US5070391A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Semiconductor contact via structure and method
Assignee: STMicroelectronics lnc USA
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Filing: 1990-04-30
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Granted: 1991-12-03
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Expires: 2010-04-30
Abstract
Abstract A contact opening through an insulating layer is filled with metal and etched back to form a metal plug within the opening. A metal interconnect line can then be formed over the contact, and makes electrical contact with the metal plug. Since the contact opening is filled by the metal plug, it is not necessary for the metal signal line to have a widened portion in order to ensure enclosure.
Inventors
- 👤 Fu-Tai Liou
- 👤 Charles R. Spinner
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 16:49
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10D; H10D64/00; H10D64/01; H10D64/011; H10D64/0111; H10W20/031; H10W20/032; H10W20/033; H10W20/047; H10W20/049; H10W20/056; H10W20/057; H10W20/062; H10W20/40; H10W20/41; H10W20/425; Y; Y10; Y10S; Y10S438/00; Y10S438/97
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
108 words
A contact structure for integrated circuit devices, comprising: an opening in an insulating layer, said insulating layer having an upper surface; a plug of first metal filling said opening, said plug contacting an underlying conductive region, said plug further having an upper surface approximately co-planar with the insulating layer upper surface; a layer of second metal covering at least a portion of the plug upper surface; and a layer of third metal overlying said second metal layer, wherein said second and third metal layers form a signal line, and wherein said second metal layer can be etched at a different rate than said first and third metal layers.
Claim 2
Dependent Claim
108 words
A contact structure for integrated circuit devices, comprising: an opening in an insulating layer, said insulating layer having an upper surface; a plug of first metal filling said opening, said plug contacting an underlying conductive region, said plug further having an upper surface approximately co-planar with the insulating layer upper surface; a layer of second metal covering at least a portion of the plug upper surface; and a layer of third metal overlying said second metal layer, wherein said second and third metal layers form a signal line, and wherein said second metal layer can be etched at a different rate than said first and third metal layers.
Claim 3
Dependent Claim
18 words
The structure of claim 1, wherein said first and third metal layers are formed from the same material.
Claim 4
Dependent Claim
14 words
The structure of claim 1, wherein said second metal layers comprises a refractory metal.
Claim 5
Dependent Claim
12 words
The structure of claim 3, wherein said second metal layer comprises tungsten.
Claim 6
Dependent Claim
40 words
The structure of claim 1, wherein said plug of first metal comprises: a layer of barrier metal covering the underlying conducting region and sidewalls of said opening; and a region containing said first metal filling the remainder of said opening.
Claim 7
Dependent Claim
23 words
The structure of claim 5, wherein said barrier metal layer includes titanium, and said first metal comprises an alloy of aluminum and titanium.
Claim 8
Dependent Claim
13 words
The structure of claim 6 wherein said barrier metal layer comprises titanium nitride.
Claim 9
Dependent Claim
109 words
A contact structure for integrated circuit devices, comprising: an opening in an insulating layer, said insulating layer having an upper surface; a plug of aluminum filling said opening, said plug contacting an underlying conductive region, said plug further having an upper surface approximately co-planar with the insulating layer upper surface; a layer of second metal covering at least a portion of the plug upper surface; and a layer of aluminum overlying said second metal layer, wherein said second metal layer and said aluminum layer form a signal line, and wherein said second metal layer can be etched at a different rate than said aluminum plug and said aluminum layer.
Claim 10
Dependent Claim
109 words
A contact structure for integrated circuit devices, comprising: an opening in an insulating layer, said insulating layer having an upper surface; a plug of aluminum filling said opening, said plug contacting an underlying conductive region, said plug further having an upper surface approximately co-planar with the insulating layer upper surface; a layer of second metal covering at least a portion of the plug upper surface; and a layer of aluminum overlying said second metal layer, wherein said second metal layer and said aluminum layer form a signal line, and wherein said second metal layer can be etched at a different rate than said aluminum plug and said aluminum layer.
Claim 11
Dependent Claim
89 words
An integrated circuit contact structure, comprising: an insulating layer having an upper surface; an opening through said insulating layer, said opening exposing an underlying conducting region therethrough; a plug containing a metal conductor and filling said opening, said plug having an upper surface approximately co-planar with the insulating layer upper surface; and an elongate metal signal line overlying a portion of said insulating layer and contacting said plug, said signal line having a width not greater than approximately a dimension of said opening in the insulating layer upper surface.
Claim 12
Dependent Claim
89 words
An integrated circuit contact structure, comprising: an insulating layer having an upper surface; an opening through said insulating layer, said opening exposing an underlying conducting region therethrough; a plug containing a metal conductor and filling said opening, said plug having an upper surface approximately co-planar with the insulating layer upper surface; and an elongate metal signal line overlying a portion of said insulating layer and contacting said plug, said signal line having a width not greater than approximately a dimension of said opening in the insulating layer upper surface.
Claim 13
Dependent Claim
23 words
The contact structure of claim 9, wherein said signal line has a width not greater than approximately the minimum dimension of said opening.
Claim 14
Dependent Claim
21 words
The contact structure of claim 10, wherein said signal line has a width less than the minimum dimension of said opening.
Claim 15
Dependent Claim
20 words
The contact structure of claim 9, wherein said opening has sides defining a polygon in the insulating layer upper surface.
Claim 16
Dependent Claim
13 words
The contact structure of claim 12, wherein the polygon is a regular polygon.
Claim 17
Dependent Claim
11 words
The structure of claim 13, wherein the polygon is a rectangle.
Claim 18
Dependent Claim
24 words
The structure of claim 12, wherein said signal line has a width not greater than approximately the length of a side of the polygon.
Claim 19
Dependent Claim
25 words
The structure of claim 15, wherein said signal line has a width not greater than approximately the length of the shortest side of the polygon.
Claim 20
Dependent Claim
23 words
The structure of claim 16, wherein said signal line has a width less than the length of the shortest side of the polygon.
References Cited (Backward Citations)
US4887146A
Cited
US4837609A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-12-02 | 1995-06-03 | 1995-12-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-12-02 | 1999-06-03 | 1999-12-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-12-02 | 2003-06-03 | 2003-12-03 | $7700.00 | Window Closed / Lapsed |