US5073241A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for carbon film production
Assignee: Meidensha Corp
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Filing: 1987-01-28
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Granted: 1991-12-17
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Expires: 2007-01-28
Abstract
Abstract A carbon film producing method utilizing a reactive sputtering process for projecting carbon particles from a graphite target electrode to deposite a very thin layer on a substrate. The reactive sputtering process is performed at a predetermined pressure in an atmosphere of hydrogen gas mixed at a predetermined ratio to another kind of gas.
Inventors
- 👤 Misuzu Watanabe
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 02:18
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/0021; C23C14/0036; C23C14/0057; C23C14/06; C23C14/0605
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
107 words
A method of producing a carbon film on a substrate, comprising the steps of: placing the substrate in a vacuum chamber having a graphite target electrode placed therein; evacuating the vacuum chamber to a predetermined pressure; introducing a gaseous mixture into the vacuum chamber to produce a gaseous atmosphere therein at a pressure ranging from 0.7 Pa to 665 Pa, the gaseous mixture including dibrorane gas mixed at a ratio ranging from 1 ppm to 20 ppm to hydrogen gas; and releasing atomic particles from the graphite target electrode through a reactive sputtering process performed in the gaseous atmosphere, thereby depositing a carbon film on the substrate.
Claim 2
Independent Claim
107 words
A method of producing a carbon film on a substrate, comprising the steps of: placing the substrate in a vacuum chamber having a graphite target electrode placed therein; evacuating the vacuum chamber to a predetermined pressure; introducing a gaseous mixture into the vacuum chamber to produce a gaseous atmosphere therein at a pressure ranging from 0.7 Pa to 665 Pa, the gaseous mixture including dibrorane gas mixed at a ratio ranging from 1 ppm to 20 ppm to hydrogen gas; and releasing atomic particles from the graphite target electrode through a reactive sputtering process performed in the gaseous atmosphere, thereby depositing a carbon film on the substrate.
Claim 3
Independent Claim
107 words
A method of producing a carbon film on a substrate, comprising the steps of: placing the substrate in a vacuum chamber having a graphite target electrode placed therein; evacuating the vacuum chamber to a predetermined pressure; introducing a gaseous mixture into the vacuum chamber to produce a gaseous atmosphere therein at a pressure ranging from 0.7 Pa to 665 Pa, the gaseous mixture including oxygen gas mixed at a mixing ratio ranging from 1 ppm to 100 ppm to hydrogen gas; and releasing atomic particles from the graphite target electrode through reactive sputtering process performed in the gaseous atmosphere, thereby depositing a carbon film on the substrate.
Claim 4
Independent Claim
107 words
A method of producing a carbon film on a substrate, comprising the steps of: placing the substrate in a vacuum chamber having a graphite target electrode placed therein; evacuating the vacuum chamber to a predetermined pressure; introducing a gaseous mixture into the vacuum chamber to produce a gaseous atmosphere therein at a pressure ranging from 0.7 Pa to 665 Pa, the gaseous mixture including oxygen gas mixed at a mixing ratio ranging from 1 ppm to 100 ppm to hydrogen gas; and releasing atomic particles from the graphite target electrode through reactive sputtering process performed in the gaseous atmosphere, thereby depositing a carbon film on the substrate.
Claim 5
Independent Claim
109 words
A method of producing a carbon film on a substrate, comprising the steps of: placing the substrate in a vacuum chamber having a graphite target electrode placed therein; evacuating the vacuum chamber to a predetermined pressure; introducing a gaseous mixture into the vacuum chamber to produce a gaseous atmosphere therein at a pressure ranging from 0.7 Pa to 665 Pa, the gaseous mixture including carbon fluoride gas mixed at a mixing ratio ranging from 1 ppm to 100 ppm to hydrogen gas; and releasing atomic particles from the graphite target electrode through a reactive sputtering process performed in the gaseous atmosphere, thereby depositing a carbon film on the substrate.
Claim 6
Independent Claim
109 words
A method of producing a carbon film on a substrate, comprising the steps of: placing the substrate in a vacuum chamber having a graphite target electrode placed therein; evacuating the vacuum chamber to a predetermined pressure; introducing a gaseous mixture into the vacuum chamber to produce a gaseous atmosphere therein at a pressure ranging from 0.7 Pa to 665 Pa, the gaseous mixture including carbon fluoride gas mixed at a mixing ratio ranging from 1 ppm to 100 ppm to hydrogen gas; and releasing atomic particles from the graphite target electrode through a reactive sputtering process performed in the gaseous atmosphere, thereby depositing a carbon film on the substrate.
Claim 7
Dependent Claim
41 words
The method as claimed in claim 3, wherein the carbon fluoride gas is one selected from a group consisting CF 4 , C 2 F 6 , C-C 4 F 8 , C 5 F 12 , and CHF 3 .
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-12-16 | 1995-06-17 | 1995-12-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-12-16 | 1999-06-17 | 1999-12-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-12-16 | 2003-06-17 | 2003-12-17 | $7700.00 | Window Closed / Lapsed |