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US5151133A
Expired / Lapsed
US
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Vapor deposition apparatus
Assignee: Toshiba Corp
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Filing: 1991-01-09
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Granted: 1992-09-29
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Expires: 2011-01-09
Abstract
Abstract A vapor deposition apparatus for forming thin films on substrates with reactive gases, by rotating and revolving the substrates while heating the substrates in a reactor vessel, comprises a hollow susceptor carrier rotatably disposed inside the reactor vessel, susceptors rotatably disposed on the susceptor carrier to hold the substrates respectively, a driving motor for rotating the susceptor carrier such that the substrates held by the susceptors are revolved with respect to the reactor vessel, and a converting mechanism for converting a rotation motion of the susceptor carrier rotated by the driving motor into a motion for rotating the susceptors together with the substrates around themselves. The converting mechanism is disposed within the hollow of the susceptor carrier.
Inventors
- 👤 Toshimitsu Ohmine
- 👤 Keiichi Akagawa
- 👤 Akira Ishihata
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 20:45
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/458; C23C16/4582; C23C16/4587; C23C16/4588
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
99 words
A chemical vapor deposition apparatus for forming thin films on substrates with reactive gases by rotating and revolving the substrates while heating the substrates in a reactor vessel, comprising: (a) a hollow susceptor carrier rotatably disposed inside the reactor vessel, said hollow susceptor carrier having an opening on a downstream side in relation to the reactive gas flow; (b) susceptors rotatably disposed on said susceptor carrier to hold the substrates respectively; (c) means for rotating said susceptor carrier; and (d) means located within a hollow of said susceptor carrier for rotating said susceptors with respect to said susceptor carrier.
Claim 2
Dependent Claim
99 words
A chemical vapor deposition apparatus for forming thin films on substrates with reactive gases by rotating and revolving the substrates while heating the substrates in a reactor vessel, comprising: (a) a hollow susceptor carrier rotatably disposed inside the reactor vessel, said hollow susceptor carrier having an opening on a downstream side in relation to the reactive gas flow; (b) susceptors rotatably disposed on said susceptor carrier to hold the substrates respectively; (c) means for rotating said susceptor carrier; and (d) means located within a hollow of said susceptor carrier for rotating said susceptors with respect to said susceptor carrier.
Claim 3
Dependent Claim
76 words
The chemical vapor deposition apparatus as claimed in claim 1, wherein said susceptor carrier rotating means comprises driving means for rotating said susceptor carrier such that said substrates held by said susceptors are revolved with respect to the reactor vessel, and said susceptor rotating means comprises a converting mechanism for converting a rotating motion of said susceptor carrier rotated by said driving means into a motion for rotating said susceptors together with the substrates around themselves.
Claim 4
Dependent Claim
28 words
The chemical vapor deposition apparatus as claimed in claim 2, wherein the converting mechanism of said susceptor rotating means is received within said hollow of said susceptor carrier.
Claim 5
Dependent Claim
24 words
The chemical vapor deposition apparatus as claimed in claim 1, wherein said susceptor rotating means is disposed within the hollow of said susceptor carrier.
Claim 6
Dependent Claim
24 words
The chemical vapor deposition apparatus as claimed in claim 1, wherein said susceptors are rotatable with respect to said susceptor carrier through slide bearings.
Claim 7
Dependent Claim
44 words
The chemical vapor deposition apparatus as claimed in claim 4, wherein said susceptor carrier is arranged such that the front surfaces of the substrates held by said susceptors are substantially in parallel with the direction of the reactive gas flow in the reactor vessel.
Claim 8
Dependent Claim
40 words
The chemical vapor deposition apparatus as claimed in claim 4, wherein said susceptor carrier is arranged such that the front surfaces of the substrates held by said susceptors are substantially in parallel with an inner wall of the reactor vessel.
Claim 9
Dependent Claim
24 words
The chemical vapor deposition apparatus as claimed in claim 2, wherein said driving means of said susceptor carrier rotating means comprises a driving motor.
Claim 10
Dependent Claim
32 words
The chemical vapor deposition apparatus as claimed in claim 1, further comprising electric insulating members disposed between said susceptor carrier and said susceptors to contact with said susceptor carrier and said susceptors.
Claim 11
Dependent Claim
20 words
The chemical vapor deposition apparatus as claimed in claim 9, further comprising a high-frequency heater for heating said susceptor carrier.
Claim 12
Dependent Claim
19 words
The chemical vapor deposition apparatus as claimed in claim 10, wherein said insulating members are made of boron nitride.
Claim 13
Dependent Claim
106 words
A chemical vapor deposition apparatus comprising: a reactor vessel for receiving a reactive gas in order to form a stream of said reactive gas therein; a substrate holder located in said stream for supporting a substrate to be coated in a side of said holder which is located along and exposed to said stream; a mechanism provided in an opposite side of said substrate holder located apart from said stream in order to revolve said substrate; and an energy source for activating said reactive gas in order to carry out deposition on said substrate, wherein said opposite side is opened to the downstream of said stream.
Claim 14
Dependent Claim
106 words
A chemical vapor deposition apparatus comprising: a reactor vessel for receiving a reactive gas in order to form a stream of said reactive gas therein; a substrate holder located in said stream for supporting a substrate to be coated in a side of said holder which is located along and exposed to said stream; a mechanism provided in an opposite side of said substrate holder located apart from said stream in order to revolve said substrate; and an energy source for activating said reactive gas in order to carry out deposition on said substrate, wherein said opposite side is opened to the downstream of said stream.
Claim 15
Dependent Claim
17 words
The apparatus of claim 13 wherein said substrate holder is a hollow pyramid opened to the downstream.
Claim 16
Dependent Claim
17 words
The apparatus of claim 13 wherein said stream is formed between said hollow pyramid and said vessel.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-09-29 | 1996-03-30 | 1996-09-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-09-29 | 2000-03-30 | 2000-09-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-09-29 | 2004-03-30 | 2004-09-29 | $7700.00 | Window Closed / Lapsed |