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Patent US5116461A successfully refreshed from Google Patents.
US5116461A
Expired / Lapsed
US
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Method for fabricating an angled diffraction grating
Assignee: Motorola Solutions Inc
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Filing: 1991-04-22
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Granted: 1992-05-26
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Expires: 2011-04-22
Abstract
Abstract A method for fabricating an angled diffraction grating (12) is provided. An optical medium (13) with fine lines and spaces that are defined in an etch mask is provided. Transferring the defined lines and spaces of the etch mask into the optical medium (13) at a desirable angle is achieved by an etching means, thereby resulting in an angled diffraction grating (12).
Inventors
- 👤 Michael S. Lebby
- 👤 Michael P. Norman
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 00:16
CPC Classifications
G; G02; G02B; G02B5/00; G02B5/18; G02B5/1847; G02B5/1857
Claims Analysis
Total Claims: 24
Claim 1
Independent Claim
52 words
A method for fabricating an angled diffraction grating comprising: providing an optical medium that is patterned with fine lines and spaces; and etching the fine lines and spaces into the optical medium by an etching means to produce parallel walled angled trenches in the optical medium, thereby producing an angled diffraction grating.
Claim 2
Independent Claim
52 words
A method for fabricating an angled diffraction grating comprising: providing an optical medium that is patterned with fine lines and spaces; and etching the fine lines and spaces into the optical medium by an etching means to produce parallel walled angled trenches in the optical medium, thereby producing an angled diffraction grating.
Claim 3
Dependent Claim
14 words
The method of claim 1 further including using a polymer for the optical medium.
Claim 4
Dependent Claim
15 words
The method of claim 1 further including using a semiconductor substrate for the optical medium.
Claim 5
Dependent Claim
16 words
The method of claim 3 further including using a III-V compound semiconductor for the semiconductor substrate.
Claim 6
Dependent Claim
13 words
The method of claim 3 further including using silicon for the semiconductor substrate.
Claim 7
Dependent Claim
25 words
The method of claim 1 further including patterning the optical medium with lines and spaces that range between 0.02 micron to 1.0 microns in width.
Claim 8
Dependent Claim
21 words
The method of claim 1 further including etching the angled trenches to a depth of between 0.5 micron to 10.0 microns.
Claim 9
Dependent Claim
18 words
The method of claim 7 further including etching the angled trenches to substantially a depth of 1.5 microns.
Claim 10
Dependent Claim
24 words
The method of claim 1 further including etching the angled trenches to an angle between greater than 0 degrees to 80 degrees from normal.
Claim 11
Dependent Claim
17 words
The method of claim 9 further including etching the angled trenches to substantially 30 degrees from normal.
Claim 12
Dependent Claim
20 words
The method of claim 1 further including making the angled trenches with an aspect ratio of between 2 and 30.
Claim 13
Independent Claim
62 words
A method for fabricating a polymer angled diffraction grating comprising: providing an optical medium that is a polymer, with a substrate that is optically transparent; patterning the polymer with fine lines and fine spaces; and etching the polymer, so that the fine lines are etched in the polymer at a desirable angle producing parallel walled angled trenches which form a diffraction gradient.
Claim 14
Independent Claim
62 words
A method for fabricating a polymer angled diffraction grating comprising: providing an optical medium that is a polymer, with a substrate that is optically transparent; patterning the polymer with fine lines and fine spaces; and etching the polymer, so that the fine lines are etched in the polymer at a desirable angle producing parallel walled angled trenches which form a diffraction gradient.
Claim 15
Dependent Claim
15 words
The method of claim 12 further including using gallium arsenide for the optically transparent substrate.
Claim 16
Dependent Claim
16 words
The method of claim 12 wherein the fine line are between 0.02 micron to 1.0 microns.
Claim 17
Dependent Claim
15 words
The method of claim 12 further including etching the angled trenches to substantially 1.5 microns.
Claim 18
Dependent Claim
17 words
The method of claim 12 further including etching the angled trenches to substantially 30 degrees from normal.
Claim 19
Independent Claim
62 words
A method for directing a incident light source from a first angle to a second angle comprising: providing a incident light source with a first angle; having the incident light source strike a parallel walled angled diffraction grating; and defracting the incident light source from the parallel walled angled diffraction grading, thereby directing the the incident light source to a second angle.
Claim 20
Independent Claim
62 words
A method for directing a incident light source from a first angle to a second angle comprising: providing a incident light source with a first angle; having the incident light source strike a parallel walled angled diffraction grating; and defracting the incident light source from the parallel walled angled diffraction grading, thereby directing the the incident light source to a second angle.
Claim 21
Dependent Claim
18 words
The method of claim 17 further including having the incident light source originate from at least one laser.
Claim 22
Dependent Claim
16 words
The method of claim 17 further including having the incident light being directed into a waveguide.
Claim 23
Independent Claim
55 words
A method for making a parallel walled diffraction grating comprising: patterning a surface of an optical medium; exposing the patterned optical medium to at least plasma ions and a directional ion beam; and striking the optical medium with the ion beam, thereby allowing the plasma ions to react with the patterned surface at an angle.
Claim 24
Independent Claim
55 words
A method for making a parallel walled diffraction grating comprising: patterning a surface of an optical medium; exposing the patterned optical medium to at least plasma ions and a directional ion beam; and striking the optical medium with the ion beam, thereby allowing the plasma ions to react with the patterned surface at an angle.
References Cited (Backward Citations)
US4405405A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-05-26 | 1995-11-25 | 1996-05-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-05-26 | 1999-11-25 | 2000-05-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-05-26 | 2003-11-25 | 2004-05-26 | $7700.00 | Window Closed / Lapsed |