Manufacturing method for a self-aligned emitter-base-complex for heterobipolar transistors

Claim 2

Method for the manufacturing of a self-aligned emitter-base-complex for heterobipolar transistors, comprising the steps of: growing a sequence of epitaxial layers for an area of a base; introducing base implantation provided for the area of the base by means of a dummy-emitter applied thereon; generating a dielectric mask covering a region not covered by the dummy-emitter; after removal of the dummy-emitter and curing of the base implantation, applying emitter contact layers and emitter-metallizations using the dielectric mask; after removal of the dielectric mask, applying the base metallization using a conventional mask technique; on the epitaxial layers a sputter layer being applied over the whole surface, thereupon being grown the dummy-emitter composed of photosensitive resist and thereupon being grown a first dielectric layer over the whole surface, after which, the base implantation is introduced, and then a second dielectric layer being applied over the whole surface at least up to the height of the dummy-emitter and thereupon being applied a levelling photoresist layer, subsequently, the first dielectric layer, the second dielectric layer and the photoresist layer being etched-off to the extent that the surface of the dummy-emitter is exposed and from the first and second dielectric layers a portion remains as a dielectric mask in the region not covered by the dummy-emitter, subsequently, the dummy-emitter and the portion of the sputter layer therebelow being removed, the emitter contact layers being then grown thereon and a metal layer being applied over the whole surface and subsequently the dielectric mask with the portion of this metal layer located thereupon being removed, so that from this metal layer a portion remains on the emitter contact layers as emitter metallization.

Claim 3

Method for the manufacturing of a self-aligned emitter-base-complex for heterobipolar transistors, comprising the steps of: growing a sequence of epitaxial layers for an area of a base; applying a sputter layer over the whole surface of the epitaxial layers, generating a dummy-emitter using a photosensitive resist; depositing a first dielectric layer over the whole surface, after which, a base implantation is introduced, applying, a second dielectric layer over the whole surface at least up to the height of the dummy-emitter; applying a levelling photoresist layer over the whole surface; etching the first dielectric layer, the second dielectric layer and the photoresist layer to the extent that the surface of the dummy-emitter is exposed and leaving a portion of at least the first dielectric layer as a dielectric mask in a region not covered by the dummy-emitter; removing the dummy-emitter and the portion of the sputter layer therebelow; applying emitter contact layers on an exposed surface of the epitaxial layers; applying a metal layer over the whole surface; and removing the dielectric mask with the portion of the metal layer located thereupon, so that from the metal layer a portion remains on the emitter contact layers as emitter metallization.

Claim 4

Method for the manufacturing of a self-aligned emitter-base-complex for heterobipolar transistors, comprising the steps of: growing a sequence of epitaxial layers for an area of a base; applying a sputter layer over the whole surface of the epitaxial layers, generating a dummy-emitter using a photosensitive resist; depositing a first dielectric layer over the whole surface, after which, a base implantation is introduced, applying, a second dielectric layer over the whole surface at least up to the height of the dummy-emitter; applying a levelling photoresist layer over the whole surface; etching the first dielectric layer, the second dielectric layer and the photoresist layer to the extent that the surface of the dummy-emitter is exposed and leaving a portion of at least the first dielectric layer as a dielectric mask in a region not covered by the dummy-emitter; removing the dummy-emitter and the portion of the sputter layer therebelow; applying emitter contact layers on an exposed surface of the epitaxial layers; applying a metal layer over the whole surface; and removing the dielectric mask with the portion of the metal layer located thereupon, so that from the metal layer a portion remains on the emitter contact layers as emitter metallization.

Claim 5

Method according to claim 2, wherein the dummy-emitter is manufactured with overhanging edges.

Claim 6

Method according to claim 2, wherein the dummy-emitter is manufactured with oblique edges and before the lift-off of the dielectric mask portions of the metal layer located thereon are removed by means of a mask technique.

Claim 7

Method according to claim 2, wherein a first contact layer composed of binary semiconductor material is grown and thereupon a second contact layer is grown composed of ternary semiconductor material with a grading in the portion of the third material component as the emitter contact layers.

Claim 8

Method for the manufacturing of a self-aligned emitter-base-complex for heterobipolar transistors, comprising the steps of: growing a sequence of epitaxial layers for an area of a base; introducing base implantation provided for the area of the base by means of a dummy-emitter applied thereon; generating a dielectric mask covering a region not covered by the dummy-emitter; after removal of the dummy-emitter and annealing of the base implantation, applying emitter contact layers and emitter-metallizations using the dielectric mask; and after removal of the dielectric mask, applying the base metallization using a conventional mask technique; applying a sputter layer over the whole surface of the epitaxial layers, generating a dummy-emitter using a photosensitive resist; depositing a first dielectric layer over the whole surface, after which, a base implantation is introduced, applying a second dielectric layer over the whole surface at least up to the height of the dummy-emitter and applying a levelling photoresist layer, over the whole surface etching the first dielectric layer, the second dielectric layer and the photoresist layer to the extent that the surface of the dummy-emitter is exposed and leaving a portion of at least the first dielectric layer as a dielectric mask in a region not covered by the dummy-emitter; removing the dummy-emitter and the portion of the sputter layer therebelow; applying a first contact layer composed of binary semiconductor material on the exposed surface of the epitaxial layers and applying thereupon a second contact layer composed of ternary semiconductor material with a grading in the portion of the third material component; applying a metal layer over the whole surface; and removing the dielectric mask with the portion of the metal layer located thereupon, so that from the metal layer a portion remains on the emitter contact layers as emitter metallization.

Claim 9

Method for the manufacturing of a self-aligned emitter-base-complex for heterobipolar transistors, comprising the steps of: growing a sequence of epitaxial layers for an area of a base; introducing base implantation provided for the area of the base by means of a dummy-emitter applied thereon; generating a dielectric mask covering a region not covered by the dummy-emitter; after removal of the dummy-emitter and annealing of the base implantation, applying emitter contact layers and emitter-metallizations using the dielectric mask; and after removal of the dielectric mask, applying the base metallization using a conventional mask technique; applying a sputter layer over the whole surface of the epitaxial layers, generating a dummy-emitter using a photosensitive resist; depositing a first dielectric layer over the whole surface, after which, a base implantation is introduced, applying a second dielectric layer over the whole surface at least up to the height of the dummy-emitter and applying a levelling photoresist layer, over the whole surface etching the first dielectric layer, the second dielectric layer and the photoresist layer to the extent that the surface of the dummy-emitter is exposed and leaving a portion of at least the first dielectric layer as a dielectric mask in a region not covered by the dummy-emitter; removing the dummy-emitter and the portion of the sputter layer therebelow; applying a first contact layer composed of binary semiconductor material on the exposed surface of the epitaxial layers and applying thereupon a second contact layer composed of ternary semiconductor material with a grading in the portion of the third material component; applying a metal layer over the whole surface; and removing the dielectric mask with the portion of the metal layer located thereupon, so that from the metal layer a portion remains on the emitter contact layers as emitter metallization.

Claim 10

Method according to claim 6, wherein the dummy-emitter is manufactured with overhanging edges.

Claim 11

Method according to claim 6, wherein the dummy-emitter is manufactured with oblique edges and before the removing of the dielectric mask portions of the metal layer located thereon are removed by means of a mask technique.

Claim 12

Method for the manufacturing of a self-aligned emitter-base-complex for heterobipolar transistors, comprising the steps of: growing a sequence of epitaxial layers for an area of a base; generating a dummy-emitter; depositing a first dielectric layer over the whole surface, after which, a base implantation is introduced, applying, a second dielectric layer over the whole surface at least up to the height of the dummy-emitter; etching the first dielectric lay and the second dielectric layer to the extent that the surface of the dummy-emitter is exposed and leaving a portion of at least the first dielectric layer as a dielectric mask in a region not covered by the dummy-emitter; removing the dummy-emitter; applying emitter contact layers on an exposed surface of the epitaxial layers; applying a metal layer over the whole surface; and removing the dielectric mask with the portion of the metal layer located thereupon, so that from the metal layer a portion remains on the emitter contact layers as emitter metallization.

Claim 13

Method for the manufacturing of a self-aligned emitter-base-complex for heterobipolar transistors, comprising the steps of: growing a sequence of epitaxial layers for an area of a base; generating a dummy-emitter; depositing a first dielectric layer over the whole surface, after which, a base implantation is introduced, applying, a second dielectric layer over the whole surface at least up to the height of the dummy-emitter; etching the first dielectric lay and the second dielectric layer to the extent that the surface of the dummy-emitter is exposed and leaving a portion of at least the first dielectric layer as a dielectric mask in a region not covered by the dummy-emitter; removing the dummy-emitter; applying emitter contact layers on an exposed surface of the epitaxial layers; applying a metal layer over the whole surface; and removing the dielectric mask with the portion of the metal layer located thereupon, so that from the metal layer a portion remains on the emitter contact layers as emitter metallization.

Claim 14

Method according to claim 9, wherein the dummy-emitter is manufactured with overhanging edges.

Claim 15

Method according to claim 9, wherein the dummy-emitter is manufactured with oblique edges and before the lift-off of the dielectric mask portions of the metal layer located thereon are removed by means of a mask technique.

Claim 16

Method according to claim 9, wherein a first contact layer composed of binary semiconductor material is grown and thereupon a second contact layer is grown composed of ternary semiconductor material with a grading in the portion of the third material component as the emitter contact layers.