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US5126830A Expired / Lapsed US ⏱️ 0.0 years remaining

Cryogenic semiconductor power devices

Assignee: General Electric Co
•
Filing: 1989-10-31
•
Granted: 1992-06-30
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Expires: 2009-10-31
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Abstract

Abstract A cryogenic solid-state semiconductor power device, has the actual device chip mounted on a substrate of a material of very high thermal conductivity, which is positioned in a a bath of cryogenic fluid. The substrate may be formed of beryllia, beryllium, alumina, aluminum nitride, diamond and the like materials.

Inventors

  • 👤 Otward M. Mueller
  • 👤 Lowell S. Smith

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 20:39
CPC Classifications
H; H10; H10W; H10W40/00; H10W40/30; H10W40/305

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 181 words
A device for use in a cryogenic environment, comprising: a semiconductor power device chip; a substrate having a surface on which said chip is mounted, said substrate being substantially surrounded by a mass of cryogenic fluid; said substrate consisting of an electrically but thermally conductive material having greater thermal conductivity at cryogenic temperatures than at room temperature; said substrate having a thickness selected for optimum dissipation, at cryogenic temperatures, of chip-generated heat, said last-recited thickness being greater than the substrate thickness selected for optimum heat dissipation for device operation at room temperature; said substrate further comprising a recess in said surface for holding said semiconductor power device chip and means for providing a protective covering for said chip; a structural member disposed within said mass of cryogenic fluid substantially parallel to said substrate; and means for increasing the heat dissipation of said substrate including a base portion connected between said substrate and said structural member for spacing said substrate from said structural member, said base portion being effective to increase the surface area of said substrate exposed to said cryogenic fluid.
Claim 2
Independent Claim 181 words
A device for use in a cryogenic environment, comprising: a semiconductor power device chip; a substrate having a surface on which said chip is mounted, said substrate being substantially surrounded by a mass of cryogenic fluid; said substrate consisting of an electrically but thermally conductive material having greater thermal conductivity at cryogenic temperatures than at room temperature; said substrate having a thickness selected for optimum dissipation, at cryogenic temperatures, of chip-generated heat, said last-recited thickness being greater than the substrate thickness selected for optimum heat dissipation for device operation at room temperature; said substrate further comprising a recess in said surface for holding said semiconductor power device chip and means for providing a protective covering for said chip; a structural member disposed within said mass of cryogenic fluid substantially parallel to said substrate; and means for increasing the heat dissipation of said substrate including a base portion connected between said substrate and said structural member for spacing said substrate from said structural member, said base portion being effective to increase the surface area of said substrate exposed to said cryogenic fluid.
Claim 3
Dependent Claim 29 words
The device of claim 1, wherein said substrate is oriented in said cryogenic mass by said base portion to minimize the collection of barrier vapor adjacent to said surface.
Claim 4
Dependent Claim 17 words
The device of claim 1, wherein said semiconductor power device chip is a static induction transistor (SIT).
Claim 5
Dependent Claim 14 words
The device of claim 3, wherein the SIT is fabricated in a germanium chip.
Claim 6
Dependent Claim 16 words
The device of claim 1, wherein said semiconductor power device chip is a field-effect transistor (FET).
Claim 7
Dependent Claim 13 words
The device of claim 5, wherein said FET is a Metal-Oxide-Semiconductor FET (MOSFET).
Claim 8
Dependent Claim 22 words
The device of claim 1, wherein said substrate material is selected from the group consisting of beryllia, alumina, diamond and aluminum nitride.
Claim 9
Dependent Claim 26 words
The device of claim 1, wherein said semiconductor power device chip is fabricated from a material selected from the group consisting of silicon and gallium arsenide.
Claim 10
Dependent Claim 15 words
The device of claim 1, wherein the cryogenic fluid is liquid nitrogen (LN 2 ).
Claim 11
Independent Claim 156 words
A device for use in a cryogenic environment, comprising: a semiconductor power device chip; a substrate having a surface on which said chip is mounted, said substrate being substantially surrounded by a mass of cryogenic fluid; said substrate consisting of an electrically and thermally conductive material having greater thermal conductivity at cryogenic temperatures than at room temperature; said substrate having a thickness selected for optimum dissipation, at cryogenic temperatures, of chip-generated heat, said last-recited thickness being greater than the substrate thickness selected for optimum heat dissipation for device operation at room temperature; an electrically insulative structural member disposed in said mass of cryogenic fluid substantially parallel to said substrate; means for increasing the heat dissipation of said substrate including a base portion connected between said substrate and said structural member for spacing said substrate from said structural member, said base portion being effective to increase the surface area of said substrate exposed to said cryogenic fluid.
Claim 12
Independent Claim 156 words
A device for use in a cryogenic environment, comprising: a semiconductor power device chip; a substrate having a surface on which said chip is mounted, said substrate being substantially surrounded by a mass of cryogenic fluid; said substrate consisting of an electrically and thermally conductive material having greater thermal conductivity at cryogenic temperatures than at room temperature; said substrate having a thickness selected for optimum dissipation, at cryogenic temperatures, of chip-generated heat, said last-recited thickness being greater than the substrate thickness selected for optimum heat dissipation for device operation at room temperature; an electrically insulative structural member disposed in said mass of cryogenic fluid substantially parallel to said substrate; means for increasing the heat dissipation of said substrate including a base portion connected between said substrate and said structural member for spacing said substrate from said structural member, said base portion being effective to increase the surface area of said substrate exposed to said cryogenic fluid.
Claim 13
Dependent Claim 12 words
The device of claim 10 wherein said base portion is electrically insulative.
Claim 14
Dependent Claim 12 words
The device of claim 10, wherein said substrate consists essentially of beryllium.

References Cited (Backward Citations)

US4608582A Cited
US4472727A Cited
JPS6350046A Cited
US4734820A Cited
JPS63289974A Cited
US4965659A Cited
US4980754A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-06-30 1995-12-30 1996-06-30 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-06-30 1999-12-30 2000-06-30 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-06-30 2003-12-30 2004-06-30 $7700.00 Window Closed / Lapsed

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