Fabrication process of semiconductor pressure sensor for sensing pressure applied

Claim 2

A process for the fabrication of a semiconductor pressure sensor, which process comprises: i) forming a first recess having a first width and a second recess having a second width which is wider than the first width, in a first surface of a semiconductor substrate having the first surface and a second surface; ii) deepening the first recess so as to be deeper than the depth of the second recess, the depth of said first recess being determined by the first width; iii) forming a reinforcement layer for the semiconductor substrate on the first surface in which the first and second recesses are contained; iv) polishing the second surface until a part of the first recess appears on a side of the second surface; and v) forming a resistance element on a polished surface at a region opposing the second recess.

Claim 3

The process of claim 1, wherein the first recess is formed only in a (111) plane.

Claim 4

A process for the fabrication of a semiconductor pressure sensor, which process comprises the following steps: i) selectively removing a first insulating film formed on a semiconductor substrate; ii) forming a first recess and a second recess in the semiconductor substrate while using the remaining first insulating film as a mask; iii) forming a second insulating film over the substrate and removing the second insulating film in a bottom part of the first recess; iv) forming the first recess into a V-shaped cross-sectional shape while using the remaining second insulating film as a mask, whereby the first recess becomes deeper than the second recess; v) forming a third insulating film over the substrate and further a polysilicon layer on the third insulating film; vi) polishing a back side of the substrate, over which the polysilicon layer has been formed, until a part of the first recess is substantially exposed; vii) forming a fourth insulating film on the polished back side and, while using the part of the first recess as an alignment mark, selectively removing the fourth insulating film; viii) forming a diffused layer while using the remaining fourth insulating film as a mask; ix) forming a contact hole above the diffused layer, forming a conductive interconnection leading to the contact hole, and forming a passivation film on the conductive interconnection; and x) removing the polysilicon layer until the polysilicon inside the second recess is eliminated.

Claim 5

A process for the fabrication of a semiconductor pressure sensor, which process comprises the following steps: i) selectively removing a first insulating film formed on a semiconductor substrate; ii) forming a first recess and a second recess in the semiconductor substrate while using the remaining first insulating film as a mask; iii) forming a second insulating film over the substrate and removing the second insulating film in a bottom part of the first recess; iv) forming the first recess into a V-shaped cross-sectional shape while using the remaining second insulating film as a mask, whereby the first recess becomes deeper than the second recess; v) forming a third insulating film over the substrate and further a polysilicon layer on the third insulating film; vi) polishing a back side of the substrate, over which the polysilicon layer has been formed, until a part of the first recess is substantially exposed; vii) forming a fourth insulating film on the polished back side and, while using the part of the first recess as an alignment mark, selectively removing the fourth insulating film; viii) forming a diffused layer while using the remaining fourth insulating film as a mask; ix) forming a contact hole above the diffused layer, forming a conductive interconnection leading to the contact hole, and forming a passivation film on the conductive interconnection; and x) removing the polysilicon layer until the polysilicon inside the second recess is eliminated.

Claim 6

The process of claim 3, wherein the first recess is formed at a grid line region of the semiconductor substrate.

Claim 7

The process of claim 3, wherein the diffused layer is formed for the formation of a piezo resistance element.

Claim 8

A process for the fabrication of a semiconductor pressure sensor, which process comprises the following steps: i) forming a first insulating film on a surface of a semiconductor substrate and selectively removing the first insulating film; ii) forming a first recess and a second recess in the semiconductor substrate while using the remaining first insulating film as a mask; iii) forming a second insulating film over the substrate in which the first and second recesses are contained; iv) selectively etching the second insulating film so that the second insulating film in the whole second recess and on a side wall of the first recess is allowed to remain; v) forming the first recess into a V-shaped cross-sectional shape while using the remaining second insulating film as a mask, whereby the first recess becomes deeper than the second recess; vi) forming a third insulating film on the substrate and further a polysilicon layer on the entire surface of the third insulating film; vii) polishing a back surface of the semiconductor substrate until a part of the first recess is exposed; viii) forming a fourth insulating film on the thuspolished surface, selectively removing the fourth insulating film while using the thus-exposed part of the first recess as an alignment mark, and forming a diffused layer while using the remaining fourth insulating film as a mask; ix) forming a contact hole above the diffused layer, forming a conductive interconnection leading to the contact hole, and forming a passivation film on the conductive interconnection; and x) removing the polysilicon layer until the polysilicon inside the second recess is eliminated; and

Claim 9

A process for the fabrication of a semiconductor pressure sensor, which process comprises the following steps: i) forming a first insulating film on a surface of a semiconductor substrate and selectively removing the first insulating film; ii) forming a first recess and a second recess in the semiconductor substrate while using the remaining first insulating film as a mask; iii) forming a second insulating film over the substrate in which the first and second recesses are contained; iv) selectively etching the second insulating film so that the second insulating film in the whole second recess and on a side wall of the first recess is allowed to remain; v) forming the first recess into a V-shaped cross-sectional shape while using the remaining second insulating film as a mask, whereby the first recess becomes deeper than the second recess; vi) forming a third insulating film on the substrate and further a polysilicon layer on the entire surface of the third insulating film; vii) polishing a back surface of the semiconductor substrate until a part of the first recess is exposed; viii) forming a fourth insulating film on the thuspolished surface, selectively removing the fourth insulating film while using the thus-exposed part of the first recess as an alignment mark, and forming a diffused layer while using the remaining fourth insulating film as a mask; ix) forming a contact hole above the diffused layer, forming a conductive interconnection leading to the contact hole, and forming a passivation film on the conductive interconnection; and x) removing the polysilicon layer until the polysilicon inside the second recess is eliminated; and

Claim 10

The process of claim 6, wherein the first recess is formed at a grid line region of the semiconductor substrate.

Claim 11

The process of claim 6, wherein the diffused layer is formed for the formation of a piezo resistance element.

Claim 12

A process for the fabrication of a semiconductor device having a semiconductor pressure sensor, which comprises the following steps: i) selectively removing a first insulating film formed on a surface of a semiconductor substrate, and forming in the substrate a first recess for the formation of an alignment mark and a second recess for the formation of a diaphragm while using the remaining first insulating film as a mask; ii) forming a second insulating film over the substrate in which the first and second recesses are contained, selectively removing the second insulating film in a bottom part of the first recess becomes deeper than the second first recess into a V-shaped cross-sectional shape, whereby the first recess becomes deeper than the second recess; iii) forming a third insulating film over the substrate and further a polysilicon layer on the third insulating layer; iv) polishing a back surface of the substrate, on which the polysilicon layer has been formed, until a part of the first recess is exposed; v) forming a fourth insulating layer on the thuspolished surface, selectively removing the fourth insulating film while using the thus-exposed part of the first recess as an alignment mark, forming a diffused layer while using the remaining fourth insulating film as a mask, removing the remaining fourth insulating film, forming an epitaxial layer, and forming an element in the epitaxial layer; vi) removing the polysilicon layer until the polysilicon inside the second recess is eliminated; and vii) etching the bottom part of the second recess while using, as a mask, the third insulating film located inside the second recess.

Claim 13

A process for the fabrication of a semiconductor device having a semiconductor pressure sensor, which comprises the following steps: i) selectively removing a first insulating film formed on a surface of a semiconductor substrate, and forming in the substrate a first recess for the formation of an alignment mark and a second recess for the formation of a diaphragm while using the remaining first insulating film as a mask; ii) forming a second insulating film over the substrate in which the first and second recesses are contained, selectively removing the second insulating film in a bottom part of the first recess becomes deeper than the second first recess into a V-shaped cross-sectional shape, whereby the first recess becomes deeper than the second recess; iii) forming a third insulating film over the substrate and further a polysilicon layer on the third insulating layer; iv) polishing a back surface of the substrate, on which the polysilicon layer has been formed, until a part of the first recess is exposed; v) forming a fourth insulating layer on the thuspolished surface, selectively removing the fourth insulating film while using the thus-exposed part of the first recess as an alignment mark, forming a diffused layer while using the remaining fourth insulating film as a mask, removing the remaining fourth insulating film, forming an epitaxial layer, and forming an element in the epitaxial layer; vi) removing the polysilicon layer until the polysilicon inside the second recess is eliminated; and vii) etching the bottom part of the second recess while using, as a mask, the third insulating film located inside the second recess.

Claim 14

The process of claim 9, wherein the first recess is formed at a grid line of the semiconductor substrate.

Claim 15

A process for the fabrication of a semiconductor pressure sensor, which comprises the following steps: i) preparing a semiconductor substrate having a first surface and a second surface opposite to the first surface; ii) forming first, second and third recesses, respectively, in first, second and third regions in the first surface of the semiconductor substrate, the first region being located intermediate between the second and the third regions; iii) forming a reinforcement layer for the semiconductor substrate on the first surface so as to cover the first, second and third recesses; iv) polishing the second surface so as to form a polished surface until a part of the second and third recesses are substantially exposed thereto; and v) forming a resistance element on the polished surface in a fourth region opposite to the first region.

Claim 16

A process for the fabrication of a semiconductor pressure sensor, which comprises the following steps: i) preparing a semiconductor substrate having a first surface and a second surface opposite to the first surface; ii) forming first, second and third recesses, respectively, in first, second and third regions in the first surface of the semiconductor substrate, the first region being located intermediate between the second and the third regions; iii) forming a reinforcement layer for the semiconductor substrate on the first surface so as to cover the first, second and third recesses; iv) polishing the second surface so as to form a polished surface until a part of the second and third recesses are substantially exposed thereto; and v) forming a resistance element on the polished surface in a fourth region opposite to the first region.

Claim 17

The process of claim 11, wherein the reinforcement layer is formed with polysilicon.

Claim 18

The process of claim 11, wherein the resistance element is a piezo resistance element.

Claim 19

The process of claim 11, wherein the second and third recesses are formed at a grid line region of the semiconductor substrate.

Claim 20

A process for the fabrication of a semiconductor pressure sensore, which comprises the following steps: (i) preparing a semiconductor substrate having a first surface and a second surface opposite to the first surface; ii) forming first, second and third recesses, respecitively, in first, second and third regions in the first surface of the semiconductor substrate, the first region being located intermediate between the second and the third regions; iii) forming a protective film on the first surface so as to cover the first, second and thrid recesses; iv) removing the protective film formed on at least a (100) plane in the second and third recesses; v) deepening the second and third recesses only in a (111) plane so that the second and third recesses become deeper than the first recess; vi) forming a reinforcement layer for the semiconductor substrate on the first surface so as to cover the first, second and third recesses; vii) polishing the second surface so as to form a polished surface until a part of the second and third recesses are substantially exposed thereto; and viii) forming a resistance element on the polished surface in a fourth region opposite to the first region.

Claim 21

A process for the fabrication of a semiconductor pressure sensore, which comprises the following steps: (i) preparing a semiconductor substrate having a first surface and a second surface opposite to the first surface; ii) forming first, second and third recesses, respecitively, in first, second and third regions in the first surface of the semiconductor substrate, the first region being located intermediate between the second and the third regions; iii) forming a protective film on the first surface so as to cover the first, second and thrid recesses; iv) removing the protective film formed on at least a (100) plane in the second and third recesses; v) deepening the second and third recesses only in a (111) plane so that the second and third recesses become deeper than the first recess; vi) forming a reinforcement layer for the semiconductor substrate on the first surface so as to cover the first, second and third recesses; vii) polishing the second surface so as to form a polished surface until a part of the second and third recesses are substantially exposed thereto; and viii) forming a resistance element on the polished surface in a fourth region opposite to the first region.

Claim 22

The process of claim 15, wherein the reinforcement layer is formed with polysilicon.

Claim 23

The process of claim 15, wherin the resistance elemtn is a piezo resistance element.

Claim 24

The process of claim 15, wherein the second and third recesses are formed at a grid line region of the semiconductor substrate.

Claim 25

A process for the fabrication of a semiconductor pressure sensor, which process comprises: i) preparing a semiconductor substrate having a first surface and a second surface opposite to the first surface; ii) forming first, second and third recesses, respecitively, in first, second and third regions in the first surface of the semiconductor substrate, the first region being located intermediate between the second and the third regions, the depth of the second recess being substantially equal to that of the third recess and deeper than that of the first recess; iii) forming a reinforcement layer for the semiconductor substrate on the first surface so as to cover the first, second and third recesses; iv) polishing the second surface so as to form a polished surface until a part of the second and third recesses are substantially exposed thereto; and v) forming a resistance element on the polished surface in a fourth region opposite to the first region.

Claim 26

A process for the fabrication of a semiconductor pressure sensor, which process comprises: i) preparing a semiconductor substrate having a first surface and a second surface opposite to the first surface; ii) forming first, second and third recesses, respecitively, in first, second and third regions in the first surface of the semiconductor substrate, the first region being located intermediate between the second and the third regions, the depth of the second recess being substantially equal to that of the third recess and deeper than that of the first recess; iii) forming a reinforcement layer for the semiconductor substrate on the first surface so as to cover the first, second and third recesses; iv) polishing the second surface so as to form a polished surface until a part of the second and third recesses are substantially exposed thereto; and v) forming a resistance element on the polished surface in a fourth region opposite to the first region.

Claim 27

The process of claim 19, wherein the reinforcement layer is formed with polysilicon.

Claim 28

The process of claim 19, wherein the resistance element is a piezo resistance element.

Claim 29

The process of claim 19, wherin the second and third recesses are formed at a grid line region of the semiconductor substrate.