Patent US5084132A successfully refreshed from Google Patents.
US5084132A
Expired / Lapsed
US
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Non-moire' shielded window forming method
Assignee: Parker Intangibles LLC
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Filing: 1991-01-14
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Granted: 1992-01-28
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Expires: 2011-01-14
Abstract
Abstract A shielded substrate is disclosed which has a randomly oriented, non-linear conductive pattern formed on at least one surface of the substrate. The conductive pattern provides excellent EMI/RFI shielding and visual opacity properties without generating moire' patterns. The conductive pattern is formed of a series of interconnecting non-linear, conductive elements, such as circles, ovals, ellipses and polygonal shapes. The conductive substrate may be formed through the use of photolithography process.
Inventors
- 👤 David C. Smith
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 23:17
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/0005; G03F7/0007; H; H01; H01J; H01J29/00; H01J29/86; H01J29/867; H01J29/89; H01J9/00; H01J9/20
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
87 words
A method for forming a moire'-free EMI/RFI shield comprising the steps of: (a) generating a photomask pattern having a series of randomly oriented, interconnected, non-linear elements; (b) coating a substrate with a photoresist; (c) exposing the photoresist to the photomask; (d) developing the exposed photoresist; (e) etching the photomask pattern into the substrate; (f) washing and removing the photoresist; (g) filling the etched pattern in the substrate with an electrically conductive material; and (h) placing the placed substrate within a frame for mounting to an electronic device.
Claim 2
Independent Claim
87 words
A method for forming a moire'-free EMI/RFI shield comprising the steps of: (a) generating a photomask pattern having a series of randomly oriented, interconnected, non-linear elements; (b) coating a substrate with a photoresist; (c) exposing the photoresist to the photomask; (d) developing the exposed photoresist; (e) etching the photomask pattern into the substrate; (f) washing and removing the photoresist; (g) filling the etched pattern in the substrate with an electrically conductive material; and (h) placing the placed substrate within a frame for mounting to an electronic device.
Claim 3
Dependent Claim
32 words
The method of claim 1 wherein the randomly oriented, interconnected, non-linear design is formed from a series of elements selected from the group consisting of circles, ovals, ellipses, polygons and mixtures thereof.
Claim 4
Dependent Claim
14 words
The method of claim 1 wherein the substrate is a metal-clad glass or plastic.
Claim 5
Dependent Claim
29 words
The method of claim 1 wherein the electrically conductive material is selected from the group consisting of noble metals, non noble metals, conductive adhesives, conductive inks, and conductive frits.
Claim 6
Dependent Claim
21 words
The method of claim 1 further comprising a step of coating the filled etched pattern of (g) with a protective layer.
Claim 7
Dependent Claim
36 words
The method of claim 5 wherein the protective layer is selected from the group consisting of conductive metal platings, conductive metal films, conductive metal coatings, polymeric coatings and film, an additional substrate layer and combinations thereof.
Claim 8
Dependent Claim
18 words
The method of claim 6 wherein the protective layer is a conductive metal coating of indium tin oxide.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-01-27 | 1995-07-29 | 1996-01-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-01-27 | 1999-07-29 | 2000-01-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-01-27 | 2003-07-29 | 2004-01-28 | $7700.00 | Window Closed / Lapsed |