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US5082545A Expired / Lapsed US ⏱️ 0.0 years remaining

Sputtering apparatus

Assignee: Panasonic Holdings Corp
•
Filing: 1989-12-14
•
Granted: 1992-01-21
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Expires: 2009-12-14
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Abstract

Abstract A sputtering apparatus to be used in reactive sputtering which mixes a reactive gas into a discharge gas so as to form chemical compound thin membranes. A heating means is provided for heating the target. Light such as infrared rays or the like, and laser beams are ideal as the heating means. A thermometer for applying light is preferable to measure the temperature of at least one portion of the target for controlling the heating condition of the target. The composition of the thin membrane to be formed by the reactive sputtering can may be made constant.

Inventors

  • 👤 Kunio Tanaka
  • 👤 Youichi Ohnishi
  • 👤 Masahide Yokoyama

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 19:28
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407; C23C14/3421; C23C14/0021; C23C14/0036; H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3488; H01J37/3497

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 204 words
A sputtering apparatus comprising: a vacuum container having means connected thereto for maintaining a vacuum in said container; a gas introducing means for introducing oxygen and argon gas into said vacuum container in the vicinity of a target of a metal to be sputtered; a plasma generating means connected across the target and a base plate support which are within said vacuum container for forming a plasma near the target; a heating means directing light onto the target for heating the target; a temperature sensing means for sensing the temperature of the target; and means responsive to the sensed temperature of the target for controlling the amount of light directed onto the target for keeping the temperature of the surface of the target at a temperature for keeping the rate of oxidation of the metal of the target constant at the rate of flow of oxygen and argon gas, whereby the oxygen metal ratio on the surface of the target can be kept constant and the oxidation reaction stabilized so as to the make sputtering under a low oxygen partial pressure possible and the composition of the thin layer of metal formed by the sputtering can be made constant over long periods of time.
Claim 2
Dependent Claim 204 words
A sputtering apparatus comprising: a vacuum container having means connected thereto for maintaining a vacuum in said container; a gas introducing means for introducing oxygen and argon gas into said vacuum container in the vicinity of a target of a metal to be sputtered; a plasma generating means connected across the target and a base plate support which are within said vacuum container for forming a plasma near the target; a heating means directing light onto the target for heating the target; a temperature sensing means for sensing the temperature of the target; and means responsive to the sensed temperature of the target for controlling the amount of light directed onto the target for keeping the temperature of the surface of the target at a temperature for keeping the rate of oxidation of the metal of the target constant at the rate of flow of oxygen and argon gas, whereby the oxygen metal ratio on the surface of the target can be kept constant and the oxidation reaction stabilized so as to the make sputtering under a low oxygen partial pressure possible and the composition of the thin layer of metal formed by the sputtering can be made constant over long periods of time.
Claim 3
Dependent Claim 37 words
A sputtering apparatus as claimed in claim 1 in which said temperature sensing means is a thermometer including means for applying light to the target for measuring the temperature of at least one portion of the target.

References Cited (Backward Citations)

US3472751A Cited
US3616452A Cited
US4046666A Cited
US4033843A Cited
US4407708A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-01-20 1995-07-22 1996-01-21 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-01-20 1999-07-22 2000-01-21 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-01-20 2003-07-22 2004-01-21 $7700.00 Window Closed / Lapsed

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