US5141836A
Expired / Lapsed
US
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Method of forming a photoconductive member with silicon, hydrogen and/or halogen and carbon
Assignee: Canon Inc
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Filing: 1991-07-29
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Granted: 1992-08-25
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Expires: 2011-07-29
Abstract
Abstract A photoconductive member, comprises a support for a photoconductive member and an amorphous layer which is constituted of silicon atoms as matrix containing at least one of hydrogen atom and halogen atom and exhibits photoconductivity, said amorphous layer having a layer region containing carbon atoms in at least a part thereof, the content of the carbon atoms in said layer region being distributed unevenly in the direction of the thickness of said layer.
Inventors
- 👤 Shigeru Shirai
- 👤 Junichiro Kanbe
- 👤 Tadaji Fukuda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 08:39
CPC Classifications
H; H10; H10F; H10F71/00; H10F71/10; H10F71/103; H10F71/1035; G; G03; G03G; G03G5/00; G03G5/02; G03G5/04; G03G5/08; G03G5/082; G03G5/08214; G03G5/08221; G03G5/08228; H10F30/00; H10F30/10; H10F30/15; Y; Y02; Y02E; Y02E10/00; Y02E10/50
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
270 words
A process for preparing an electrophotographic image-forming member comprising a support for electrophotography and a layer on the surface of said support comprising an amorphous material containing at least silicon atoms as a matrix, hydrogen and/or halogen and carbon atoms which comprises: (a) subjecting a support suitable for electrophotography to a reduced pressure in an evacuable glow discharge deposition system; (b) introducing, in a gaseous state, a starting material for supplying silicon atoms and a starting material for supplying carbon atoms and hydrogen and/or halogen into said system through gas-supplying lines connecting with mass flow controllers; (c) causing an electrical discharge in said system; and (d) varying the gas flow ratio of said starting material for supplying silicon atoms, said hydrogen and/or halogen, and said starting material for supplying carbon atoms by controlling said mass flow controllers, so as to form a layer comprising an amorphous material containing at least silicon atoms as a matrix, hydrogen and/or halogen and containing in at least a portion thereof a layer region containing carbon atoms in an amount from 0.005 to 30 atomic percent with a maximum carbon atom concentration C max in a plane parallel to said support surface of from 0.03 to 90 atomic percent, such that the carbon atom concentration in the layer region is abruptly increased in at least one of the end portions of the layer region to selectively provide enhanced photosensitization and stable image characteristics or barrier characteristics, wherein the content of the carbon atoms is distributed unevenly in the direction of the thickness of said layer, and the thickness of said layer is 3μ to 100μ.
Claim 2
Dependent Claim
270 words
A process for preparing an electrophotographic image-forming member comprising a support for electrophotography and a layer on the surface of said support comprising an amorphous material containing at least silicon atoms as a matrix, hydrogen and/or halogen and carbon atoms which comprises: (a) subjecting a support suitable for electrophotography to a reduced pressure in an evacuable glow discharge deposition system; (b) introducing, in a gaseous state, a starting material for supplying silicon atoms and a starting material for supplying carbon atoms and hydrogen and/or halogen into said system through gas-supplying lines connecting with mass flow controllers; (c) causing an electrical discharge in said system; and (d) varying the gas flow ratio of said starting material for supplying silicon atoms, said hydrogen and/or halogen, and said starting material for supplying carbon atoms by controlling said mass flow controllers, so as to form a layer comprising an amorphous material containing at least silicon atoms as a matrix, hydrogen and/or halogen and containing in at least a portion thereof a layer region containing carbon atoms in an amount from 0.005 to 30 atomic percent with a maximum carbon atom concentration C max in a plane parallel to said support surface of from 0.03 to 90 atomic percent, such that the carbon atom concentration in the layer region is abruptly increased in at least one of the end portions of the layer region to selectively provide enhanced photosensitization and stable image characteristics or barrier characteristics, wherein the content of the carbon atoms is distributed unevenly in the direction of the thickness of said layer, and the thickness of said layer is 3μ to 100μ.
Claim 3
Dependent Claim
57 words
The process according to claim 1 wherein said starting material for supplying silicon atoms contains at least one member selected from the group consisting of SiH 4 , Si 2 H 6 , Si 3 H 8 , Si 4 H 10 , SiF 4 , Si 2 F 6 , SiCl 4 and SiBr 4 .
Claim 4
Dependent Claim
17 words
The process according to claim 1 wherein said starting material for supplying silicon atoms is silicon hydride.
Claim 5
Dependent Claim
18 words
The process according to claim 1 wherein said starting material for supplying silicon atoms is a silicon halide.
Claim 6
Dependent Claim
40 words
The process according to claim 1 wherein said starting material for supplying carbon atoms contains at least one member selected from the group consisting of saturated hydrocarbons, ethylenic hydrocarbons, acetylenic hydrocarbons, alkyl silanes, halogen-containing alkyl silanes, and halogen-substituted paraffinic hydrocarbons.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-08-25 | 1996-02-24 | 1996-08-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-08-25 | 2000-02-24 | 2000-08-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-08-25 | 2004-02-24 | 2004-08-25 | $7700.00 | Window Closed / Lapsed |