US5095190A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Exposure apparatus
Assignee: Canon Inc
•
Filing: 1990-07-10
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Granted: 1992-03-10
•
Expires: 2010-07-10
Abstract
Abstract A projection exposure apparatus includes an illumination system for illuminating a mask pattern; a projection optical system for projecting the mask pattern being illuminated upon the surface of a wafer so as to expose the same to the mask pattern; a wavelength detecting device effective to detect the wavelength of a light from a light source included in the illumination system; and a control device operable, in accordance with an output signal from the wavelength detecting device, to control at least one of the projection magnification of the projection optical system and the relative position of the wafer with respect to the imaging position of the mask pattern.
Inventors
- 👤 Masato Aketagawa
- 👤 Shinji Utamura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 07:26
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70241; B; B23; B23K; B23K26/00; B23K26/02; B23K26/06; B23K26/064; B23K26/066
Claims Analysis
Total Claims: 31
Claim 1
Independent Claim
118 words
An exposure apparatus, comprising: a laser for supplying light; a stage for holding thereon an original; an illumination system for illuminating the original by use of the light supplied from said laser; detecting means for detecting any shift in the wavelength of the light from said laser; a projection optical system for projecting a pattern of the original upon a workpiece; and adjusting, responsive to detection of a shift in the wavelength of the light detected by said detecting means, for substantially correcting any error in the magnification of the patten projected by said projection optical system resulting from a shfit in wavelength, free from correcting the detected shift in the wavelength of the light from said laser.
Claim 2
Dependent Claim
118 words
An exposure apparatus, comprising: a laser for supplying light; a stage for holding thereon an original; an illumination system for illuminating the original by use of the light supplied from said laser; detecting means for detecting any shift in the wavelength of the light from said laser; a projection optical system for projecting a pattern of the original upon a workpiece; and adjusting, responsive to detection of a shift in the wavelength of the light detected by said detecting means, for substantially correcting any error in the magnification of the patten projected by said projection optical system resulting from a shfit in wavelength, free from correcting the detected shift in the wavelength of the light from said laser.
Claim 3
Dependent Claim
24 words
An apparatus according to claim 1, wherein said adjusting means is operable to adjust an interval between the original and said projection optical system.
Claim 4
Dependent Claim
52 words
An apparatus according to claim 1, further comprising driving means effective to bring the position of the workpiece, with respect to a direction of an optical axis of said projection optical system, into coincidence with an imaging plane of said projection optical system in accordance with the detection by said detecting system.
Claim 5
Dependent Claim
31 words
An apparatus according to claim 3, wherein said driving means includes means for adjusting the position of the workpiece in the direction of the optical axis of said projection optical system.
Claim 6
Dependent Claim
47 words
An apparatus according to claim 3, wherein said laser comprises an excimer laser, wherein said apparatus further comprises means for narrowing the bandwidth of the light supplied from said excimer laser, and wherein said projection optical system is formed by lens elements made of SiO 2 .
Claim 7
Dependent Claim
47 words
An apparatus according to claim 1, wherein said detecting means comprises a wavelength detector and a beam splitter which is disposed with inclination on a path of the light from said laser and which is operable to direct a portion of the light to said wavelength detector.
Claim 8
Independent Claim
104 words
A method of projecting a pattern of a first object upon a second object by use of a projection optical system and a light having a wavelength, said method comprising the steps of: detecting any shift in the wavelength of the light with which the first object is illuminated; and executing projection of the pattern upon the second object while maintaining a substantially constant magnification, related to the projection of the pattern by use of the projection optical system, on the basis of the detected shift in the wavelength of the light free from correcting the detected shift in the wavelength of the light.
Claim 9
Independent Claim
104 words
A method of projecting a pattern of a first object upon a second object by use of a projection optical system and a light having a wavelength, said method comprising the steps of: detecting any shift in the wavelength of the light with which the first object is illuminated; and executing projection of the pattern upon the second object while maintaining a substantially constant magnification, related to the projection of the pattern by use of the projection optical system, on the basis of the detected shift in the wavelength of the light free from correcting the detected shift in the wavelength of the light.
Claim 10
Dependent Claim
146 words
A projection exposure apparatus, comprising: a light source for providing light; a projecting device for projecting with magnification a pattern of an original upon a workpiece by use of the light from said light source, said projecting device comprising a projection optical system for forming an image of the pattern upon the workpiece and stages for holding the original and the workpiece, respectively; an illumination optical system for directing the light from said light source toward said projecting device; a wavelength detector for detecting any shift in the wavelength of the light; and an adjusting device for adjusting said projecting device in response to an output of said wavelength detector, so as to substantially correct for any error in the magnification of said projecting device due to any shift in the wavelength of the light, free from correcting the shift in the wavelength of the light.
Claim 11
Dependent Claim
146 words
A projection exposure apparatus, comprising: a light source for providing light; a projecting device for projecting with magnification a pattern of an original upon a workpiece by use of the light from said light source, said projecting device comprising a projection optical system for forming an image of the pattern upon the workpiece and stages for holding the original and the workpiece, respectively; an illumination optical system for directing the light from said light source toward said projecting device; a wavelength detector for detecting any shift in the wavelength of the light; and an adjusting device for adjusting said projecting device in response to an output of said wavelength detector, so as to substantially correct for any error in the magnification of said projecting device due to any shift in the wavelength of the light, free from correcting the shift in the wavelength of the light.
Claim 12
Dependent Claim
38 words
An apparatus according to claim 2, wherein said adjusting means comprises driving means for moving the original along an optical axis of said projection optical system to change the interval between the original and said projection optical system.
Claim 13
Dependent Claim
55 words
An apparatus according to claim 2, wherein said projection optical system comprises a plurality of lens elements, and wherein said adjusting means comprises driving means for moving a lens element of said projection optical system, which lens element is closest to the original, to change the interval between the original and said projection optical system.
Claim 14
Independent Claim
88 words
A method of projecting a pattern of a first object to a second object by use of a projection optical system and light of a certain wavelength, at a predetermined magnification, said method comprising: determining any shift in the wavelength of the light; and correcting any error in the magnification caused by a shift in the wavelength free from correcting the shift in the wavelength, such that a substantially constant magnification is maintained for the projection of the pattern, both before, and after, any shift in the wavelength.
Claim 15
Independent Claim
88 words
A method of projecting a pattern of a first object to a second object by use of a projection optical system and light of a certain wavelength, at a predetermined magnification, said method comprising: determining any shift in the wavelength of the light; and correcting any error in the magnification caused by a shift in the wavelength free from correcting the shift in the wavelength, such that a substantially constant magnification is maintained for the projection of the pattern, both before, and after, any shift in the wavelength.
Claim 16
Dependent Claim
118 words
A projection exposure apparatus for projecting with a predetermined magnification a pattern of a first object to a second object through a projection optical system with light having a predetermined wavelength, said apparatus comprising: supplying means for supplying the light having the predetermined wavelength; detecting means for detecting a change in the wavelength of the light; and correcting means, responsive to a detection of a change in wavelength of the light by said detecting means, for correcting any error in the magnification caused by the change in wavelength, free from correcting the change in the wavelength, to thereby maintain a substantially constant magnification for the projection of the pattern, both before, and after, the change in the wavelength.
Claim 17
Dependent Claim
118 words
A projection exposure apparatus for projecting with a predetermined magnification a pattern of a first object to a second object through a projection optical system with light having a predetermined wavelength, said apparatus comprising: supplying means for supplying the light having the predetermined wavelength; detecting means for detecting a change in the wavelength of the light; and correcting means, responsive to a detection of a change in wavelength of the light by said detecting means, for correcting any error in the magnification caused by the change in wavelength, free from correcting the change in the wavelength, to thereby maintain a substantially constant magnification for the projection of the pattern, both before, and after, the change in the wavelength.
Claim 18
Dependent Claim
17 words
An apparatus according to claim 12, wherein said supplying means comprises a laser for producing the light.
Claim 19
Dependent Claim
25 words
An apparatus according to claim 13, wherein said correcting means comprises means for changing an interval between the first object and the projection optical system.
Claim 20
Dependent Claim
19 words
An apparatus according to claim 13 wherein said laser comprises an excimer laser for producing a band-narrowed laser beam.
Claim 21
Independent Claim
77 words
A method of projecting with a predetermined magnification a pattern of a first object to a second object through a projection optical system with light having a predetermined wavelength, said method comprising the steps of: detecting a change in the wavelength of the light; and correcting, in response to a detection of the change in the wavelength, any error in the magnification caused by the change in the wavelength, free from correcting the change in the wavelength.
Claim 22
Independent Claim
77 words
A method of projecting with a predetermined magnification a pattern of a first object to a second object through a projection optical system with light having a predetermined wavelength, said method comprising the steps of: detecting a change in the wavelength of the light; and correcting, in response to a detection of the change in the wavelength, any error in the magnification caused by the change in the wavelength, free from correcting the change in the wavelength.
Claim 23
Dependent Claim
23 words
A method according to claim 16, wherein said correcting step comprises changing an interval between the first object and the projection optical system.
Claim 24
Dependent Claim
19 words
An method according to claim 16, further comprising using a laser pulse as the light for the pattern projection.
Claim 25
Dependent Claim
18 words
A method according to claim 18, further comprising providing the laser pulse by a band-narrowed excimer laser beam.
Claim 26
Independent Claim
83 words
A method of manufacturing semiconductor devices by projecting with a predetermined wavelength a circuit pattern of a reticle to a wafer through a projection lens system with a radiation beam having a predetermined wavelength, said method comprising the steps of: detecting a change in the wavelength of the radiation beam; and correcting, in response to a detection of a change in the wavelength, any error in the magnification caused by the change in the wavelength, free from correcting the change in the wavelength.
Claim 27
Independent Claim
83 words
A method of manufacturing semiconductor devices by projecting with a predetermined wavelength a circuit pattern of a reticle to a wafer through a projection lens system with a radiation beam having a predetermined wavelength, said method comprising the steps of: detecting a change in the wavelength of the radiation beam; and correcting, in response to a detection of a change in the wavelength, any error in the magnification caused by the change in the wavelength, free from correcting the change in the wavelength.
Claim 28
Dependent Claim
22 words
A method according ot claim 20, wherein said correcting step comprises changing an interval between the reticle and the projection lens system.
Claim 29
Dependent Claim
20 words
A method according to claim 20, further comprising using a laser pulse as the radiation beam for the pattern projection.
Claim 30
Dependent Claim
18 words
A method according to claim 22, further comprising providing the laser pulse by a band-narrowed excimer laser beam.
Claim 31
Dependent Claim
43 words
A method according to claim 20, further comprising correcting, in response to a detection of a change in the wavelength, any deviation of a surface of the wafer from an image plane of the circuit pattern caused by the change in the wavelength.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-03-10 | 1995-09-09 | 1996-03-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-03-10 | 1999-09-09 | 2000-03-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-03-10 | 2003-09-09 | 2004-03-10 | $7700.00 | Window Closed / Lapsed |