least one of said mirrors has an aspherical reflection surface; and means for moving said substrate holder to sequentially transfer the pattern onto the areas of the substrate.
Claim 78
Dependent Claim
84 words
A pattern transfer apparatus comprising: an original holder for holding an original having a pattern; a substrate holder for holding a substrate having plural areas; a projection system for projecting the pattern of the original onto an area of the substrate in a reduced scale, said projection system comprising a plurality of reflecting mirrors, wherein at least one of said mirrors has an aspherical reflection surface; and means for moving said substrate holder to sequentially transfer the pattern onto the areas of the substrate.
Claim 79
Dependent Claim
18 words
An apparatus according to claim 62, wherein said projection system comprises at least three curved reflection surface mirrors.
Claim 80
Dependent Claim
80 words
A pattern transfer apparatus comprising: an original holder for holding an original having a pattern; a substrate holder for holding a substrate having plural areas; a projection system for projecting the pattern of the original onto an area of the substrate, said projection system comprising a plurality of reflecting mirrors, wherein at least one of said mirrors has an aspherical reflection surface; and means for moving said substrate holder to sequentially transfer the pattern onto the areas of the substrate.
Claim 81
Dependent Claim
80 words
A pattern transfer apparatus comprising: an original holder for holding an original having a pattern; a substrate holder for holding a substrate having plural areas; a projection system for projecting the pattern of the original onto an area of the substrate, said projection system comprising a plurality of reflecting mirrors, wherein at least one of said mirrors has an aspherical reflection surface; and means for moving said substrate holder to sequentially transfer the pattern onto the areas of the substrate.
Claim 82
Dependent Claim
18 words
An apparatus according to claim 64, wherein said projection system comprises at least three curved reflection surface mirrors.
Claim 83
Dependent Claim
85 words
A pattern transfer apparatus comprising: an original holder for holding an original having a pattern; substrate holder for holding a substrate having plural areas; a projection system for projecting the pattern of the original onto an area of the substrate in a reduced scale, said projection system comprising at least three curved reflection surface mirrors, wherein at least one of said mirrors has an aspherical reflection surface; and means for moving said substrate holder to sequentially transfer the pattern onto the areas of the substrate.
Claim 84
Dependent Claim
85 words
A pattern transfer apparatus comprising: an original holder for holding an original having a pattern; substrate holder for holding a substrate having plural areas; a projection system for projecting the pattern of the original onto an area of the substrate in a reduced scale, said projection system comprising at least three curved reflection surface mirrors, wherein at least one of said mirrors has an aspherical reflection surface; and means for moving said substrate holder to sequentially transfer the pattern onto the areas of the substrate.
Claim 85
Dependent Claim
75 words
A semiconductor manufacturing method comprising: holding an original having a pattern; holding a substrate having plural areas with a substrate holder; projecting the pattern of the original onto an area of the substrate in a reduced scale using a projection system having a plurality of reflecting mirrors, wherein at least one of the mirrors has an aspherical reflection surface; and moving the substrate holder to sequentially transfer the pattern onto the areas of the substrate.
Claim 86
Dependent Claim
75 words
A semiconductor manufacturing method comprising: holding an original having a pattern; holding a substrate having plural areas with a substrate holder; projecting the pattern of the original onto an area of the substrate in a reduced scale using a projection system having a plurality of reflecting mirrors, wherein at least one of the mirrors has an aspherical reflection surface; and moving the substrate holder to sequentially transfer the pattern onto the areas of the substrate.
Claim 87
Dependent Claim
20 words
A method according to claim 67, further comprising providing the projection system with at least three curved reflection surface mirrors.
Claim 88
Dependent Claim
71 words
A semiconductor manufacturing method comprising: holding an original having a pattern; holding a substrate having plural areas with a substrate holder; projecting the pattern of the original onto an area of the substrate using a projection system having a plurality of reflecting mirrors, wherein at least one of the mirrors has an aspherical reflection surface; and moving the substrate holder to sequentially transfer the pattern onto the areas of the substrate.
Claim 89
Dependent Claim
71 words
A semiconductor manufacturing method comprising: holding an original having a pattern; holding a substrate having plural areas with a substrate holder; projecting the pattern of the original onto an area of the substrate using a projection system having a plurality of reflecting mirrors, wherein at least one of the mirrors has an aspherical reflection surface; and moving the substrate holder to sequentially transfer the pattern onto the areas of the substrate.
Claim 90
Dependent Claim
20 words
A method according to claim 69, further comprising providing the projection system with at least three curved reflection surface mirrors.
Claim 91
Dependent Claim
76 words
A semiconductor manufacturing method comprising: holding an original having a pattern; holding a substrate having plural areas with a substrate holder; projecting the pattern of the original onto an area of the substrate in a reduced scale using a projection system having at least three reflection surface mirrors, wherein at least one of the mirrors has an aspherical reflection surface; and moving the substrate holder to sequentially transfer the pattern onto the areas of the substrate.
Claim 92
Dependent Claim
76 words
A semiconductor manufacturing method comprising: holding an original having a pattern; holding a substrate having plural areas with a substrate holder; projecting the pattern of the original onto an area of the substrate in a reduced scale using a projection system having at least three reflection surface mirrors, wherein at least one of the mirrors has an aspherical reflection surface; and moving the substrate holder to sequentially transfer the pattern onto the areas of the substrate.
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Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-10-06 | 1996-04-06 | 1996-10-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-10-06 | 2000-04-06 | 2000-10-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-10-06 | 2004-04-06 | 2004-10-06 | $7700.00 | Window Closed / Lapsed |