Patent US5077173A successfully refreshed from Google Patents.
US5077173A
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US
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Positive photoresist containing 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone-diazide-5-sulfonyl trisester of 1,3,5-trihydroxybenzene
Assignee: OCG Microelectronic Materials Inc
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Filing: 1991-01-30
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Granted: 1991-12-31
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Expires: 2011-01-30
Abstract
Abstract Structures of high resolution in the near UV range and of high sharpness of edge and steepness of edge can be obtained by means of positive photoresists containing, in an organic solvent, in each case essentially at least (a) an alkali-soluble resin (b) a 1,2-naphthoquinone-diazide-5-sulfonyl ester of a trihydroxybenzene isomer (c) an aromatic hydroxy compound and also, if appropriate, further customary additives, and in which the result of component (b) is to give an absorption coefficient of at least 0.5 μm -1 for the photobleachable absorption, and component (c) is present in a concentration of 15-30% by weight, relative to the total solids content.
Inventors
- 👤 Reinhard Schulz
- 👤 Horst Munzel
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 10:00
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/0226
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
41 words
A positive photoresist comprising, in an organic solvent, (a) an alkali-soluble resin, (b) 1,2-naphthoquinone-diazide-5-sulfonyl trisester of 1,3,5-trihydroxybenzene, and (c) 2,3,4-trihydroxybenzophenone; component (b) and component (c) each being present in a concentration of 17-30% by weight, relative to the total solids content.
Claim 2
Dependent Claim
41 words
A positive photoresist comprising, in an organic solvent, (a) an alkali-soluble resin, (b) 1,2-naphthoquinone-diazide-5-sulfonyl trisester of 1,3,5-trihydroxybenzene, and (c) 2,3,4-trihydroxybenzophenone; component (b) and component (c) each being present in a concentration of 17-30% by weight, relative to the total solids content.
Claim 3
Dependent Claim
49 words
A positive photoresist according to claim 1, which contains (a) 50 to 56% by weight of an alkali-soluble resin, (b) 18 to 25% by weight of the 1,2-naphthoquinone-diazide-5-sulfonyl trisester of 1,3,5-trihydroxybenzene and (c) 17 to 25% by weight of 2,3,4-trihydroxybenzophenone, in each case relative to the total solids content.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-12-30 | 1995-07-01 | 1995-12-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-12-30 | 1999-07-01 | 1999-12-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-12-30 | 2003-07-01 | 2003-12-31 | $7700.00 | Window Closed / Lapsed |