EP0155178A2
Expired / Lapsed
EP
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A coating film and method and apparatus for producing the same
Assignee: Meidensha Corp
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Filing: 1985-03-13
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Granted: —
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Expires: 2005-03-13
Abstract
Abstract A method and apparatus for providing a substrate (3) with an amorphous carbon coating film having a high hardness, good oxidation resistance, good thermal resistance, good electrical resistance and high thermal conductivity. The coating film is produced by sputtering a graphite target electrode (2) in an atmosphere of hydrogen and/or fluorine at a gas pressure of 6.665 to 666.5 Pa (0.05 to 5.0 Torr) while maintaining the current density for the graphite target electrode (2) 11.3 and 14.7 mA/cm 2 thereby limiting the H/C ratio in terms of an atomic ratio between 0.5 and 0.9. The apparatus includes a coating forming deposition substrate (3) arranged at a position within a sputtering vacuum container (1) where it is not directly exposed to a plasma or it may be mounted on an electron drawing electrode (7) within the container with a plasma adjusting electrode positioned in front of the substrate.
Inventors
- 👤 Akio Hiraki
- 👤 Tatsuro Miyasato
- 👤 Masao Hayashi
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-30 18:24
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402; C; C23; C23C; C23C14/00; C23C14/06; C23C14/0605; Y; Y10; Y10T; Y10T428/00; Y10T428/30
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
127 words
A method of producing a coating film on a substrate which comprises sputtering a carbonaceous e.g. graphite target electrode in a vacuum chamber characterised in that the chamber contains hydrogen and/or fluorine gas at a pressure of between 6.665 and 666.5 Pa (0.05 and 5.0 Torr) while the temperature of the substrate is maintained between room temperature and 100°C and while maintaining the current density between the target electrode, and an anode at a value between 11.3 and 14.7 mA/cm 2 thereby producing an amorphous carbon coating film in which the value of H/C or (H + F)/C in terms of an atomic ratio is between 0.5 and 0.9, the current density being defined as the current through the anode per unit area of the target electrode.
Claim 2
Independent Claim
127 words
A method of producing a coating film on a substrate which comprises sputtering a carbonaceous e.g. graphite target electrode in a vacuum chamber characterised in that the chamber contains hydrogen and/or fluorine gas at a pressure of between 6.665 and 666.5 Pa (0.05 and 5.0 Torr) while the temperature of the substrate is maintained between room temperature and 100°C and while maintaining the current density between the target electrode, and an anode at a value between 11.3 and 14.7 mA/cm 2 thereby producing an amorphous carbon coating film in which the value of H/C or (H + F)/C in terms of an atomic ratio is between 0.5 and 0.9, the current density being defined as the current through the anode per unit area of the target electrode.
Claim 3
Dependent Claim
36 words
A method as claimed in Claim 1 characterised in that the temperature of the substrate is maintained at the desired value by locating the substrate in a position where it is not exposed to a plasma.
Claim 4
Dependent Claim
21 words
A method as claimed in Claim 2 characterised in that the substrate is located on a wall of the vacuum chamber.
Claim 5
Independent Claim
18 words
A method as claimed in any preceding Claim characterised by doping the target electrode with a semiconducting material.
Claim 6
Dependent Claim
17 words
A method as claimed in Claim 4 characterised in that the semiconducting material is boron or phosphorous.
Claim 7
Independent Claim
21 words
A method as claimed in any preceding Claim characterised in that the gas in the chamber further includes a semiconducting gas.
Claim 8
Dependent Claim
25 words
A method as claimed in Claim 6, characterised in that the semiconducting gas is nitrogen, and/or a gas containing boron and/or a gas containing phosphorous.
Claim 9
Dependent Claim
115 words
An amorphous carbon coating film on a substrate characterised in that it is produced by sputtering a carbonaceous e.g. graphite target electrode in an atmosphere of hydrogen and/or fluorine gas having a pressure of 6.665 to 666.5 Pa (0.05 to 5.0 Torr) while maintaining the temperature of the deposition substrate between room temperature and 100°C and while maintaining the current density between the target electrode and an anode at a value between 11.3 and 14.7 mA/cm 2 whereby the value of H/C or (H + F)/C in terms of an atomic ratio is between 0.5 and 0.9, the current density being defined as the current through the ancde per unit area of the target electrode.
Claim 10
Dependent Claim
115 words
An amorphous carbon coating film on a substrate characterised in that it is produced by sputtering a carbonaceous e.g. graphite target electrode in an atmosphere of hydrogen and/or fluorine gas having a pressure of 6.665 to 666.5 Pa (0.05 to 5.0 Torr) while maintaining the temperature of the deposition substrate between room temperature and 100°C and while maintaining the current density between the target electrode and an anode at a value between 11.3 and 14.7 mA/cm 2 whereby the value of H/C or (H + F)/C in terms of an atomic ratio is between 0.5 and 0.9, the current density being defined as the current through the ancde per unit area of the target electrode.
Claim 11
Dependent Claim
89 words
A sputtering apparatus for producing an amorphous carbon coating film on a substrate, the apparatus comprising a vacuum chamber having an atmosphere gas inlet pipe, an exhaust pipe, an electron drawing anode, a carbonaceous e.g. graphite target electrode connected to a power source and positioned opposite to the anode, and means for producing a magnetic field to provide a directionality for a plasma, characterised in that the substrate is arranged on an inner wall of the vacuum chamber in a region which is not directly exposed to the plasma.
Claim 12
Dependent Claim
89 words
A sputtering apparatus for producing an amorphous carbon coating film on a substrate, the apparatus comprising a vacuum chamber having an atmosphere gas inlet pipe, an exhaust pipe, an electron drawing anode, a carbonaceous e.g. graphite target electrode connected to a power source and positioned opposite to the anode, and means for producing a magnetic field to provide a directionality for a plasma, characterised in that the substrate is arranged on an inner wall of the vacuum chamber in a region which is not directly exposed to the plasma.
Claim 13
Dependent Claim
90 words
A sputtering apparatus for producing an amorphous carbon coating film on a substrate, the apparatus comprising a vacuum chamber having an atmosphere gas inlet pipe, an exhaust pipe, an electron drawing anode, a carbonaceous target electrode connected to a power source and positioned opposite to the anode, and means for producing a magnetic field to provide a directionality for a plasma, characterised by a further electrode arranged between the anode and the target electrode, the further electrode having a large number of holes for adjusting the amount of the plasma.
Claim 14
Dependent Claim
90 words
A sputtering apparatus for producing an amorphous carbon coating film on a substrate, the apparatus comprising a vacuum chamber having an atmosphere gas inlet pipe, an exhaust pipe, an electron drawing anode, a carbonaceous target electrode connected to a power source and positioned opposite to the anode, and means for producing a magnetic field to provide a directionality for a plasma, characterised by a further electrode arranged between the anode and the target electrode, the further electrode having a large number of holes for adjusting the amount of the plasma.
Claim 15
Dependent Claim
18 words
Apparatus as claimed in Claim 9 or Claim 10 characterised in that the anode is at ground potential.
Claim 16
Dependent Claim
20 words
Apparatus as claimed in Claim 10 or Claim 11 characterised in that the plasma adjusting electrode is at ground potential.
Claim 17
Dependent Claim
22 words
Apparatus as claimed in Claim 10 or Claim 11 characterised in that the plasma adjusting electrode is connected to another power source.
Claim 18
Dependent Claim
21 words
Apparatus as claimed in any of Claims 10 to 13 characterised in that the plasma adjusting electrode is a mesh electrode.
References Cited (Backward Citations)
No citation records indexed.
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