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Patent US5080993A successfully refreshed from Google Patents.
US5080993A
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US
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Method to produce a photoreceptor for electrophotography using diamond bit followed by etching
Assignee: Fuji Electric Co Ltd
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Filing: 1989-09-19
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Granted: 1992-01-14
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Expires: 2009-09-19
Abstract
Abstract The present invention relates to a method for producing a photoreceptor for electrophotography. An aluminum base substrate is worked so that the Rmax is between 1.3 and 1.8 microns, with a filtered maximum waviness not exceeding 0.5 microns. The substrate is etched with an aqueous solution of alkali, and then etched with an aqueous solution of nitric acid to form an oxide thin film. A Se-As alloy is vacuum deposited thereon to form a light sensitive layer. This photoreceptor is flat and smooth so that the images obtained by electrophotography are substantially free from white point defects.
Inventors
- 👤 Yukihiro Maruta
- 👤 Toshinao Ishizone
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 11:15
CPC Classifications
G; G03; G03G; G03G5/00; G03G5/10; G03G5/02; G03G5/04; G03G5/08; G03G5/082; G03G5/08207; Y; Y10; Y10S; Y10S451/00; Y10S451/901
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
88 words
A method for producing a photoreceptor for electrophotography comprising (a) working an aluminum base substrate with a diamond bite to achieve a finish in which R max to between 1.3 and 1.8 microns and the filtered maximum waviness does not exceed 0.5 micron; (b) etching the worked aluminum base substrate with an aqueous solution of alkali to convert the aluminum into a state having good adhesion properties for a Se-As vacuum-deposited film; and (c) vacuum depositing a Se-As alloy on the surface of the etched aluminum base substrate.
Claim 2
Independent Claim
88 words
A method for producing a photoreceptor for electrophotography comprising (a) working an aluminum base substrate with a diamond bite to achieve a finish in which R max to between 1.3 and 1.8 microns and the filtered maximum waviness does not exceed 0.5 micron; (b) etching the worked aluminum base substrate with an aqueous solution of alkali to convert the aluminum into a state having good adhesion properties for a Se-As vacuum-deposited film; and (c) vacuum depositing a Se-As alloy on the surface of the etched aluminum base substrate.
Claim 3
Dependent Claim
53 words
A method for producing a photoreceptor for electrophotography according to claim 1, wherein the aluminum base substrate after being etched with an aqueous solution of alkali, is etched with an aqueous solution of nitric acid to form an oxidized film on the aluminum base substrate before the Se-As alloy is vacuum deposited thereon.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-01-13 | 1995-07-15 | 1996-01-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-01-13 | 1999-07-15 | 2000-01-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-01-13 | 2003-07-15 | 2004-01-14 | $7700.00 | Window Closed / Lapsed |