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US5089373A
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Positive photoresist composition utilizing O-quinonediazide and novolak resin
Assignee: Fujifilm Holdings Corp
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Filing: 1989-06-07
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Granted: 1992-02-18
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Expires: 2009-06-07
Abstract
Abstract A positive photoresist composition containing the combination of at least one alkali-soluble novolak resin and at least one light-sensitive compound represented by formula (I): ##STR1## wherein each of R 1 to R 10 , which may be the same or different, represents hydrogen, --OH, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkylester group, a substituted or unsubstituted arylester group, a substituted or unsubstituted aralkylester group, a substituted or unsubstituted alkylsulfonylester group, a substituted or unsubstituted arylsulfonylester group, ##STR2## provided that at least one of R 1 to R 10 represents ##STR3## where R 17 represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group or a substituted or unsubstituted aralkyl group; and at least two of R 1 to R 10 represent ##STR4## and R 11 and R 12 , which may be the same or different, each represents hydrogen, --OH, --COOH, --CN, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aralkyl group, --COOR 13 , --R 14 --COOH, or --R 15 --COOR 16 ; where R 13 and R 16 , which may be the same or different, each represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted aralkyl group; and R 14 and R 15 each represents a substituted or unsubstituted alkylene group, or a substituted or unsubstituted arylene group; provided that at least one of R 11 and R 12 represents a group other than hydrogen. The positive photoresist composition has high resolving power and sensitivity, and a nearly perpendicular cross-section.
Inventors
- 👤 Kazuya Uenishi
- 👤 Yasumasa Kawabe
- 👤 Tadayoshi Kokubo
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 22:59
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; C; C07; C07C; C07C309/00; C07C309/63; C07C309/71; C07C309/72; C07C309/76; G03F7/038
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
296 words
A positive photoresist composition comprising in admixture at least one alkali-soluble novolak resin and at least one light-sensitive compound represented by formula (I): ##STR20## wherein each of R 1 to R 10 , which may be the same or different, represents hydrogen, --OH, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkylester group, a substituted or unsubstituted arylester group, a substituted or unsubstituted aralkylester group, a substituted or unsubstituted alkylsulfonylester group, a substituted or unsubstituted arylsulfonylester group, ##STR21## provided that at least one of R 1 to R 10 represents ##STR22## where R 17 represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group or a substituted or unsubstituted aralkyl group; and at least two of R 1 to R 10 represent ##STR23## and R 11 and R 12 , which may be the same or different, each represents hydrogen, --OH, --COOH, --CN, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aralkyl group, --COOR 13 , --R 14 --COOH, or --R 15 --COOR 16 ; where R 13 and R 16 , which may be the same or different, each represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted aralkyl group; and R 14 and R 15 each represents a substituted or unsubstituted alkylene group, or a substituted or unsubstituted arylene group; provided that at least one of R 11 represents a group other than hydrogen; wherein from 5 to 100 parts by weight of said light-sensitive compound represented by formula (I) are present per 100 parts by weight of said novolak resin.
Claim 2
Dependent Claim
296 words
A positive photoresist composition comprising in admixture at least one alkali-soluble novolak resin and at least one light-sensitive compound represented by formula (I): ##STR20## wherein each of R 1 to R 10 , which may be the same or different, represents hydrogen, --OH, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkylester group, a substituted or unsubstituted arylester group, a substituted or unsubstituted aralkylester group, a substituted or unsubstituted alkylsulfonylester group, a substituted or unsubstituted arylsulfonylester group, ##STR21## provided that at least one of R 1 to R 10 represents ##STR22## where R 17 represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group or a substituted or unsubstituted aralkyl group; and at least two of R 1 to R 10 represent ##STR23## and R 11 and R 12 , which may be the same or different, each represents hydrogen, --OH, --COOH, --CN, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aralkyl group, --COOR 13 , --R 14 --COOH, or --R 15 --COOR 16 ; where R 13 and R 16 , which may be the same or different, each represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted aralkyl group; and R 14 and R 15 each represents a substituted or unsubstituted alkylene group, or a substituted or unsubstituted arylene group; provided that at least one of R 11 represents a group other than hydrogen; wherein from 5 to 100 parts by weight of said light-sensitive compound represented by formula (I) are present per 100 parts by weight of said novolak resin.
Claim 3
Dependent Claim
21 words
The positive photoresist composition as claimed in claim 1, wherein at least two of R 1 to R 10 represent ##STR24##
Claim 4
Dependent Claim
21 words
The positive photoresist composition as claimed in claim 1, wherein at least two of R 1 to R 10 represent ##STR25##
Claim 5
Dependent Claim
216 words
The positive photoresist composition as claimed in claim 1, wherein each of said alkyl groups and alkoxy groups represented by R 1 to R 13 , R 16 and R 17 contains 1 to 8 carbon atoms; each of said aryl groups and aralkyl groups represented by R 1 to R 13 , R 16 and R 17 contains 6 to 15 carbon atoms; each of said substituted alkyl groups and substituted alkoxy groups represented by R 1 to R 13 , R 16 and R 17 is substituted with a substituent selected from an alkoxy group, an aryloxy group, an aryl group, a hydroxyl group, a carboxyl group, a sulfonic acid group, an amino group, a nitro group, a silyl group, a silyl ether group, a cyano group, an aldehyde group, a mercapto group or a halogen atom; and each of said substituted aryl groups and substituted aralkyl groups represented by R 1 to R 13 , R 16 and R 17 is substituted with at least one substituent selected from an alkoxy group, an aryloxy group, an aryl group, a hydroxyl group, a carboxyl group, a sulfonic acid group, an aryl group, a nitro group, a silyl group, a silyl ether group, a cyano group, an aldehyde group, a mercapto group or halogen atoms.
Claim 6
Dependent Claim
149 words
The positive photoresist composition as claimed in claim 1, wherein each of R 14 and R 15 represents an alkylene group containing 1 to 8 carbon atoms; an arylene group containing 6 to 15 carbon atoms; an alkylene group containing 1 to 8 carbon atoms substituted with an alkoxy group, an aryloxy group, an aryl group, a hydroxyl group, a carboxyl group, a sulfonic acid group, an amino group, a nitro group, a silyl group, a silyl ether group, a cyano group, an aldehyde group, a mercapto group, or a halogen atom; or an arylene group containing 6 to 15 carbon atoms substituted with an alkoxy group, an aryloxy group, an aryl group, a hydroxyl group, a carboxyl group, a sulfonic acid group, an amino group, a nitro group, a silyl group, a silyl ether group, a cyano group, an aldehyde group, a mercapto group, or a halogen atom.
Claim 7
Dependent Claim
34 words
The positive photoresist composition as claimed in claim 1, comprising from 10 to 50 parts by weight of said light-sensitive compound represented by formula (I) per 100 parts by weight of said novolak resin.
Claim 8
Dependent Claim
54 words
The positive photoresist composition as claimed claim 6, further comprising up to 100 parts by weight of a second light-sensitive compound selected from an ester of 1,2-naphthoquinonediazido-5-sulfonyl chloride and an ester of 1,2-naphthoquinonediazido-4-sulfonyl chloride, with any of 2,3,4-trihydroxybenzophenone, 2,4,4'-trihydroxybenzophenone, and 2,4,6-trihydroxybenzophenone; per 100 parts by weight of said light-sensitive compound represented by formula (I).
Claim 9
Dependent Claim
34 words
The positive photoresist composition as claimed in claim 7, comprising at most 30 parts by weight of said second light-sensitive compound per 100 parts by weight of said light-sensitive compound represented by formula (I).
Claim 10
Dependent Claim
14 words
The positive photoresist composition as claimed in claim 7, further comprising a polyhydroxy compound.
References Cited (Backward Citations)
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| 3.5 Years (Year 4) | 1995-02-17 | 1995-08-19 | 1996-02-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-02-17 | 1999-08-19 | 2000-02-18 | $3760.00 | Window Closed / Lapsed |
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