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US5077091A
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Deposition process in the vapour phase at low temperature of a ceramic coating of the metallic nitride or carbonitride type
Assignee: C3F (COMPAGNIE FRANCAISE DE FORGES ET FONDERIES)
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Filing: 1990-02-14
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Granted: 1991-12-31
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Expires: 2010-02-14
Abstract
Abstract The object of the invention is a one-step deposition process of a coating of the ceramic type based on nitrides or carbonitrides of at least one metallic element selected from Cr, V, Zr, W, Mo, Co, Mn, Ni, Hf and Ta on a metallic or ceramic substrate, massive or obtained from fibres, by deposition in the vapor phase wherein a coating is deposited on the substrate by a chemical means at a pressure lower than 10 kPa at a temperature lower than 600° C. and by using a system of precursors constituted simultaneously of: an organo-metallic precursor of the said metallic element selected from the organo-metallic compounds of the sandwich type of general formula: [Ar.sup.1 M Ar.sup.2.sub.n ]L.sub.x L'.sub.y a nitrogen precursor selected from ammonia and hydrazine.
Inventors
- 👤 Jean-Francois Nowak
- 👤 Frederic Schuster
- 👤 Francis Maury
- 👤 Roland Morancho
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 22:39
CPC Classifications
C; C04; C04B; C04B41/00; C04B41/009; C04B41/45; C04B41/50; C04B41/5053; C04B41/5062; C04B41/80; C04B41/81; C04B41/85; C04B41/87; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/34; C23C16/36
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
242 words
One-step deposition process of a coating of the ceramic type based on nitrides or carbonitrides of at least one metallic element selected from Cr, V, Zr, W, Mo, Co, Mn, Ni, Hf and Ta on a metallic or ceramic substrate, massive or obtained from fibres, by deposition in the vapour phase wherein a coating is deposited on the substrate by chemical means at a pressure lower than 10 kPa at a temperature lower than 600° C. and by using a system of precursors constituted of: an organo-metallic precursor of the said metallic element selected from the organo-metallic compounds of the sandwich type of general formula: [Ar.sup.1 MAr.sup.2.sub.n ]L.sub.x L'.sub.y in which Ar 1 and Ar 2 , identical or different, represent a C 5 -C 8 aromatic ring optionally substituted by 1 to 6 C 1 -C 4 alkyl groups or a phenyl group, n represents 0 or 1, M represents a metallic element such as defined above, L and L' each represents a hydrogen atom or a halogen atom, a CO, CF 3 , R, RCN, PR 3 , SR and SeR group, R being a C 1 -C 4 alkyl group or phenyl group optionally substituted by 1 or 2 C 1 -C 4 alkyl groups, pyridine, tetrahydrofuran, acetylacetonate, tetracyanoquinodimethane or L and L' represent together with M a ring MS 4 or MS 5 and x+y represent 0 to 4, and a nitrogen precursor selected from ammonia and hydrazine.
Claim 2
Dependent Claim
242 words
One-step deposition process of a coating of the ceramic type based on nitrides or carbonitrides of at least one metallic element selected from Cr, V, Zr, W, Mo, Co, Mn, Ni, Hf and Ta on a metallic or ceramic substrate, massive or obtained from fibres, by deposition in the vapour phase wherein a coating is deposited on the substrate by chemical means at a pressure lower than 10 kPa at a temperature lower than 600° C. and by using a system of precursors constituted of: an organo-metallic precursor of the said metallic element selected from the organo-metallic compounds of the sandwich type of general formula: [Ar.sup.1 MAr.sup.2.sub.n ]L.sub.x L'.sub.y in which Ar 1 and Ar 2 , identical or different, represent a C 5 -C 8 aromatic ring optionally substituted by 1 to 6 C 1 -C 4 alkyl groups or a phenyl group, n represents 0 or 1, M represents a metallic element such as defined above, L and L' each represents a hydrogen atom or a halogen atom, a CO, CF 3 , R, RCN, PR 3 , SR and SeR group, R being a C 1 -C 4 alkyl group or phenyl group optionally substituted by 1 or 2 C 1 -C 4 alkyl groups, pyridine, tetrahydrofuran, acetylacetonate, tetracyanoquinodimethane or L and L' represent together with M a ring MS 4 or MS 5 and x+y represent 0 to 4, and a nitrogen precursor selected from ammonia and hydrazine.
Claim 3
Dependent Claim
46 words
Process according to claim 1, wherein the organo-metallic precursor is selected from the compounds of the sandwich type in which the central metallic element is linked to two C 5 -C 8 aromatic rings, optionally substituted by one to six C 1 -C 4 alkyl groups.
Claim 4
Dependent Claim
21 words
Process according to claim 1, wherein the temperature of the substrate during the deposition is included between 300° and 600° C.
Claim 5
Dependent Claim
39 words
Process according to claim 2, wherein the metallic element is chromium and the organo-metallic precursor is selected from dibenzene chromium, the bis (arene) chromiums substituted by one to six C 1 -C 4 alkyl groups and bis (cyclopentadienyl) chromium.
Claim 6
Dependent Claim
18 words
Process according to claim 4, wherein the nitrogen precursor is hydrazine and the organo-metallic precursor is dibenzene chromium.
Claim 7
Dependent Claim
24 words
Process according to claim 1, wherein a reducing gas or a source of carbon selected from the hydrocarbons is introduced into the vapour phase.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-12-30 | 1995-07-01 | 1995-12-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-12-30 | 1999-07-01 | 1999-12-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-12-30 | 2003-07-01 | 2003-12-31 | $7700.00 | Window Closed / Lapsed |