Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
73 words
An apparatus for cleaning semi-conductor wafers and the like, comprising: a tank for wafer-cleaning liquid and a wafer to be cleaned; a dump valve in the lower portion of the tank for quickly dumping liquid from the tank, said dump valve including a movable valve member; and a device for generating sonic energy positioned to agitate liquid in the tank to clean said wafer, said device being mounted to move with said member.
Claim 2
Independent Claim
73 words
An apparatus for cleaning semi-conductor wafers and the like, comprising: a tank for wafer-cleaning liquid and a wafer to be cleaned; a dump valve in the lower portion of the tank for quickly dumping liquid from the tank, said dump valve including a movable valve member; and a device for generating sonic energy positioned to agitate liquid in the tank to clean said wafer, said device being mounted to move with said member.
Claim 3
Dependent Claim
19 words
The apparatus of claim 1, wherein said member forms a substantial portion of the bottom wall of said tank.
Claim 4
Dependent Claim
31 words
The apparatus of claim 1, including an actuator supporting said member and said device to move the member with said device into open or closed positions with respect to said tank.
Claim 5
Independent Claim
173 words
An apparatus for cleaning semi-conductor wafers and the like, comprising: a tank for wafer-cleaning liquid and a wafer to be cleaned; a dump valve in the lower portion of the tank for quickly dumping liquid from the tank; and a device for generating megasonic energy positioned to agitate liquid in the tank to clean said wafer; said tank having a bottom wall which forms a moveable valve member of said dump valve, and said device including a megasonic energy transducer vibrationally coupled to a megasonic energy transmitter which has a surface exposed to the interior of said tank; said container being sized to receive a cassette carrying a plurality of wafers arranged in spaced parallel relation and with the wafers extending generally vertically with respect to the bottom wall above said transmitter, said cassette being positioned to straddle the dump valve and said device, said transmitter extending beneath the area in which said cassette is to be positioned, whereby megasonic energy is transmitted across both faces of each water positioned in the cassette.
Claim 6
Independent Claim
173 words
An apparatus for cleaning semi-conductor wafers and the like, comprising: a tank for wafer-cleaning liquid and a wafer to be cleaned; a dump valve in the lower portion of the tank for quickly dumping liquid from the tank; and a device for generating megasonic energy positioned to agitate liquid in the tank to clean said wafer; said tank having a bottom wall which forms a moveable valve member of said dump valve, and said device including a megasonic energy transducer vibrationally coupled to a megasonic energy transmitter which has a surface exposed to the interior of said tank; said container being sized to receive a cassette carrying a plurality of wafers arranged in spaced parallel relation and with the wafers extending generally vertically with respect to the bottom wall above said transmitter, said cassette being positioned to straddle the dump valve and said device, said transmitter extending beneath the area in which said cassette is to be positioned, whereby megasonic energy is transmitted across both faces of each water positioned in the cassette.
Claim 7
Dependent Claim
38 words
The apparatus of claim 4, wherein said transmitter has a convex surface facing the interior of said tank to transmit said megasonic energy in a diverging pattern that subtends substantially the entire diameter of each of said wafers.
Claim 8
Independent Claim
199 words
An apparatus for cleaning semi-conductor wafers and the like, comprising: a tank for wafer-cleaning liquid and a wafer to be cleaned; a dump valve in the lower portion of the tank for quickly dumping liquid from the tank; and a device for generating megasonic energy positioned to agitate liquid in the tank to clean said wafer; said device including a tube extending from one side of said tank to an opposite side of said tank with the tube being joined to said tank sides such that the tube defines a tubular space that is in open communication with the exterior of the tank, while the exterior of the tube is exposed to the liquid in the tank, said device including a transducer bonded to the interior of said tube to transmit energy through a wall portion of said tube into the liquid within the tube, said tube being located in the lower portion of said tank and the above said dump valve so that one or more wafers may be positioned above said tube to be cleaned by liquid agitated by said megasonic energy, and the liquid may be quickly dumped from the tank by way of said valve.
Claim 9
Independent Claim
199 words
An apparatus for cleaning semi-conductor wafers and the like, comprising: a tank for wafer-cleaning liquid and a wafer to be cleaned; a dump valve in the lower portion of the tank for quickly dumping liquid from the tank; and a device for generating megasonic energy positioned to agitate liquid in the tank to clean said wafer; said device including a tube extending from one side of said tank to an opposite side of said tank with the tube being joined to said tank sides such that the tube defines a tubular space that is in open communication with the exterior of the tank, while the exterior of the tube is exposed to the liquid in the tank, said device including a transducer bonded to the interior of said tube to transmit energy through a wall portion of said tube into the liquid within the tube, said tube being located in the lower portion of said tank and the above said dump valve so that one or more wafers may be positioned above said tube to be cleaned by liquid agitated by said megasonic energy, and the liquid may be quickly dumped from the tank by way of said valve.