Projecting and exposing device

Abstract

Abstract PURPOSE:To display good optical performance even if various numerical values of glass material are different to some extent from a design value, by selecting a wavelength having the optimum image forming performance in the image forming performances of a projecting lens. CONSTITUTION:A titled device consists of a light source 1 of an eximer laser subjected to injection locking, etc., a reflecting mirror 2, illuminating system 3 of mask 4 of a minute pattern of IC, LSI, etc., and a projecting lens 5, and a wafer position 6 is a projecting surface of the mask 4 by the projecting lens 5. Also, this device has a detecting means 7 for detecting the optimum image forming performance of the projecting lens 5 by using the output signal from a photoelectric converting element, when the photoelectric converting element is placed at the wafer position, and a control means 8 for making an oscillation wavelength of the eximer laser variable based on a signal from the detecting means 7, and the control means is provided on the inside of the eximer laser 1, and formed as one body if required. The oscillation wavelength of the eximer laser 1 is varied in various ways, the wavelength of the best image forming performance of the projecting lens 5 is detected by the detecting means 7, and based on the detected signal, the oscillation wavelength of the eximer laser 1 is varied by the control means 8.

Inventors

• 👤 Takamasa Hirose
• 👤 広瀬　隆昌

Bibliographic Details