US5100476A
Expired / Lapsed
US
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Method and apparatus for cleaning semiconductor devices
Assignee: Toshiba Corp
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Filing: 1990-03-27
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Granted: 1992-03-31
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Expires: 2010-03-27
Abstract
Abstract An apparatus for cleaning semiconductor devices has a mixing section for mixing a chemical solution with pure water. A semiconductor substrate to be cleaned is placed on a support. An ultrasonic generator applies ultrasonic vibrations to the supplied pure water. The mixing section mixes a predetermined chemical solution with the pure water applied with the ultrasonic vibrations and supplies a desired pure water solution onto the semiconductor substrate.
Inventors
- 👤 Yasukazu Mase
- 👤 Osamu Hirata
- 👤 Masahiro Abe
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 23:43
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0406; H10P72/0411; H10P72/0414
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
78 words
An apparatus for cleaning semiconductor devices, comprising: a support upon which the devices can be held; means for flowing a liquid toward said support, including means for introducing a flow of pure water; means for applying ultrasonic vibrations to the pure water from the flowing means; and means for mixing a predetermined chemical with the pure water downstream from the ultrasonic vibrations applying means to produce the liquid and for allowing the liquid to flow toward the support.
Claim 2
Independent Claim
78 words
An apparatus for cleaning semiconductor devices, comprising: a support upon which the devices can be held; means for flowing a liquid toward said support, including means for introducing a flow of pure water; means for applying ultrasonic vibrations to the pure water from the flowing means; and means for mixing a predetermined chemical with the pure water downstream from the ultrasonic vibrations applying means to produce the liquid and for allowing the liquid to flow toward the support.
Claim 3
Dependent Claim
37 words
An apparatus according to claim 1, wherein said ultrasonic vibrations applying means comprises a vibrator, a power source for applying a predetermined voltage to said vibrator, and an ultrasonic vibration chamber in which said vibrator is arranged.
Claim 4
Dependent Claim
13 words
An apparatus according to claim 2, wherein said vibrator comprises a tantalum vibrator.
Claim 5
Dependent Claim
34 words
An apparatus according to claim 2, wherein said vibrator generates frequency vibrations falling within a range of 800 kHz to 2 MHz upon application of a voltage from said power source to said vibrator.
Claim 6
Dependent Claim
33 words
An apparatus according to claim 1, wherein said chemical solution mixing means comprises a chemical solution flow control system including a valve and a chemical solution supply conduit leading toward the flowing means.
Claim 7
Dependent Claim
22 words
An apparatus according to claim 1, wherein the predetermined chemical contains one of an acidic solution and choline in a basic solution.
Claim 8
Dependent Claim
21 words
An apparatus according to claim 6, wherein the predetermined chemical is 1 vol. % or less choline in the basic solution.
Claim 9
Dependent Claim
16 words
An apparatus according to claim 7, wherein a content of the choline is 0.1 vol %.
Claim 10
Dependent Claim
20 words
An apparatus according to claim 6, wherein the predetermined chemical is 1 vol. % or less acid in the solution.
Claim 11
Dependent Claim
48 words
An apparatus according to claim 1, wherein the flowing means, ultrasonic vibrations applying means and mixing means together include a nozzle for guiding the pure water applied with the ultrasonic vibrations toward the support, and the mixing means includes a chemical solution supply conduit fixed to the nozzle.
Claim 12
Dependent Claim
26 words
An apparatus according to claim 10, wherein the nozzle has an outlet and said chemical solution supply conduit is connected to the nozzle near the outlet.
Claim 13
Dependent Claim
22 words
An apparatus according to claim 10, wherein part of said chemical solution supply conduit is fixed to said nozzle by mechanical means.
Claim 14
Dependent Claim
14 words
An apparatus according to claim 12, wherein said mechanical means is a cantilevered arm.
Claim 15
Independent Claim
82 words
A method of cleaning semiconductor devices, comprising the steps of: placing one of the semiconductor devices to be cleaned on a support; flowing a liquid, including flowing pure water, toward the semiconductor device; and applying ultrasonic vibrations to the flowing pure water in a region; the step of flowing a liquid including mixing a predetermined chemical with the flowing pure water down stream from the ultrasonic vibrations application region to produce the liquid and allowing the liquid to flow toward the support.
Claim 16
Independent Claim
82 words
A method of cleaning semiconductor devices, comprising the steps of: placing one of the semiconductor devices to be cleaned on a support; flowing a liquid, including flowing pure water, toward the semiconductor device; and applying ultrasonic vibrations to the flowing pure water in a region; the step of flowing a liquid including mixing a predetermined chemical with the flowing pure water down stream from the ultrasonic vibrations application region to produce the liquid and allowing the liquid to flow toward the support.
Claim 17
Dependent Claim
22 words
A method according to claim 14, wherein the predetermined chemical contains one of an acidic solution and choline in a basic solution.
Claim 18
Dependent Claim
21 words
A method according to claim 15, wherein the predetermined chemical is 1 vol. % or less choline in the basic solution.
Claim 19
Dependent Claim
16 words
A method according to claim 16, wherein a content of the choline is 0.1 vol. %.
Claim 20
Dependent Claim
20 words
A method according to claim 15, wherein the predetermined chemical is 1 vol. % or less acid in the solution.
Claim 21
Dependent Claim
15 words
An apparatus according to claim 9, wherein the content of acid is 0.1 vol. %.
Claim 22
Dependent Claim
15 words
A method according to claim 18, wherein the content of acid is 0.1 vol. %.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-03-31 | 1995-09-30 | 1996-03-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-03-31 | 1999-09-30 | 2000-03-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-03-31 | 2003-09-30 | 2004-03-31 | $7700.00 | Window Closed / Lapsed |