Patent DE557710C successfully refreshed from Google Patents.
US5120974A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Position detecting method and device using image pickup of a mark
Assignee: Canon Inc
•
Filing: 1991-07-08
•
Granted: 1992-06-09
•
Expires: 2011-07-08
Abstract
Abstract A position detecting method and device for detecting the position of an object to be examined, through image pickup of a mark formed on the object, is disclosed. The method includes an image forming step for illuminating the mark with a radiation beam in a first direction and a second direction different from the first direction, and for forming a first image of the mark with the illumination in the first direction and forming a second image of the mark with the illumination in the second direction; a determining step for selecting one of the first and second images; and a detecting step for detecting the position of the object on the basis of the selected image or an image of the mark formed with the illumination in the direction corresponding to the selected image. The device is adapted to execute the position detection in this manner.
Inventors
- 👤 Masato Muraki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 13:02
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7065
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
159 words
A method of detecting a position of a substrate by using a grating mark formed on the substrate, said method comprising the steps of: illuminating the grating mark to produce a plurality of diffraction beams; extracting a first diffraction beam and a second diffraction beam from the produced diffraction beam by using a spatial filter; causing the extracted first and second diffraction beams to interfere with each other so as to form an image of the grating mark upon a predetermined plane; illuminating a grating pattern, provided out of a path of the diffraction beams from the grating mark, to produce diffraction light from the grating pattern; causing the produced diffraction light to pass through the spatial filter to form an image of the grating pattern on the predetermined plane; and detecting the position of the substrate on the basis of a difference in phase between the image of the grating mark and the image of the grating pattern;
Claim 2
Independent Claim
159 words
A method of detecting a position of a substrate by using a grating mark formed on the substrate, said method comprising the steps of: illuminating the grating mark to produce a plurality of diffraction beams; extracting a first diffraction beam and a second diffraction beam from the produced diffraction beam by using a spatial filter; causing the extracted first and second diffraction beams to interfere with each other so as to form an image of the grating mark upon a predetermined plane; illuminating a grating pattern, provided out of a path of the diffraction beams from the grating mark, to produce diffraction light from the grating pattern; causing the produced diffraction light to pass through the spatial filter to form an image of the grating pattern on the predetermined plane; and detecting the position of the substrate on the basis of a difference in phase between the image of the grating mark and the image of the grating pattern;
Claim 3
Dependent Claim
28 words
A method according to claim 1, wherein the first and second diffraction beams comprise a positive first order diffraction beam and a negative first order diffraction beam, respectively.
Claim 4
Dependent Claim
23 words
A method according to claim 1, further comprising sequentially forming the image of the grating mark and the image of the grating pattern.
Claim 5
Dependent Claim
185 words
In a semiconductor device manufacturing method wherein a position of a wafer is detected by using a grating mark formed on the wafer and wherein, after positioning the wafer on the basis of the detected position, a circuit pattern is printed on the wafer, the improvement comprising the steps of: illuminating the grating mark to produce a plurality of diffraction beams; extracting a first diffraction beam and a second diffraction beam from the produced diffraction beams by using a spatial filter; causing the extracted first and second diffraction beams to interfere with each other so as to form an image of the grating mark upon a predetermined plane; illuminating a grating pattern, provided out of a path of the diffraction beams from the grating mark, to produce diffraction light from the grating pattern; causing the produced diffraction light to pass through the spatial filter to form an image of the grating pattern on the predetermined plane; and detecting the position of the wafer on the basis of a difference in phase between the image of the grating mark and the image of the grating pattern.
Claim 6
Dependent Claim
185 words
In a semiconductor device manufacturing method wherein a position of a wafer is detected by using a grating mark formed on the wafer and wherein, after positioning the wafer on the basis of the detected position, a circuit pattern is printed on the wafer, the improvement comprising the steps of: illuminating the grating mark to produce a plurality of diffraction beams; extracting a first diffraction beam and a second diffraction beam from the produced diffraction beams by using a spatial filter; causing the extracted first and second diffraction beams to interfere with each other so as to form an image of the grating mark upon a predetermined plane; illuminating a grating pattern, provided out of a path of the diffraction beams from the grating mark, to produce diffraction light from the grating pattern; causing the produced diffraction light to pass through the spatial filter to form an image of the grating pattern on the predetermined plane; and detecting the position of the wafer on the basis of a difference in phase between the image of the grating mark and the image of the grating pattern.
Claim 7
Dependent Claim
28 words
A method according to claim 4, wherein the first and second diffraction beams comprise a positive first order diffraction beam and a negative first order diffraction beam, respectively.
Claim 8
Dependent Claim
23 words
A method according to claim 4, further comprising sequentially forming the image of the grating mark and the image of the grating pattern.
References Cited (Backward Citations)
US4251160A
Cited
US4573791A
Cited
US4355892A
Cited
US4668089A
Cited
US4801208A
Cited
US4669866A
Cited
US4777374A
Cited
US4779001A
Cited
US4814829A
Cited
US4941745A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-06-09 | 1995-12-09 | 1996-06-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-06-09 | 1999-12-09 | 2000-06-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-06-09 | 2003-12-09 | 2004-06-09 | $7700.00 | Window Closed / Lapsed |