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US5136364A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor die sealing

Assignee: National Semiconductor Corp
•
Filing: 1991-06-12
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Granted: 1992-08-04
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Expires: 2011-06-12
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Abstract

Abstract Integrated circuit bonding pads are sealed by a surface passivation coating. The bonding pads are first edge-sealed by means of a first applied passivation coating that overlaps the edges of the bonding pad while leaving the central area uncoated. Then, a sequence of metal layers applied to overlap the open central area of the bonding pad. The layer sequence includes an optional first adherence layer such as aluminum, a barrier metal layer such as titanium-tungsten alloy, and an outer noble metal layer such as gold. Then, a second passivation layer is applied so as to overlap and seal the edges of the sequence of metal layers so as to leave only the central portion of the noble metal layer exposed. Electrical contact to the IC is then made to the exposed noble metal in the conventional manner. With respect to the passivating coatings, either or both can be silicon dioxide overcoated with silicon nitride. Furthermore, the second passivating coating can include either low melting glass that is spun-on using a powdered-glass slurry or it can be an organic, such as a polyimide monomer, spun-on in liquid form.

Inventors

  • 👤 Robert C. Byrne

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 10:06
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/40; H10W20/45; H10W20/48; H10W72/00; H10W72/20; H10W72/29; H10W72/90; H10W72/921; H10W72/923; H10W72/941; H10W72/9415; H10W74/00; H10W74/10; H10W74/131; H10W74/147

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 164 words
A die sealing bonding pad structure for use as an integrated circuit bonding pad that includes a noble metal bonding face and sealed edges that are protected from adverse environments, said bonding pad structure comprising: an aluminum bonding pad located on a semiconductor integrated circuit; a first passivation layer overlapping the edges of said aluminum bonding pad whereby the central region is not covered by said first passivation layer; a sequence of conductive layers overlying said aluminum bonding pad and having edges that overlap said first passivation layer, said sequence comprising at least a barrier metal layer and a noble metal outer layer, said barrier layer operating to metallurgically isolate said noble metal from said aluminum; and a second passivation layer overlapping the edges of said sequence of conductive layers whereby the central region of said noble metal outer layer is exposed for making electrical contact to said integrated circuit and said second passivation layer seals the edges of said sequence of conductive layers.
Claim 2
Dependent Claim 164 words
A die sealing bonding pad structure for use as an integrated circuit bonding pad that includes a noble metal bonding face and sealed edges that are protected from adverse environments, said bonding pad structure comprising: an aluminum bonding pad located on a semiconductor integrated circuit; a first passivation layer overlapping the edges of said aluminum bonding pad whereby the central region is not covered by said first passivation layer; a sequence of conductive layers overlying said aluminum bonding pad and having edges that overlap said first passivation layer, said sequence comprising at least a barrier metal layer and a noble metal outer layer, said barrier layer operating to metallurgically isolate said noble metal from said aluminum; and a second passivation layer overlapping the edges of said sequence of conductive layers whereby the central region of said noble metal outer layer is exposed for making electrical contact to said integrated circuit and said second passivation layer seals the edges of said sequence of conductive layers.
Claim 3
Dependent Claim 22 words
The die sealing bonding pad of claim 1 wherein said noble metal is selected from the group consisting of gold and platinum.
Claim 4
Dependent Claim 27 words
The die sealing bonding pad of claim 1 wherein said barrier metal is selected from the group consisting of titanium-tungsten alloys, nickel-vanadium alloys, chromium and chromium-nickel alloys.
Claim 5
Dependent Claim 29 words
The die sealing bonding pad of claim 1 wherein said sequence of conductors further includes an adhesion metal layer between said aluminum bonding pad and said barrier metal layer.
Claim 6
Dependent Claim 14 words
The die sealing bonding pad of claim 4 wherein said adhesion layer comprises aluminum.
Claim 7
Dependent Claim 24 words
The die sealing bonding pad of claim 1 wherein said first and second passivation layers comprise at least a first layer of silicon dioxide.
Claim 8
Dependent Claim 21 words
The die sealing bonding pad of claim 6 further comprising a layer of silicon nitride on top of said silicon dioxide.
Claim 9
Dependent Claim 31 words
The die sealing bonding pad of claim 6 wherein said second passivation layer comprises a relatively thick layer of either low melting glass or insulating organic material overcoated with silicon nitride.

References Cited (Backward Citations)

JPS6035525A Cited
JPS62242333A Cited
US4827326A Cited
US4927505A Cited
JPH02113533A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-08-04 1996-02-03 1996-08-04 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-08-04 2000-02-03 2000-08-04 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-08-04 2004-02-03 2004-08-04 $7700.00 Window Closed / Lapsed

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