Diamond transistor and method of manufacture thereof
Abstract
Abstract The invention provides a process for manufacturing a field-effect transistor on a p-type diamond substrate. The process includes depositing a layer of p' doped amorphous silicon or germanium on the surface of the substrate and depositing a layer of a first metal over the p + layer. Portions of the layer of the first metal and the p+ layer are selectively removed to define source and drain regions of the transistor. A gate region is defined by an exposed portion of the substrate between the source and drain regions. A layer of a wide-bandgap insulating material is deposited over the source, gate and drain regions and then selectively removed to allow metallic contacts to be applied to the source, gate and drain regions.
Inventors
- 👤 Barbara L. Jones
Bibliographic Details
Claims Analysis
Total Claims: 8References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-12-09 | 1995-06-10 | 1995-12-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-12-09 | 1999-06-10 | 1999-12-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-12-09 | 2003-06-10 | 2003-12-10 | $7700.00 | Window Closed / Lapsed |